Research on extreme ultraviolet light (EUV) sources is key to developing nanolithography machines to make ever smaller computer chips. Inspired by even stronger sources of EUV light, scientists are exploring …
We just concluded the very first NNV Plasma Rolduc conference (2-3 April). This is a new conference series that revives and combines prior annual plasma physics meetings. The conference is …
Zhouping Lyu, ‘High-resolution Imaging Through a Multimode Fiber: From Raster-scanning to Compressive Sensing’ On December 11th, Zhouping defended her thesis at Vrije Universiteit Amsterdam. Zhouping did her doctoral research in …
As of 17 February, physicist and ARCNL Group Leader Oscar Versolato has been appointed Professor of EUV plasma processes. His chair is embedded in the Physics and Astronomy department of …
On October 21-23, a record number of 129 participants from many countries attended the successful 2024 Source Workshop in Amsterdam. This premier yearly workshop, with Chinese, Japanese, American and European …
ARCNL researchers developed a new optical method to study vapors with a high spatial and temporal resolution. In a paper in Applied Physics Letters, which was selected as the editor’s …
ARCNL is proud to announce that the week of October 2, 2023 is a special one with four PhD defenses in total. Lars Behnke starts on Monday defending his thesis …
Two recent papers of the EUV Plasma Processes group of Oscar Versolato were selected as an Editor’s pick. Alumnus Bo Liu is the first author of the Physical Review Applied …
Physicist Oscar Versolato has received a Consolidator Grant from the European Research Council (ERC) of 2.0 million euro. The grant allows him to investigate the ideas put forward in the …
PhD student Bo Liu (EUV Plasma Processes) has successfully defended his thesis ‘Morphology of liquid tin sheets formed by laser impact on droplets’ at Vrije Universiteit Amsterdam on December 13th.
