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News - EUV Photoresists

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  • Prizes for ARCNL students

    September 9, 2019

    Last week two ARCNL students won prizes for their contribution to international conferences. At the ELENA conference in Leuven (Belgium) Neha Thakur got the prize for Best Student Talk. Thakur …

  • Molecular design for nanolithography: The difference is in the details

    July 15, 2019

    HIGHLIGHT ”For the first time, I feel I am doing research that has an impact. It is very rewarding. I am confident that we are developing materials that can be …

  • Teacher and researcher Carin Werner-IJgosse about her experiences at ARCNL

    May 24, 2017

    Once a week high school chemistry teacher Carin Werner-IJgosse works at ARCNL as a researcher in the group EUV Photo resists. She is financially supported by the programme ‘Leraar in …

  • ARCNL welcomes new group leader Sonia Castellanos Ortega

    February 15, 2016

    On February 15th Sonia Castellanos Ortega starts at ARCNL as group leader of the EUV Photoresist Materials group. Castellanos Ortega aims at understanding the mechanisms behind the effects that extreme …

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