As of September 1, Emilia Olsson has been appointed as a tenure-track group leader at ARCNL, through an appointment as assistant professor at the Institute of Physics at the University of Amsterdam. She will lead a research program aimed at the modelling of the physical, chemical, and mechanical behaviour of high-performance materials for nanolithography.
The Materials Theory and Modelling group focuses on atomic scale modelling of solid-state materials and materials discovery. Pushing materials to the extreme limits, materials for novel lithography technologies require atomic level understanding in order to predict, comprehend, and control their properties.
Using cutting-edge density functional theory (DFT) and molecular dynamics (MD) modelling techniques, the Materials Theory and Modelling group will conduct simulations of bulk, surface, thin-films, and interface systems to explore and design novel materials for EUV lithography. These atomic scale insights will enable novel candidate materials, and breakdown/performance limiting mechanisms in current materials, to be identified, leading to the development of improved materials for EUV lithography.
Emilia Olsson received her PhD from University College London (United Kingdom) in 2017 where she focused on complex oxide materials for solid oxide fuel cells. After her PhD, she was employed as a Research Fellow in Battery Materials Modelling at the University of Surrey, whilst also being a visiting researcher at Imperial College London and Queen Mary University London as part of a UK Industrial Strategy Challenge Fund project on sodium-ion batteries. Her primary research interest is in atomic scale materials design, using complementary computational modelling techniques to elucidate the atomic scale processes for complex materials in close collaboration with experiment.