Advanced Research Center for Nanolithography

Fundamental research with a mission

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Joost Frenken wins the MRS Innovation in Materials Characterization Award

February 20, 2017

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Providing long-term innovation

‘If ARCNL succeeds in conducting high-grade fundamental research with direct relevance for industry, we have established something truly unique,’ says Marc Vrakking, Chairman of ARCNL’s Scientific Advisory Committee.

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Research Groups

  • EUV Plasma Modeling

    Which processes take place within an EUV emitting plasma? And how do they influence the amount of EUV light and debris the plasma emits? To answer these questions, this group …

  • EUV Photoresists

    This group studies the chemical changes that occur within a wide range of photosensitive materials in response to incident EUV light. The aim is to gain fundamental understanding in order …

  • Atomic Plasma Processes

    This group looks for fingerprints of atoms and ions generated in the EUV-emitting plasma. The aim is to understand this plasma by understanding its constituents.

  • EUV Photoemission

    This joint group of ARCNL and AMOLF uses photoelectron spectroscopy – detecting electrons knocked out of a material by incoming photons – to study molecular properties of EUV photoresist materials …

  • Nanophotochemistry

    Wafers are covered with a photosensitive called resist so that patterns can be transferred to them from masks. This group focuses on the effects of the interaction between EUV light …

  • EUV Plasma Dynamics

    This group uses an extensive diagnostic toolset to characterize EUV light emitting plasma at the atomic and molecular level.

  • EUV Targets

    This group uses ultrafast lasers and spectroscopy to study at every possible timescale the interaction between high-intensity laser light and metals passing through the four phases of matter: solid, liquid, …

  • EUV Generation & Imaging

    This group aims to obtain a fundamental understanding of the physical processes occurring in laser-produced plasmas and to control the emission of radiation and particles. It is also exploring the …

  • Nanolayers

    This group studies surfaces, interfaces, and very thin films on the atomic scale. The knowledge it generates is relevant for the delicate optics and other essential components of modern lithography machines.