As a postdoc you will develop new methods for high-resolution imaging and metrology, using ultrasound waves produced by ultrafast laser pulses. You will then use these methods to detect and …
In this project, you will use advanced and novel experimental techniques to unravel the effects of the surface topography of hard carbon-based films on their tribological behaviour under different conditions.
This project is devoted to developing and employing numerical modelling of hot and dense plasma under conditions relevant for state-of-the-art extreme-ultraviolet (EUV) nanolithography, where laser-driven plasma sources are used to …
This project is devoted to developing and employing numerical modelling of hot and dense plasma under conditions relevant for state-of-the-art extreme-ultraviolet (EUV) nanolithography, where laser-driven plasma sources are used to …
The High-harmonic generation and EUV science group and EUV Generation and Imaging group at ARCNL, Amsterdam, have an opening for a joint four-year PhD student position.In this project you will contribute to our …
The High-harmonic generation and EUV science group at ARCNL, Amsterdam, has an opening for a two-year postdoctoral position.In this project you will contribute to some of our ongoing investigations to develop new ultrafast …
Upon loading and unloading wafers in nanolithography machines, friction occurs between the wafer and its support. While some friction is required to fixate the wafer, inhomogeneous deformations and stresses that …
This two-year postdoc project is at the interface between science and applications and is part of a larger European effort, joined in the ECSEL JU IT2 consortium, which aims to …
As a PhD student, you will develop new methods for spatial coherence control. You will create a new type of bright laser sources with optimized coherence functions and wavefronts. Your …
PhD-student: In semiconductor manufacturing technology advanced metrology to inspect the quality of devices as they are manufactured is crucial. You will develop a new paradigm for metrology on the interface …
