Research Groups
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Computational Imaging
Is it possible to use relatively simple optics to make fast, high quality images for metrology applications with sub-nanometer precision? This is the main challenge the ARCNL related Computational Imaging …
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High-Harmonic generation and EUV science
Develop attosecond resolution spectroscopy and imaging of details on the nanometer scale, by constructing a unique high flux, high energy, coherent soft X-ray radiation source. This is the aim of …
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Contact Dynamics
How does friction occur at different scales, what effect does the interface roughness have, how and why does friction vary over time and location, and how can we influence it …
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EUV Photoresists
This group studies the chemical changes that occur within a wide range of photosensitive materials in response to incident EUV light. The aim is to gain fundamental understanding in order …
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EUV Photoemission
This joint group of ARCNL and AMOLF uses photoelectron spectroscopy – detecting electrons knocked out of a material by incoming photons – to study molecular properties of EUV photoresist materials …
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Nanophotochemistry
Wafers are covered with a photosensitive called resist so that patterns can be transferred to them from masks. This group focuses on the effects of the interaction between EUV light …
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EUV Plasma Processes
This group uses an extensive diagnostic toolset to characterize and understand the physics of plasma sources of EUV light at the atomic level.
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EUV Targets
This group uses ultrafast lasers and spectroscopy to study at every possible timescale the interaction between high-intensity laser light and metals passing through the four phases of matter: solid, liquid, …
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EUV Generation & Imaging
This group aims to obtain a fundamental understanding of the physical processes occurring in laser-produced plasmas and to control the emission of radiation and particles. It is also exploring the …
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Nanolayers
This group studies surfaces, interfaces, and very thin films on the atomic scale. The knowledge it generates is relevant for the delicate optics and other essential components of modern lithography machines.
Tweets
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August 21 2018
RT @NWONieuws: 2017 was het derde jaar van de strategieperiode 2015-2018. Lees in het NWO-jaarverslag 2017 meer over de behaalde resultaten…
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August 10 2018
RT @ASMLcompany: Wat was het leuk om het team van Vakkanjers een kijkje in de keuken te geven. Techniek doe je soms met je handen, soms met…
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August 8 2018
RT @NWONieuws: In het strategisch plan 'Verbinden van wetenschap en samenleving' beschrijft NWO de koers voor de jaren 2019 tot en met 2022…
