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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • Indirect EUV imaging with nanometer accuracy

    May 21, 2026

    ARCNL researchers have demonstrated the use of high-harmonic generation for scatterometry with nanometer accuracy. This allows them to indirectly measure nanostructures without lenses, using shorter wavelengths of light and faster …

  • WomenNetPhysics 2026 brings physicists together to strengthen inclusivity in the field

    May 19, 2026

    On May 8, researchers from across the Netherlands gathered at Amsterdam Science Park for WomenNetPhysics 2026, the largest Dutch networking event dedicated to strengthening the position of women in physics.

  • Professor Oscar Versolato gives inaugural lecture at Vrije Universiteit Amsterdam

    May 8, 2026

    On May 7, Oscar Versolato gave his inaugural lecture to commemorate his appointment as Professor of EUV plasma processes at Vrije Universiteit Amsterdam (VU Amsterdam). The lecture was titled, "Turning …

  • Phase and intensity closely linked in solid high-harmonic generation process

    May 4, 2026

    Researchers at ARCNL and the Madrid Institute of Materials Sciences have achieved a breakthrough in precisely measuring and understanding a fundamental property of the high-harmonic generation (HHG) process in solids: …

  • Two parameters define how tin droplets deform

    April 28, 2026

    To create extreme ultraviolet (EUV) light, droplets of liquid tin are hit with a laser at very high power. But what happens at lower energies? In a new paper published in the Journal of Fluid Mechanics, ARCNL …

  • Wim van der Zande appointed chair of NNV

    April 16, 2026

    Former ARCNL director Wim van der Zande was recently appointed the next chairperson of the Dutch Physics Association (NNV). For the next year he will transition into the role via …

  • Insights on fusion, lightning and more at NNV Plasma Physics Symposium

    April 8, 2026

    The second NNV Plasma Physics Symposium took place in Zonheuvel on April 1-2, bringing together plasma physicists from across the Netherlands, Belgium and Germany. Organized by ARCNL and Eindhoven University …

  • Wim van der Zande retires with dedicated symposium

    March 10, 2026

    In celebration of his illustrious career, Dr. Wim van der Zande’s family, friends, colleagues and other close relations gathered at ARCNL for a farewell symposium. Speakers from different stages in …

  • Sustainable optical materials grown from a sponge

    March 5, 2026

    Researchers have demonstrated the potential of optical fibers naturally grown from a marine sponge. This presents a sustainable alternative to conventional man-made optical fibers, which are used in a broad …

  • New perspectives on light-induced damage

    March 2, 2026

    ARCNL alumnus Ester Abram conducted her PhD research on how high-intensity laser light can damage material surfaces, with an interest in semiconductor manufacturing processes. Now, she and her collaborators from …

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter