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A. Stodolna, R. de Faria Pinto, F. Ali, A. Bayerle, D. Kurilovich, J. Mathijssen, R. Hoekstra, O.O. Versolato, K.S.E. Eikema and S. Witte,
Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair
, J.Appl.Phys
124
, 053303: 1-7 (2018)
S.A. Reijers, D. Kurilovich, F. Torretti, H. Gelderblom and O.O. Versolato,
Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light
, J.Appl.Phys
124
, 013102: 1-7 (2018)
G.S.M. Jansen, A. de Beurs, X. Liu, K.S.E. Eikema and S. Witte,
Diffractive shear interferometry for extreme ultraviolet high-resolution lensless imaging
, Opt. Express
26
, 10: 12479-12489 (2018)
R. Fallica, J. Haitjema, L. Wu, S. Castellanos, A.M. Brouwer and Y. Ekinci,
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
, J. Micro/Nanolith. MEMS MOEMS
17
, 2: 023505: 1-7 (2018)
A. Bayerle, M.J. Deuzeman, S. van der Heijden, D. Kurilovich, R. de Faria Pinto, A. Stodolna, S. Witte, K.S.E. Eikema, W. Ubachs, R. Hoekstra and O.O. Versolato,
Sn ion energy distributions of ns- and ps-laser produced plasmas
, Plasma Sources Sci. Technol.
27
, 045001:1-8 (2018)
S. Castellanos, L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, Y. Ekinci and T. Jung:
Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
In:
Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography held 25 February - 1 March 2018 San Jose, California, United States, SPIE., 2018. - pp. 105830A: 1-12 (Proceedings SPIE; 10583)
L. Freisem, G.S.M. Jansen, D. Rudolf, K.S.E. Eikema and S. Witte,
Spectrally resolved single-shot wavefront sensing of broadband high-harmonic sources
, Opt. Express
26
, 6: 6860-6871 (2018)
B. Weber, T. Suhina, T. Junge, L. Pastewka, A.M. Brouwer and D. Bonn,
Molecular probes reveal deviations from Amontons' law in multi-asperity frictional contacts
, Nature Commun.
9
, 888:1-7 (2018)
F. Torretti, R. Schupp, D. Kurilovich, A. Bayerle, J. Scheers, W. Ubachs, R. Hoekstra and O.O. Versolato,
Short-wavelength out-of-band EUV emission from Sn laser-produced plasma
, J. Phys. B
51
, 045005:1-9 (2018)
D. Kurilovich, M.M. Basko, D.A. Kim, F. Torretti, J.C. Visschers, R. Schupp, J. Scheers, R. Hoekstra, W. Ubachs and O.O. Versolato,
Power-law scaling of plasma pressure on laser-ablated tin microdroplets
, Phys. Plasmas
25
, 012709: 1-10 (2018)
