The group of Roland Bliem (Materials & Surface Science for Extreme Ultraviolet Lithography) has received an NWO XS grant of 50.000 euros to investigate the process of photoelectron spectroscopy in …
In the lab for Materials and Surface Science for EUV Lithography the long awaited setup for thin-film growth using pulsed laser deposition (PLD) has recently been installed. The new setup …
As of February 15, Roland Bliem has been appointed as tenure-track group leader at ARCNL, through an appointment as assistant professor at the Institute of Physics of the University of …
