Fundamental research with a mission
Learn more about our mission and vision
Creating a mutual understanding
Such a close, large, long term and extensive cooperation between a private company and academic researchers as is being embodied by ARCNL, has never been established before in the Netherlands.
‘That means we are pioneering, and continuously looking for the optimal balance between academic freedom and industrial relevance,’ says ASML Director of Research Wim van der Zande.
Research Groups
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EUV Plasma Modeling
Which processes take place within an EUV emitting plasma? And how do they influence the amount of EUV light and debris the plasma emits? To answer these questions, this group …
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EUV Photoresists
This group studies the chemical changes that occur within a wide range of photosensitive materials in response to incident EUV light. The aim is to gain fundamental understanding in order …
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EUV Photoemission
Currently we have a vacancy for a tenure-track group leader in the field of extreme ultraviolet photoelectron spectroscopy and microscopy. Read more about this vacancy. This joint group of ARCNL and …
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Nanophotochemistry
Wafers are covered with a photosensitive called resist so that patterns can be transferred to them from masks. This group focuses on the effects of the interaction between EUV light …
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EUV Plasma Processes
This group uses an extensive diagnostic toolset to characterize and understand the physics of plasma sources of EUV light at the atomic level.
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EUV Targets
This group uses ultrafast lasers and spectroscopy to study at every possible timescale the interaction between high-intensity laser light and metals passing through the four phases of matter: solid, liquid, …
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EUV Generation & Imaging
This group aims to obtain a fundamental understanding of the physical processes occurring in laser-produced plasmas and to control the emission of radiation and particles. It is also exploring the …
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Nanolayers
This group studies surfaces, interfaces, and very thin films on the atomic scale. The knowledge it generates is relevant for the delicate optics and other essential components of modern lithography machines.
