Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter
Directory

News - EUV Generation & Imaging

Category
  • Atomic Plasma Processes
  • Computational Imaging
  • Contact Dynamics
  • EUV Generation & Imaging
  • EUV Photoemission
  • EUV Photoresists
  • EUV Plasma Dynamics
  • EUV Plasma Modeling
  • EUV Plasma Processes
  • EUV Targets
  • General
  • High-Harmonic Generation and EUV Science
  • Ion Interactions
  • Light-Matter Interaction
  • Materials & Surface Science for EUV Lithography
  • Materials Theory and Modeling
  • Nanolayers
  • Nanophotochemistry
  • Nanoscale Imaging and Metrology
  • Plasma Theory and Modeling
  • Laser Focus World: high-harmonic generation

    February 24, 2023

    The monthly magazine Laser Focus World recently published a Q&A tutorial about high-harmonic generation. Group Leader Stefan Witte answered various questions on this topic. The interview can be read on …

  • Using a mask to unveil the hidden properties of EUV light

    February 24, 2023

    When used in microscopy applications, extreme ultraviolet (EUV) light can be used for nanoscale imaging that also includes spectral information about the object under study. However, to fully benefit it …

  • PhD defense Alessandro Antoncecchi

    April 5, 2022

    PhD student Alessandro Antoncecchi (EUV Generation and Imaging) successfully defended his thesis 'Laser-ultrasonics and imaging through metal layers' at VU University Amsterdam on March 30th. Promotors are Stefan Witte and …

  • VICI grant for Stefan Witte

    February 28, 2022

    ARCNL and VU group leader Stefan Witte has been awarded a VICI grant from the Dutch Research Council (NWO), in the domain Applied and Engineering Sciences (TTW), for his project …

  • NWO funding for a variable-wavelength laser for next-generation EUV sources for nanolithography

    February 28, 2022

    ARCNL and VU group leaders Oscar Versolato, Stefan Witte and Wim Ubachs have received funding from the Dutch Research Council (NWO) Open Technology Programme for their project ‘Plasma driven by …

  • PhD Defense Randy Meijer

    October 6, 2021

    On October 4th Randy Meijer successfully defended his thesis ‘Tailored Laser-Droplet Interaction for Target Formation in Extreme Ultraviolet Sources’ at Vrije Universiteit. Meijer was a PhD student in the group …

  • Mengqi Du PhD defense

    June 24, 2021

    On June 9th Mengqi Du successfully defended her thesis ‘Computational Depth-resolved Imaging and Metrology’ at the Vrije Universiteit. Du did her doctoral research in the EUV Generation & Imaging group …

  • Editor’s choice Applied Physics A

    January 26, 2021

    The journal Applied Physics A has selected a publication from the EUV Generation and Imaging group led by Stefan Witte as this month’s Editor’s Choice. First author Tiago Pinto and …

  • Spreading focus for better imaging

    January 25, 2021

    Extreme Ultraviolet (EUV) light in microscopy offers the advantage of obtaining a high-resolution image combined with spectral information about the object under study. However, because EUV microscopy uses diffraction instead …

  • ARCNL groups receive OTP grant

    December 22, 2020

    In December, the groups of Peter Kraus and Stefan Witte received an Open Technology Programme (OTP) grant for the project ‘Ultrafast metrology of semiconductor nanostructures with a next-generation table-top soft-X-ray …

  • 1
  • 2
  • 3
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • Twitter
  • LinkedIn

© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter