Materials and Surface Science for Extreme Ultraviolet Lithography
Group leader: Dr. Roland Bliem
Materials & Surface Science for EUVL
Surfaces are the interaction points of all solids with their environment. In the Materials and Surface Science group we strive to understand the elementary interaction steps at surfaces in the nanolithography process, explore new materials concepts, and aim to improve the lifetime and surface stability of materials for EUV applications.
The Materials and Surface Science for EUV Lithography group focuses on understanding the elementary physical and chemical processes occurring at surfaces relevant to nanolithography. Using near-ambient-pressure X-ray photoelectron spectroscopy (NAP-XPS) in environments close to application conditions, we strive to identify the critical processes limiting the long-term performance and surface stability of essential components for EUV lithography, such as reflective multilayer structures for EUV mirrors. The identification of degradation pathways will allow us to explore new compounds and materials concepts for future components designed to withstand the challenging conditions of EUV lithography.
