Contact

Manager operations: Marjan Fretz

ARCNL secretarial office

Team leader: Ellen Barents – Pool
08:30-17:00 hrs
P. +31(0)20 851 7100
arcnlsecretariaat@arcnl.nl

Health & Safety (ARBO) – team leader: Bram van der Gaag

Research groups

Director – Wim van der Zande

EUV Plasma Processes – group leader: Oscar Versolato
Plasma Theory and Modeling – group leader: John Sheil
Ion Interactions – group leader: Ronnie Hoekstra

EUV Generation & Imaging – group leader: Stefan Witte
EUV Generation & Imaging – group leader:  Kjeld Eikema
Light-Matter Interaction – group leader: Paul Planken
Computational Imaging – group leader: Arie den Boef
High-Harmonic generation and EUV science – group leader: Peter Kraus
Nanoscale Imaging and Metrology – group leader: Lyuba Amitonova

Materials & Surface Science for EUV Lithography – group leader: Roland Bliem
Contact Dynamics – group leader: Bart Weber
Materials Theory and Modeling – group leader: Emilia Olsson

Support departments

Shared with AMOLF – Visit the AMOLF website

Mechanical Design – team leader: Ilya Cerjak
Precision Manufacturing – team leader: Jan van der Linden
Electronics Engineering – team leader: Bob Krijger
Software Engineering – team leader: Ivo Klinkert

ICT – team leader: Cees van der Ven
Facilities services – team leader: Nik Noest
Information Security – team leader: Marco van Zanten

Finance – team leader: Jeroen Weijers
Communications – team leader: Rob Meijers
Human resources – team leader: Saskia Kemner

Library – librarian: Oana Draghici

AMOLF NanoLab Amsterdam – team leader: Isabella Palstra

Campus facilities – team leader: Chris Boer (parkmanager@wcw.nl)