Creating a mutual understanding
Such a close, large, long term and extensive cooperation between a private company and academic researchers as is being embodied by ARCNL, has never been established before in the Netherlands.
‘That means we are pioneering, and continuously looking for the optimal balance between academic freedom and industrial relevance,’ says ASML Director of Research Wim van der Zande.
Research Groups
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Contact Dynamics
How does friction occur at different scales, what effect does the interface roughness have, how and why does friction vary over time and location, and how can we influence it …
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EUV Photoresists
This group studies the chemical changes that occur within a wide range of photosensitive materials in response to incident EUV light. The aim is to gain fundamental understanding in order …
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EUV Photoemission
This joint group of ARCNL and AMOLF uses photoelectron spectroscopy – detecting electrons knocked out of a material by incoming photons – to study molecular properties of EUV photoresist materials …
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Nanophotochemistry
Wafers are covered with a photosensitive called resist so that patterns can be transferred to them from masks. This group focuses on the effects of the interaction between EUV light …
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EUV Plasma Processes
This group uses an extensive diagnostic toolset to characterize and understand the physics of plasma sources of EUV light at the atomic level.
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EUV Targets
This group uses ultrafast lasers and spectroscopy to study at every possible timescale the interaction between high-intensity laser light and metals passing through the four phases of matter: solid, liquid, …
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EUV Generation & Imaging
This group aims to obtain a fundamental understanding of the physical processes occurring in laser-produced plasmas and to control the emission of radiation and particles. It is also exploring the …
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Nanolayers
This group studies surfaces, interfaces, and very thin films on the atomic scale. The knowledge it generates is relevant for the delicate optics and other essential components of modern lithography machines.
Tweets
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October 14 2017
RT @JoostWMFrenken: Leuke meeting; leuk concept. https://t.co/nU51FNkHeA
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October 13 2017
@JoostWMFrenken heet deelnemers Prof meets CTO meeting welkom bij ARCNL @HollandInstrum https://t.co/PjANxQTmWQ
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October 10 2017
Komende vrijdag 13 oktober 'Prof meets CTO' bij ARCNL (serie van @HollandInstrum) https://t.co/XnHkh7vKI2
