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      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Nanolayers Joost Frenken
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  • April 26 - 27, 2021 at ARCNL · Announcement · Kings Day

    ARCNL is closed

  • May 5, 2021 at ARCNL · Announcement · Liberation Day

    ARCNL is closed

  • May 13 - 14, 2021 at ARCNL · Announcement · Ascension Day

    ARCNL is closed

  • May 18, 2021 at ARCNL · Symposium · Online Symposium

    NEVAC 2021

    NEVAC symposium 2021 is an online Vacuum Technology Symposium. With exciting lectures by top scientists and bullet presentations. For the full program and registration go to ARCNL NEVAC website.

  • May 19, 2021 at ARCNL · Announcement ·

    ARCNL Colloquium

    A closed session …

  • May 24, 2021 at ARCNL · Announcement · Whit Monday

    ARCNL is closed

  • May 26, 2021 at ARCNL · Meeting · ARCNL & Partners

    Strategy Day

  • June 3, 2021 at University of Amsterdam · PhD Ceremony · Thesis title to be announced

    Olivier Lugier

    Promotor: Prof. Fred Brouwer   …

  • June 9 - 10, 2021 at Extern · Virtual Meeting · Various Speakers

    ASML Technology Conference

  • June 30, 2021 at University of Amsterdam · PhD Ceremony · Christian Dieleman

    Patterning Colloidal Nanocrystals with Light and Electrons

    Promotors: Prof. Bruno Ehrler and Prof. Albert Polman Co-promotor: Dr. Sonia Castellanos …

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© ARCNL 2021

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter