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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • A. Ivanina, B. Lochocki, A. Koglbauer, S. Sokolov, S.A. Goorden and L.V. Amitonova, Transmission matrix of a multimode fiber: In-line vs off-axis holography, PLOS ONE 21, (2), e0340823: 1-14 (2026)

  • F. Bijloo, M Ogienko, A.J. den Boef, P.M. Kraus and A.F. Koenderink, All-Optical Nonlinear Real and Fourier-Space Shaping with All-Dielectric Fano Resonant Metasurfaces, ACS Nano 20, (6), 4845-4854 (2026)

  • T. Vernooij, H.T. Çiftçi, N. Shahidzadeh and B. Weber, Amorphous CaSO4 nanocrystal deposits for friction and wear reduction at silicon interfaces, Wear 586, 206457: 1-6 (2026)

  • L. Guery, F. Bijloo and P.M. Kraus, Digital Holography Using Harmonic Generation from Solids for Reconstruction of Subwavelength Nanostructures, ACS Photonics 13, (4), 1055-1064 (2026)

  • K. Murzyn, T.W.P. van Horen and P.M. Kraus, Control and scaling of nonlinear emission for super-resolution microscopy, Optica 13, (1), 164-171 (2026)

  • T.N. Hogenelst, C. Leriche, A. Troglia, B. Weber and R. Bliem, Pulsed laser deposition of (TaNbHfTiZr)C high-entropy carbide layers with 38 GPa hardness, Surf. Coat. Technol. 520, 132976: 1-10 (2026)

  • L. de Wolf, M. Lipp, M. Cochez, A.J. den Boef and L.V. Amitonova, Vision Transformer network for optical overlay metrology on semiconductor wafers, APL Mach. Learn. 4, (1), 016101: 1-10 (2026)

  • H.T. Çiftçi, J. Cottom, R. Hahury, E. Olsson and B. Weber, Adhesion Control Through Electric Field-Induced Water Adsorption at Oxidized Silicon Interfaces, Tribol. Lett. 74, (1), 4: 1-10 (2026)

  • F. Bijloo, Dynamic nonlinear light control and metrology with resonant metasurfaces, University of Amsterdam, UvA, 2025-12-17

  • N. Feldman, Optical Metasurfaces for Information Efficient Nanoscale Metrology, University of Amsterdam, UvA, 2025-12-17

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter