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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • F. Zhang, X. Liu, A. Pelekanidis, M. Gouder, K.S.E. Eikema and S. Witte, Material-Sensitive and Thickness-Resolved Transmission Imaging Using Coherent Extreme Ultraviolet Radiation, ACS Photonics, (2025)

  • F. Bijloo, A.J. den Boef, P.M. Kraus and A.F. Koenderink, Influence of Driving Pulse Properties on Third-Harmonic Diffraction from Quasi-BIC Metasurfaces, ACS Photonics, (2025)

  • K. Bijlsma, E. de Wit, J.L. Pascual, A. Kleinsmit, E. Lalkens, L. Assink, M. Salverda, L. Méndez, O.O. Versolato, I. Rabadán and R. Hoekstra, Electron capture in low-energy collisions of Sn3+ ions with H2 and D2, Phys. Rev. A 112, (5), 052806: 1-10 (2025)

  • B. Bhattacharjee and E. Olsson, Elucidating the impact of point defects on the structural, electronic, and mechanical behaviour of chromium nitride, Phys. Chem. Chem. Phys. 27, (42), 22610-22620 (2025)

  • Y. Mostafa, L. Behnke, D.J. Engels and O.O. Versolato, Mass use in 2 μm laser-driven tin plasma using sheet targets, J. Appl. Phys. 138, (14), 143304: 1-8 (2025)

  • L.M. Koll, S. Vendelbo Bylling Jensen, P.J. van Essen, B. de Keijzer, E. Olsson, J. Cottom, T. Witting, A. Husakou, M.J.J. Vrakking, L. Bojer Madsen, P.M. Kraus and P. Jürgens, Extreme ultraviolet high-harmonic interferometry of excitation-induced bandgap dynamics in solids, Optica 12, (10), 1606-1614 (2025)

  • H.L. França, H.K. Schubert, O.O. Versolato and M. Jalaal, Laser-induced droplet deformation: curvature inversion explained from instantaneous pressure impulse, J. Fluid Mech. 1020, A21: 1-29 (2025)

  • C. Leriche, E. Pedretti, O. Sahin, D. Kang, M.C. Righi and B. Weber, Passivation Species Suppress Atom-by-Atom Wear of Microcrystalline Diamond, ACS Appl. Mater. Interfaces 17, (39), 55511-55520 (2025)

  • A. Pelekanidis, Multi-wavelength extreme ultraviolet ptychography for imaging and wavefront sensing, VU University Amsterdam, 2025-09-17

  • H.K. Schubert, D.J. Engels, M. Kharbedia, H. Gelderblom and O.O. Versolato, Observation of discrete concentric surface modulations on free-flying liquid tin sheets, Phys. Fluids 37, (9), 094108: 1-13 (2025)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter