Editors and referees of the journal Physical Chemistry Chemical Physics have selected a publication by PhD student Neha Thakur for the journal’s online rolling collection of hottest work. The open …
On June 3rd Olivier Lugier successfully defended his thesis ‘Surface-mounted metal-organic frameworks for extreme ultraviolet lithography’at the University of Amsterdam (UvA). Lugier did his doctoral research in the EUV Photoresists …
Group leader and department head Sonia Castellanos (EUV Photoresists) has been offered a position at the American photoresist company Inpria. Castellanos has accepted the offer and will leave ARCNL by …
Last week two ARCNL students won prizes for their contribution to international conferences. At the ELENA conference in Leuven (Belgium) Neha Thakur got the prize for Best Student Talk. Thakur …
HIGHLIGHT ”For the first time, I feel I am doing research that has an impact. It is very rewarding. I am confident that we are developing materials that can be …
Once a week high school chemistry teacher Carin Werner-IJgosse works at ARCNL as a researcher in the group EUV Photo resists. She is financially supported by the programme ‘Leraar in …
On February 15th Sonia Castellanos Ortega starts at ARCNL as group leader of the EUV Photoresist Materials group. Castellanos Ortega aims at understanding the mechanisms behind the effects that extreme …
