Advanced Research Center for Nanolithography

Fundamental research with a mission

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EUV Source Workshop : Call for abstracts

November 7, 2016 at Science Park Congress Center, Science Park 123, Amsterdam

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The beginning of a new tradition

‘Researchers at ARCNL have different backgrounds but we are united in one mission,’ says scientific director Joost Frenken. ‘We hope to open up new opportunities for the semiconductor industry by journeying into unknown territories of fundamental physics.’

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Research Groups

  • EUV Photoresists

    This group studies the chemical changes that occur within a wide range of photosensitive materials in response to incident EUV light. The aim is to gain fundamental understanding in order …

  • Atomic Plasma Processes

    This group looks for fingerprints of atoms and ions generated in the EUV-emitting plasma. The aim is to understand this plasma by understanding its constituents.

  • EUV Photoemission

    This joint group of ARCNL and AMOLF uses photoelectron spectroscopy – detecting electrons knocked out of a material by incoming photons – to study molecular properties of EUV photoresist materials …

  • Nanophotochemistry

    Wafers are covered with a photosensitive called resist so that patterns can be transferred to them from masks. This group focuses on the effects of the interaction between EUV light …

  • EUV Plasma Dynamics

    This group uses an extensive diagnostic toolset to characterize EUV light emitting plasma at the atomic and molecular level.

  • EUV Targets

    This group uses ultrafast lasers and spectroscopy to study at every possible timescale the interaction between high-intensity laser light and metals passing through the four phases of matter: solid, liquid, …

  • EUV Generation & Imaging

    This group aims to obtain a fundamental understanding of the physical processes occurring in laser-produced plasmas and to control the emission of radiation and particles. It is also exploring the …

  • Nanolayers

    This group studies surfaces, interfaces, and very thin films on the atomic scale. The knowledge it generates is relevant for the delicate optics and other essential components of modern lithography machines.