We just concluded the very first NNV Plasma Rolduc conference (2-3 April). This is a new conference series that revives and combines prior annual plasma physics meetings. The conference is …
Zhouping Lyu, ‘High-resolution Imaging Through a Multimode Fiber: From Raster-scanning to Compressive Sensing’ On December 11th, Zhouping defended her thesis at Vrije Universiteit Amsterdam. Zhouping did her doctoral research in …
As of 17 February, physicist and ARCNL Group Leader Oscar Versolato has been appointed Professor of EUV plasma processes. His chair is embedded in the Physics and Astronomy department of …
On October 21-23, a record number of 129 participants from many countries attended the successful 2024 Source Workshop in Amsterdam. This premier yearly workshop, with Chinese, Japanese, American and European …
ARCNL researchers developed a new optical method to study vapors with a high spatial and temporal resolution. In a paper in Applied Physics Letters, which was selected as the editor’s …
ARCNL is proud to announce that the week of October 2, 2023 is a special one with four PhD defenses in total. Lars Behnke starts on Monday defending his thesis …
Two recent papers of the EUV Plasma Processes group of Oscar Versolato were selected as an Editor’s pick. Alumnus Bo Liu is the first author of the Physical Review Applied …
Physicist Oscar Versolato has received a Consolidator Grant from the European Research Council (ERC) of 2.0 million euro. The grant allows him to investigate the ideas put forward in the …
PhD student Bo Liu (EUV Plasma Processes) has successfully defended his thesis ‘Morphology of liquid tin sheets formed by laser impact on droplets’ at Vrije Universiteit Amsterdam on December 13th.
PhD student Lars Behnke (EUV Plasma Processes) has won the second prize with his talk Two-micrometer-wavelength laser-produced tin plasma EUV sources at the International Conference on Extreme Ultraviolet Lithography 2022 …
