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    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Jobs and internships

Category
  • PhD positions
  • Postdoc positions
  • Scientific internships
  • Internship: Dynamics of capillary condensation and adhesion

    March 23, 2023 · Scientific internships

    At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We contribute to …

  • Internship: Atomic scale wear at macroscopically loaded interfaces

    March 23, 2023 · Scientific internships

    At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We contribute to …

  • Postdoc: Ptychography with extreme ultraviolet light

    February 27, 2023 · Postdoc positions

    As a postdoc you will develop new methods for high-resolution of nanoscale objects using extreme ultraviolet light. Your research will involve lensless imaging experiments with a high-harmonic generation source, and …

  • Internship: Nanoscale deformations of macroscale interfaces

    February 13, 2023 · Scientific internships

    At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We contribute to …

  • Internship: Radiation-hydrodynamics simulations of tin explosions

    February 13, 2023 · Scientific internships

    In our lab, we investigate the interaction of laser pulses with liquid tin microspheres to advance the knowledge of the physical processes that rule the extreme ultraviolet light (EUV) generation …

  • Postdoc: Light-Matter Interaction of 2D Materials

    February 9, 2023 · Postdoc positions

    As a postdoc, you will lead a multidisciplinary research project, determining the interaction of 2D materials with light, with a wavelength range from extreme ultraviolet (EUV) to infrared (IR) radiation.

  • Postdoc: Computational imaging with a soft-X-ray high harmonic-generation source driven by an optical parametric chirped-pulse amplifier

    September 30, 2022 · Postdoc positions

    The High-harmonic generation and EUV science group and EUV Generation and Imaging group at ARCNL, Amsterdam, have an opening for a joint two-year postdoc position.In this project you will contribute to our ongoing …

  • Postdoc: Attosecond Nanoscopy of electron dynamics in strongly correlated materials (ANACONDA)

    September 30, 2022 · Postdoc positions

    The High-harmonic generation and EUV science group at ARCNL, Amsterdam, has an opening for a two-year postdoc position as part of the ERC-Starting Grant “Attosecond Nanoscopy of electron dynamics in strongly correlated materials …

  • PhD-student: Soft-X-ray high harmonic-generation with an optical parametric chirped-pulse amplifier for imaging and metrology

    September 30, 2022 · PhD positions

    The High-harmonic generation and EUV science group and EUV Generation and Imaging group at ARCNL, Amsterdam, have an opening for a joint four-year PhD student position.In this project you will contribute to our …

  • Internship: Shaping laser-induced tin targets for EUV generation

    February 1, 2022 · Scientific internships

    In our lab, we investigate the interaction of laser pulses with liquid tin microspheres to advance the knowledge of the physical processes that rule the extreme ultraviolet light (EUV) generation …

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter