Advanced Research Center for Nanolithography

Fundamental research with a mission
Learn more about our mission and vision


ARCNL is hosting NEVAC Symposium 2020
Friday, May 15th.
For program, registration and venues visit NEVAC Symposium 2020

What do we need for tomorrow’s smartphone?

Watch this video to find out more about extreme ultraviolet (EUV) light and the public private partnership ARCNL. The camera crew filmed Oscar Versolato (EUV Plasma Processes) and his group members while carrying out experiments.

Go to video

Research Groups

  • Nanoscale Imaging and Metrology

    Nanoscale Imaging and Metrology group focuses on the advanced imaging, sensing and metrology tools. Our ultimate goal is imaging beyond the limits. We are developing new label-free far-field imaging techniques …

  • Materials & Surface Science for EUV Lithography

    Surfaces are the interaction points of all solids with their environment. In the Materials and Surface Science group we aim to understand the elementary steps of interactions occurring at surfaces …

  • Computational Imaging

    Is it possible to use relatively simple optics to make fast, high quality images for metrology applications with sub-nanometer precision? This is the main challenge the ARCNL related Computational Imaging …

  • High-Harmonic generation and EUV science

    Develop attosecond resolution spectroscopy and imaging of details on the nanometer scale, by constructing a unique high flux, high energy, coherent soft X-ray radiation source. This is the aim of …

  • Contact Dynamics

    How does friction occur at different scales, what effect does the interface roughness have, how and why does friction vary over time and location, and how can we influence it …

  • EUV Photoresists (relocated to Inpria)

    This group studies the chemical changes that occur within a wide range of photosensitive materials in response to incident EUV light. The aim is to gain fundamental understanding in order …

  • Nanophotochemistry

    Wafers are covered with a photosensitive called resist so that patterns can be transferred to them from masks. This group focuses on the effects of the interaction between EUV light …

  • EUV Plasma Processes

    This group uses an extensive diagnostic toolset to characterize and understand the physics of plasma sources of EUV light at the atomic level.

  • EUV Targets

    This group uses high-intensity ultrafast lasers and spectroscopy to study  the physics of laser-induced ultrasonics for sub-surface inspection applications and to study laser-induced damage on metals and dielectrics.

  • EUV Generation & Imaging

    This group aims to obtain a fundamental understanding of the physical processes occurring in laser-produced plasmas and to control the emission of radiation and particles. It is also exploring the …

  • Nanolayers

    This group studies surfaces, interfaces, and very thin films on the atomic scale. The knowledge it generates is relevant for the delicate optics and other essential components of modern lithography machines.