Fundamental research with a mission
Learn more about our mission and vision
Research Groups
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Materials & Surface Science for EUV LithographySurfaces are the interaction points of all solids with their environment. In the Materials and Surface Science group we aim to understand the elementary steps of interactions occurring at surfaces …
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Computational Imaging
Is it possible to use relatively simple optics to make fast, high quality images for metrology applications with sub-nanometer precision? This is the main challenge the ARCNL related Computational Imaging …
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High-Harmonic generation and EUV science
Develop attosecond resolution spectroscopy and imaging of details on the nanometer scale, by constructing a unique high flux, high energy, coherent soft X-ray radiation source. This is the aim of …
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Contact Dynamics
How does friction occur at different scales, what effect does the interface roughness have, how and why does friction vary over time and location, and how can we influence it …
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EUV Photoresists
This group studies the chemical changes that occur within a wide range of photosensitive materials in response to incident EUV light. The aim is to gain fundamental understanding in order …
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Nanophotochemistry
Wafers are covered with a photosensitive called resist so that patterns can be transferred to them from masks. This group focuses on the effects of the interaction between EUV light …
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EUV Plasma Processes
This group uses an extensive diagnostic toolset to characterize and understand the physics of plasma sources of EUV light at the atomic level.
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EUV Targets
This group uses high-intensity ultrafast lasers and spectroscopy to study the physics of laser-induced ultrasonics for sub-surface inspection applications and to study laser-induced damage on metals and dielectrics.
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EUV Generation & Imaging
This group aims to obtain a fundamental understanding of the physical processes occurring in laser-produced plasmas and to control the emission of radiation and particles. It is also exploring the …
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Nanolayers
This group studies surfaces, interfaces, and very thin films on the atomic scale. The knowledge it generates is relevant for the delicate optics and other essential components of modern lithography machines.
Tweets
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September 6 2019
Congratulations to Neha Thakur (from our EUV Photoresists group) for winning the best student talk award at the 2nd… https://t.co/uz21gLyK1X
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September 6 2019
Congratulations @_amolf ! Have a great celebration today!🥳 https://t.co/mZfd5PCI2j
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September 5 2019
New position at ARCNL! https://t.co/QP3I0oZE8d
