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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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News - EUV Plasma Processes

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  • ERC Starting Grant for Oscar Versolato

    July 27, 2018

    ARCNL group leader Oscar Versolato has received a Starting Grant of 1.5 million euros from the European Research Council (ERC). The ERC uses the Starting Grants to support talented scientists …

  • EU H2020-INFRADEV funding for Ronnie Hoekstra

    September 19, 2017

    Ronnie Hoekstra (ARCNL group leader) received EU funding for his work on the dynamics of the electron beam driving an X-ray light source. The grant was awarded to the consortium …

  • NWO Vidi grant awarded to Oscar Versolato

    May 30, 2017

    ARCNL group leader Oscar Versolato has been awarded a NWO Vidi grant. This grant enables Versolato to study the physics of plasma sources of extreme ultraviolet (EUV) light for nanolithography.

  • Wim Ubachs elected as APS Fellow

    October 18, 2016

    The American Physical Society (APS) has elected ARCNL group leader and VU professor Wim Ubachs as APS Fellow. Each year the APS elects a very small percentage of its members …

  • Boxing with drops of tin : Gaining a better understanding of plasma formation for extreme ultraviolet light

    July 29, 2016

    A study into the acceleration and deformation of microscopically small tin drops by an intense laser pulse resulted in the first scientific publication from the Advanced Research Center for Nanolithography …

  • Oscar Versolato starts new research group “Atomic Plasma Processes”

    October 20, 2015

    On October 1st, ARCNL appointed Oscar Versolato as tenure track group leader of the new research group Atomic Plasma Processes. The group studies the atomic processes involved in the generation …

  • ARCNL one step closer to Extreme Ultraviolet light (EUV)

    May 19, 2015

    ARCNL researchers recently generated plasma in the ARCNL extreme ultraviolet (EUV) generating source. The researchers used a powerful laser beam to hit a number of small indium-tin droplets turning them …

  • ERC Advanced Grant for ARCNL group leader Wim Ubachs

    May 7, 2015

    Wim Ubachs was awarded an ERC Advanced Grant of 2.5 million Euro for his proposal “Physics Beyond the Standard Model from Molecules”. Ubachs will use his grant to measure very …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter