The Advanced Research Center for Nanolithography (ARCNL) is looking for a Research Associate/Scientist for its EUV Plasma Processes group. As a Research Associate/Scientist you will lead the theory activities in …
The PhD project aims at the fundamental understanding of the emission of light by dense laser-produced tin plasmas at the atomic level, and at using this understanding to push the …
Laser-produced plasmas are a source of bright extreme-ultraviolet (EUV) radiation, which is essential for next-generation nanolithography. An important aspect in optimizing EUV emission is to form an understanding of the …
You will develop new concepts for computational imaging and metrology, to advance the capabilities of semiconductor metrology and enable accurate characterization of nanostructures. Computational imaging is a promising new approach …
You will investigate the early phases of plasma formation from metal targets irradiated by intense laser pulses, using advanced lasers systems and diagnostic techniques. Laser-produced plasmas are a source of …
A quartz crystal microbalance (QCM) is a device that allows to measure mass with ng precision. It is based on a piezoelectric quartz substrate whose oscillation frequency changes when a …
The overall goal of our research is to understand the fundamental physical and chemical factors that determine the efficiency and quality of pattern formation in Extreme Ultraviolet photolithography.Various student projects …
As a PhD student you will aim to spectrally unravel state-of-the-art plasma sources of extreme ultraviolet (EUV) light for nanolithography to obtain a more complete, fundamental understanding of their operation, …
The candidate will explore extensions of lens-less imaging towards computational imaging methods that aim to improve optical measurement techniques for metrology of semiconductor devices. The challenges that are encountered are …
At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics at the highest possible level with relevance to key technologies in nanolithography. We contribute to the …
