Logo
Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter
Directory
menu
Search
Publications
Category
Articles
Book chapters
Proceedings
Theses
T. de Faria Pinto, J. Mathijssen, R.A. Meijer, H. Zhang, A. Bayerle, D. Kurilovich, O.O. Versolato, K.S.E. Eikema and S. Witte,
Cylindrically and non-cylindrically symmetric expansion dynamics of tin microdroplets after ultrashort laser pulse impact
, Appl. Phys. A
127
, 2: 93: 1-10 (2021)
O.O. Versolato, L. Behnke, R. Schupp, Z. Bouza, M. Bayraktar, Z. Mazzotta, R.A. Meijer, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra,
Extreme ultraviolet light from a tin plasma driven by a 2-si{micrometer}-wavelength laser
, Opt. Express, (2020)
L. Loetgering, S. Witte, X. Liu, A.C.C. de Beurs, M. Du, G. Kuijper and K.S.E. Eikema,
Extreme ultraviolet multispectral ptychography with minimum entropy beams
, Optica, (2020)
R. Röhrich and A.F. Koenderink,
Double moiré localized plasmon structured illumination microscopy
, Nanophotonics, (2020)
R. Röhrich,
Unconventional metrology: Merging nanophotonics with computational imaging
, University of Amsterdam, 2020-12-11
N.J. Schilder, T. A. W. Wolterink, C. Mennes, R. Röhrich and A.F. Koenderink,
Phase-retrieval Fourier microscopy of partially temporally coherent nanoantenna radiation patterns
, Opt. Express
28
, 25: 37844-37859 (2020)
J. Sheil, O.O. Versolato, A.J. Neukirch and J. Colgan,
Multiply-excited states and their contribution to opacity in CO2 laser-driven tin-plasma conditions
, J. Phys. B: At. At. Mol. Opt. Phys., (2020)
C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A. den Boef,
Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms
, Opt. Express
28
, 25: 37419-37435 (2020)
L. Wu,
Metal oxo clusters: molecular design for extreme ultraviolet lithography
, University of Amsterdam, 2020-11-18
H.C. Hendrikse, A. van der Weijden, M. Ronda‐Lloret, T. Yang, R. Bliem, R.N. Shiju, M. van Hecke, L. Li and W.L. Noorduin,
Shape‐Preserving Chemical Conversion of Architected Nanocomposites
, Adv.Mater., 2003999: 1-7 (2020)
Logo
Close
Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter