Advanced Research Center for Nanolithography

ARCNL has closed its offices and labs as of Wednesday, 25 March due to the Covid-19 outbreak. We are scheduled to re-open on April 6th. ARCNL can be reached by e-mail: All employees work from home and can be contacted by e-mail; you can find all e-mail addresses here.

Packages can be delivered at neighbor institute AMOLF, located at Science Park 102.

What do we need for tomorrow’s smartphone?

Watch this video to find out more about extreme ultraviolet (EUV) light and the public private partnership ARCNL. The camera crew filmed Oscar Versolato (EUV Plasma Processes) and his group members while carrying out experiments.

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Research Groups

  • Nanoscale Imaging and Metrology

    Nanoscale Imaging and Metrology group focuses on the advanced imaging, sensing and metrology tools. Our ultimate goal is imaging beyond the limits. We are developing new label-free far-field imaging techniques …

  • Materials & Surface Science for EUV Lithography

    Surfaces are the interaction points of all solids with their environment. In the Materials and Surface Science group we aim to understand the elementary steps of interactions occurring at surfaces …

  • Computational Imaging

    Is it possible to use relatively simple optics to make fast, high quality images for metrology applications with sub-nanometer precision? This is the main challenge the ARCNL related Computational Imaging …

  • High-Harmonic generation and EUV science

    Develop attosecond resolution spectroscopy and imaging of details on the nanometer scale, by constructing a unique high flux, high energy, coherent soft X-ray radiation source. This is the aim of …

  • Contact Dynamics

    How does friction occur at different scales, what effect does the interface roughness have, how and why does friction vary over time and location, and how can we influence it …

  • Research activities

    Research activities The EUV Photoemission group started up in August 2015 and will use various experimental approaches in the field of photoelectron spectroscopy/microscopy. The group will study the microscopic properties …

  • EUV Photoresists

    This group studies the chemical changes that occur within a wide range of photosensitive materials in response to incident EUV light. The aim is to gain fundamental understanding in order …

  • Nanophotochemistry

    Wafers are covered with a photosensitive called resist so that patterns can be transferred to them from masks. This group focuses on the effects of the interaction between EUV light …

  • EUV Plasma Processes

    This group uses an extensive diagnostic toolset to characterize and understand the physics of plasma sources of EUV light at the atomic level.

  • EUV Targets

    This group uses high-intensity ultrafast lasers and spectroscopy to study  the physics of laser-induced ultrasonics for sub-surface inspection applications and to study laser-induced damage on metals and dielectrics.

  • EUV Generation & Imaging

    This group aims to obtain a fundamental understanding of the physical processes occurring in laser-produced plasmas and to control the emission of radiation and particles. It is also exploring the …

  • Nanolayers

    This group studies surfaces, interfaces, and very thin films on the atomic scale. The knowledge it generates is relevant for the delicate optics and other essential components of modern lithography machines.