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      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • S. van Vliet, A. Troglia, E. Olsson and R. Bliem, Identifying silicides via plasmon loss satellites in photoemission of the Ru-Si system, Appl.Surf. Sci. 608, 155139: 1-6 (2023)

  • L. Peng, F.-C. Hsia, S. Woutersen, M. Bonn, B. Weber and D. Bonn, Nonmonotonic Friction due to Water Capillary Adhesion and Hydrogen Bonding at Multiasperity Interfaces, Phys.Rev.Lett. 129, (25), 256101: 1-6 (2022)

  • B. Liu, Morphology of liquid tin sheets formed by laser impact on droplets, VU University Amsterdam, 2022-12-13

  • L. Poirier, D.J. Hemminga, A. Lassise, L. Assink, R. Hoekstra, J. Sheil and O.O. Versolato, Strongly anisotropic ion emission in the expansion of Nd:YAG-laser-produced plasma, Phys. Plasmas 29, (12), 123102: 1-11 (2022)

  • A. Troglia, Victor Vollema, S. Cassanelli, E. van Heumen, J. van de Groep, A. de Visser and R. Bliem, Tuning material properties via disorder: From crystalline alloy to metallic glass, Mater. Today Phys. 29, 100893: 1-8 (2022)

  • J. Gao, H. Zhou, J. Du, W. Peng, Y. Lin, C. Xiao, B. Yu and L.M. Qian, Effect of counter-surface chemical activity on mechanochemical removal of GaAs surface, Tribol.Int. 176, 107928: 1-8 (2022)

  • C. Messinis, Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology, VU University Amsterdam, 2022-11-29

  • W. Li, K. Abrashitova, G. Osnabrugge and L.V. Amitonova, Generative Adversarial Network for Superresolution Imaging through a Fiber, Phys. Rev. Appl. 18, (3), 034075: 1-9 (2022)

  • B. Mastiani, G. Osnabrugge and I.M. Vellekoop, Wavefront shaping for forward scattering, Opt. Express 30, (21), 37436-37445 (2022)

  • C.-C. Hsu, F.-C. Hsia, B. Weber, M.B. de Rooij, D. Bonn and A.M. Brouwer, Local Shearing Force Measurement during Frictional Sliding Using Fluorogenic Mechanophores, J. Phys. Chem. Lett. 13, (38), 8840-8844 (2022)

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter