At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics at the highest possible level with relevance to key technologies in nanolithography. We contribute to the …
This PhD project is part of the ERC Starting grant EUVPLASMA. This PhD project aims at understanding and controlling dense laser-produced plasma, to produce extreme ultraviolet (EUV) light for tomorrow’s …
At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We contribute to …
At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We contribute to …
At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We contribute to …
This project aims at understanding the violent expansion into the vacuum of a hot and dense laser-produced tin plasma relevant for state-of-the-art extreme-ultraviolet nanolithography. Which plasma processes are responsible for …
As a postdoc, you will develop new concepts for non-invasive nanoscale imaging and metrology by integrating computational imaging, lensless microscopy and advanced light control in random media. The new approach …
As a PhD student, you will develop new methods for ultra-fast super-resolution label-free microscopy and endo-microscopy. You will work on the visualization of complex 3D nanostructures and develop imaging and …
Are you interested in simultaneously unraveling the fundamentals of friction and contributing to the solution of friction-related challenges in computer chip production? The research field of tribology, devoted to contact …
At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics at the highest possible level with relevance to key technologies in nanolithography. We contribute to the …
