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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
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      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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News - Materials Theory and Modeling

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  • Emilia Olsson joins Deep Tech Day panel on translating research to impact

    February 6, 2026

    On January 28, ARCNL research group leader Emilia Olsson participated in the panel discussion on the role of deep tech in academia, as part of University of Amsterdam Faculty of Science’s Deep Tech Day.   The …

  • New charge-trapping insights could help design longer-lasting batteries

    October 28, 2025

    Scientists have uncovered a mechanism by which trapped charges called ‘polarons’ alter the structure of silicon nitride when lithium ions enter the material. Using computer models of atomic interactions, they …

  • Tribology symposium

    December 15, 2023

    One of the most critical challenges in high-end chip production is friction and wear. Two ARCNL research groups focus on understanding these processes: the Materials Theory and Modelling group and …

  • NWO WISE grant for Emilia Olsson

    April 15, 2022

    Emilia Olsson, ARCNL group leader (Materials Theory and Modeling) and assistant professor at the University of Amsterdam, has received a Women in Science Excel (WISE) grant amounting to 250.000 euros …

  • Start of two new tenure track group leaders

    September 6, 2021

    On September 1st ARCNL welcomes two new tenure track group leaders: Emilia Olsson and John Sheil. Both of them have been appointed at an ARCNL partner university, respectively at the …

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter