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      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
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      • Nanolayers Joost Frenken
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News - Materials & Surface Science for EUV Lithography

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  • Pulsed Laser Deposition for Materials and Surface Science

    September 28, 2020

    In the lab for Materials and Surface Science for EUV Lithography the long awaited setup for thin-film growth using pulsed laser deposition (PLD) has recently been installed. The new setup …

  • Roland Bliem starts new group on Materials and Surface Science for Extreme Ultraviolet Lithography

    February 15, 2019

    As of February 15, Roland Bliem has been appointed as tenure-track group leader at ARCNL, through an appointment as assistant professor at the Institute of Physics of the University of …

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© ARCNL 2021

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter