Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter
Directory

News - Nanoscale Imaging and Metrology

Category
  • Atomic Plasma Processes
  • Computational Imaging
  • Contact Dynamics
  • Corporate
  • EUV Generation & Imaging
  • EUV Photoemission
  • EUV Photoresists
  • EUV Plasma Dynamics
  • EUV Plasma Modeling
  • EUV Plasma Processes
  • EUV Targets
  • General
  • High-Harmonic Generation and EUV Science
  • Ion Interactions
  • Light-Matter Interaction
  • Materials & Surface Science for EUV Lithography
  • Materials Theory and Modeling
  • Nanolayers
  • Nanophotochemistry
  • Nanoscale Imaging and Metrology
  • Plasma Theory and Modeling
  • Visualizing the invisible: scientists push phase imaging beyond its limits

    April 28, 2025

    Researchers have developed a new imaging method that allows high-speed, label-free, and high-resolution phase imaging, using only a multimode optical fiber and a position-sensitive detector. This compact, camera-free technique surpasses …

  • Successful PhD defenses: three Researchers earn their doctorate

    March 20, 2025

    Zhouping Lyu, ‘High-resolution Imaging Through a Multimode Fiber: From Raster-scanning to Compressive Sensing’ On December 11th, Zhouping defended her thesis at Vrije Universiteit Amsterdam. Zhouping did her doctoral research in …

  • NWO grant to develop super-speed OCT technique for new applications

    February 24, 2025

    Lyuba Amitonova (ARCNL and Vrije Universiteit Amsterdam) and researcher Dierck Hillmann (VU) receive funding from NWO for their joint research project 'Super-Speed Swept-Source Full-Field Optical Coherence Tomography’. The project is …

  • New paper! Wavefront shaping and imaging through a multimode hollow-core fiber

    December 13, 2024

    Wavefront shaping and imaging through a multimode hollow-core fiber Researchers from Nanoscale Imaging and Metrology group have made significant progress in high-resolution imaging by utilizing multimode hollow-core fibers (MHCFs). Their work introduces innovative …

  • NWO Perspectief funding for flat optics

    December 22, 2023

    On December 13th NWO announced that one of the consortia to receive funding from the Perspectief program is the AWAVE project (Advanced Wave Engineering for Sustainable Optical Applications) with amongst …

  • ARCNL involved in large ‘Perspectief’ program on light conduction

    December 15, 2022

    The OPTIC consortium ‘Optical coherence; optimal delivery and positioning’ with amongst others ARCNL and VU Amsterdam group leaders Lyuba Amitonova and Arie den Boef has been awarded an NWO Perspectief …

  • Fiber imaging beyond the limits of resolution and speed

    May 8, 2020

    Researchers at ARCNL and Vrije Universiteit Amsterdam have developed a compact setup for fast, super-resolution microscopy through an ultrathin fiber. Using smart signal processing, they beat the theoretical limits of …

  • Lyuba Amitonova starts a new group on Nanoscale Imaging and Metrology

    October 1, 2019

    As of October 1, Lyuba Amitonova has been appointed as a tenure-track group leader at ARCNL. Earlier this year, she has been awarded a WISE grant from NWO supporting her …

  • Dr. Liubov Amitonova appointed as WISE fellow at ARCNL

    May 27, 2019

    NWO has awarded three talented female scientists a WISE grant. Dr. Liubov Amitonova has received an appointment at the Advanced Research Centre for Nanolithography (ARCNL), Dr. Julia Engelmann at the …

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter