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      • EUV Plasma Processes Oscar Versolato Wim Ubachs
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  • NWO Vidi grant awarded to Oscar Versolato

    May 30, 2017

    ARCNL group leader Oscar Versolato has been awarded a NWO Vidi grant. This grant enables Versolato to study the physics of plasma sources of extreme ultraviolet (EUV) light for nanolithography.

  • Teacher and researcher Carin Werner-IJgosse about her experiences at ARCNL

    May 24, 2017

    Once a week high school chemistry teacher Carin Werner-IJgosse works at ARCNL as a researcher in the group EUV Photo resists. She is financially supported by the programme ‘Leraar in …

  • Joost Frenken wins the MRS Innovation in Materials Characterization Award

    April 21, 2017

    ARCNL director and group leader Joost Frenken received the 2017 Innovation in Materials Characterization Award of the Materials Research Society (MRS). He was chosen from a large group of nominees …

  • ‘Dreaming of graphene’: Joost Frenken on Dutch radio

    February 3, 2017

    Recently, Joost Frenken talked on Dutch Radio (NPO radio 1, Langs de lijn en Omstreken) about graphene: a one atom thick superconductor. Listen to the interview: De nieuwe mogelijkheden van …

  • ‘Magic’ EUV light in Dutch news paper

    January 19, 2017

    Today Joost Frenken explains the technology behind ASML's new type of computer chips machnine in Dutch news paper de Volkskrant. Read the article 'Zo werkt die 'toverlantaarn' van ASML' …

  • Hendrik Casimir Prize 2016 for Andrea Peña

    January 13, 2017

    On January 9, 2017, Andrea Peña received the Hendrik Casimir Prize 2016 for  best Master student. The Casimir Research School yearly awards these prizes to the best MSc students in …

  • Latest issue ARCNL Newsletter

    December 20, 2016

    This is ARCNL's fourth newsletter. Since its start three years ago, ARCNL has been growing rapidly, which is visible in the number of employees, the number of research groups and …

  • Matrix VII: next step in long-term housing of ARCNL

    November 22, 2016

    On Wednesday, November 16th FOM Director Christa Hooijer and Geert Haksteen (Managing Director of Matrix Innovation Center) signed a contract to lay down the terms for the customization of the- …

  • Paul Planken elected as OSA Fellow

    November 11, 2016

    On November 10, 2016, the Optical Society (OSA) has elected Paul Planken (ARCNL/UvA) as Fellow. The Board of Directors of OSA elected Planken “for his pioneering contributions to terahertz time-domain …

  • ARCNL in TV program of RTV Noord-Holland

    November 1, 2016

    Do you know what nanolithography is? Starting with this question local TV station RTV Noord-Holland made a short portrait of ARCNL that featured in their program ‘Ons Noord Holland’. This …

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter