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      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
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  • May 18, 2022 at ARCNL canteen · Colloquium · Irene Groot (University of Leiden)

    Imaging of Growth and Characterization of Two-Dimensional Materials

    A closed session …

  • May 26 - 27, 2022 at ARCNL · Announcement · ARCNL is closed

    Ascension Day 2022

    ARCNL will be closed on Thursday May 26th (Ascension Day) and Friday May 27th. ARCNL will be fully open again on Monday May 30th.

  • June 1, 2022 at ARCNL · Virtual Colloquium · Title to be announced

    Ashlie Martini (University of California, Merced)

    A closed session …

  • June 6, 2022 at ARCNL · Announcement · ARCNL is closed

    Whit Monday 2022

  • June 15, 2022 at ARCNL · Virtual Colloquium · Title to be announced

    Laura Waller (University of California, Berkeley)

    A closed session …

  • June 15, 2022 at Extern · Announcement · Various Speakers

    ASML Technology Conference 2022

  • October 22 - 27, 2022 at ARCNL · Meeting · Title to be announced

    EUV source workshop at ARCNL

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© ARCNL 2022

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials & Surface Science for EUVL Roland Bliem
      • Nanophotochemistry Fred Brouwer
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter