Contact

Manager operations: Marjan Fretz

ARCNL secretarial office – team leader: Ellen Barents – Pool
08:30-17:00 hrs
P. +31(0)20 851 7100
arcnlsecretariaat@arcnl.nl

Health & Safety (ARBO) – team leader: Bram van der Gaag

Research groups

Director – Wim van der Zande

EUV Plasma Processes – group leaders: Oscar Versolato
Plasma Theory and Modeling – group leader: John Sheil
Ion Interactions – Ronnie Hoekstra

EUV Generation & Imaging – group leaders: Stefan Witte / Kjeld Eikema
Light-Matter Interaction – group leader: Paul Planken
Computational Imaging – group leader: Arie den Boef
High-Harmonic generation and EUV science – group leader: Peter Kraus
Nanoscale Imaging and Metrology – group leader: Lyuba Amitonova

Materials & Surface Science for EUV Lithography – group leader: Roland Bliem
Contact Dynamics – group leader: Bart Weber
Materials Theory and Modeling – group leader: Emilia Olsson

Support departments shared with AMOLF

Mechanical Design – team leader: Ilya Cerjak
Precision Manufacturing – team leader: Jan van der Linden
Electronics Engineering – team leader: Dico Kruining
Software Engineering – team leader: Ivo Klinkert

ICT – team leader: Cees van der Ven
Facilities services – team leader: Nik Noest
Information Security – team leader: Marco van Zanten

Finance – team leader: Jeroen Weijers
Communications – team leader: Yvonne Smit (a.i.)
Human resources – team leader: Saskia Kemner

Library – librarian: Oana Draghici

AMOLF NanoLab Amsterdam – team leader: Hans Zeijlemaker

Campus facilities – team leader: Chris Boer (parkmanager@wcw.nl)