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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
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      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • Unique collaboration demonstrates promising new imaging tool

    September 14, 2026

    Two-dimensional semiconductor films, which can be only atoms thick, are promising materials for next-generation electronic devices. However, challenges with measuring defects in the films have made them difficult to implement …

  • First ARCNL Talent Fellowship awarded to support PhD research

    September 11, 2026

    ARCNL has awarded its new Talent Fellowship for the first time. The fellowship gives MSc graduates the opportunity to develop their own PhD research project together with an ARCNL group …

  • Four new Doctors add their covers to the Theses Wall this summer

    September 7, 2026

    Paul Ducarme On May 4, joint AMOLF/ARCNL PhD candidate Paul Ducarme successfully defended his thesis, “Harnessing Mechanical Instabilities for Functional Structures Using Nonlinear Building Blocks.” For his doctoral research, Paul …

  • Marcelo Ackermann appointed joint professor at UvA and VU

    August 27, 2026

    ARCNL director Marcelo Ackermann has been appointed a joint professor at partner universities University of Amsterdam (UvA) and Vrije Universiteit Amsterdam (VU). He also remains Professor at University of Twente, …

  • Atom-thin materials: handle with care… and cling film

    July 29, 2026

    As materials become thinner – now reaching a thickness of single atoms – it has become ever more difficult to create large enough sheets of these materials and transfer them …

  • Excursion to Twente fosters connection between ARCNL and XUV Optics researchers

    July 22, 2026

    On June 17, the people of ARCNL got on a bus to visit their colleagues in the XUV Optics research group at the University of Twente in Enschede. Both XUV …

  • ERC grant awarded for fast, non-invasive, 3D wafer metrology

    July 2, 2026

    Dr. Peter Kraus has been awarded an ERC Proof of Concept grant to develop a new metrology technique using high-harmonic generation-driven extreme ultraviolet (EUV) scatterometry. This EUVISION project aims to …

  • Laser-induced shock waves in tin droplets produce high-speed microjets

    June 15, 2026

    An unexpected observation led Dr. Randy Meijer and collaborators to investigate the formation of microjets in tin droplets. They found that short, consecutive, low-energy laser pulses create shock waves in …

  • Indirect EUV imaging with nanometer accuracy

    May 21, 2026

    ARCNL researchers have demonstrated the use of high-harmonic generation for scatterometry with nanometer accuracy. This allows them to indirectly measure nanostructures without lenses, using shorter wavelengths of light and faster …

  • WomenNetPhysics 2026 brings physicists together to strengthen inclusivity in the field

    May 19, 2026

    On May 8, researchers from across the Netherlands gathered at Amsterdam Science Park for WomenNetPhysics 2026, the largest Dutch networking event dedicated to strengthening the position of women in physics.

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
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      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
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      • Repository
      • Contact
      • ARCNL Newsletter