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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • September 3, 2025 at ARCNL canteen · Colloquium · Roberto Lo Conte

    ARCNL Colloquium with Roberto Lo Conte

    Host: Roland Bliem …

  • September 4, 2025 at ARCNL · Hosted exclusive event

    Event ‘ARCNL, pionier in publiek-private samenwerking’

    More than ten years ago, ARCNL was established as the first Advanced Research Center in the Netherlands—a research institute where fundamental science is closely connected to the areas of interest …

  • September 17, 2025 at VU Amsterdam · PhD Ceremony

    Defense Antonios Pelekanidis

    Contact: Stefan Witte …

  • October 4, 2025 at ARCNL · Hosted public event

    Wetenschapsdag (Science Day)

    ARCNL opens its doors for everybody with an interest in science. Expect fun workshops, interesting lectures and fascinating demonstrations. More information will be added soon! …

  • November 1, 2025 · Announcement

    Transition to Marcelo Ackermann as ARCNL Director

    Marcel Ackermann will start this November, succeeding Wim van der Zande. With over 20 years of experience in academic and industrial research in applied physics and engineering, Ackermann is a …

  • December 17, 2025 · PhD Ceremony

    Defense Nick Feldman

    Contact: L.Amitonova@arcnl.nl …

  • December 17, 2025 at University of Amsterdam · PhD Ceremony

    Defense Falco Bijloo

    Contact: P.Kraus@arcnl.nl …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter