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      • EUV Plasma Processes Oscar Versolato
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
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News - Materials & Surface Science for EUV Lithography

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  • ERC Starting Grants for ARCNL group leaders Roland Bliem and Bart Weber

    September 5, 2023

    ARCNL group leaders Roland Bliem and Bart Weber each receive an ERC Starting Grant from the European Research Council (ERC). The projects granted are: - ‘SURPLAS: 'Resolving Surface Reactions in …

  • Electron imaging program receives funding from NWO KIC call

    July 6, 2023

    NWO announced that ARCNL, Delft University and ASML will receive funding for their research program ‘Fundamentals of Electron Beam Inspection and Metrology’. ARCNL group leaders Paul Planken and Roland Bliem …

  • SHINE consortium receives NWO funding to combine the best of two worlds

    May 15, 2023

    ARCNL group leader Roland Bliem is participating in a consortium that has recently received funding from the NWO Research Infrastructure (RI) call. The project called ‘Shining light on atomic-scale processes’ …

  • Tuning material properties via disorder

    January 26, 2023

    The Materials & Surface Science for EUVL group of Roland Bliem recently published a paper in Materials Today Physics, together with researchers from the University of Amsterdam. In their research, …

  • NWO XS grant for live photoemission of plasma-based CO2 conversion

    June 23, 2022

    The group of Roland Bliem (Materials & Surface Science for Extreme Ultraviolet Lithography) has received an NWO XS grant of 50.000 euros to investigate the process of photoelectron spectroscopy in …

  • Pulsed Laser Deposition for Materials and Surface Science

    September 28, 2020

    In the lab for Materials and Surface Science for EUV Lithography the long awaited setup for thin-film growth using pulsed laser deposition (PLD) has recently been installed. The new setup …

  • Roland Bliem starts new group on Materials and Surface Science for Extreme Ultraviolet Lithography

    February 15, 2019

    As of February 15, Roland Bliem has been appointed as tenure-track group leader at ARCNL, through an appointment as assistant professor at the Institute of Physics of the University of …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter