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      • EUV Plasma Processes Oscar Versolato
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  • Universal warning signal for optical damage onset 

    January 27, 2025

    Universal and easy-to-measure warning signals for catastrophic damage occur in the metals used to transport data in computer chips. That is what ARCNL PhD student Ester Abram discovered and described …

  • TeraTom project aims to develop innovative prototype for semiconductor industry

    December 6, 2024

    The National Growth Fund Future-proof high-tech equipment finances the project TeraTom (Terahertz Tomography for heterogeneous systems on chip). Jaime Gómez Rivas (Eindhoven University of Technology) leads the project, with academic …

  • Writing conductive structures with lasers

    May 27, 2024

    It was a serendipitous finding that led ARCNL/UvA PhD researcher Lorenzo Cruciani to the discovery of a new method to directly write patterns of ruthenium with a laser. In a …

  • Amplifying sound-wave induced reflection and diffraction signals

    July 21, 2023

    ARCNL researchers Thomas van den Hooven and Paul Planken have found a way to enhance acoustic-wave-induced diffraction changes from a sample similar to those used for wafer alignment in nanolithography.

  • Electron imaging program receives funding from NWO KIC call

    July 6, 2023

    NWO announced that ARCNL, Delft University and ASML will receive funding for their research program ‘Fundamentals of Electron Beam Inspection and Metrology’. ARCNL group leaders Paul Planken and Roland Bliem …

  • Guido de Haan PhD defense

    February 17, 2022

    PhD student Guido de Haan successfully defended his thesis ‘Enhanced Generation and Detection of Ultrafast Laser-Induced Acoustic Signals’ on January 28th at the University of Amsterdam. De Haan carried out …

  • NWO Rubicon grant for Igor Milov

    October 13, 2021

    On October 4th Igor Milov received a Rubicon Grant from the Dutch Research Council (NWO). With this grant Milov will investigate phase transitions in nanoparticles and thin films induced by …

  • Two ARCNL publications highlighted

    October 7, 2021

    Two ARCNL publications were recently highlighted by the editors of the two journals: The Editorial Board of Physical Chemistry Chemical Physics (PCCP) selected the publication UV and VUV-induced fragmentation of …

  • Enhancing sound-wave-induced reflection measurements

    October 6, 2021

    ARCNL researchers use plasmonic resonance to amplify tiny changes in reflection To extract information from very subtle changes in a signal, researchers either have to measure over a long period, …

  • Vanessa Verrina defends PhD thesis

    April 16, 2021

    On April 6th Vanessa Verrina successfully defended her thesis ‘Laser-induced ultrasound for the detection of buried micro- and nano-structures’ at the University of Amsterdam. Verrina did her doctoral research in …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
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      • Scientific internships
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    • Career
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      • Coming from abroad
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  • More
    • More

      • People
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      • ARCNL Newsletter