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M. Saedi, C. Sfiligoj, J. Verhoeven and J.W.M. Frenken,
Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications
, Appl.Surf. Sci., 144951: 1-10 (2020)
R. Hu, S.Yu. Krylov and J.W.M. Frenken,
On the Origin of Frictional Energy Dissipation
, Tribol Lett
68
, 1: 8: 1-13 (2020)
L.V. Amitonova, T.B.H. Tentrup, I.M. Vellekoop and P.W.H. Pinkse,
Quantum key establishment via a multimode fiber
, Opt. Express
28
, 5: 5965-5981 (2020)
L. Loetgering, M. Baluktsian, K. Keskinbora, R. Horstmeyer, T. Wilhein, G. Schütz, K.S.E. Eikema and S. Witte,
Generation and characterization of focused helical x-ray beams
, Sci.Adv.
6
, 7: eaax8836: 1-6 (2020)
B. Liu, D. Kurilovich, H. Gelderblom and O.O. Versolato,
Mass loss from a stretching semitransparent sheet of liquid tin
, Phys. Rev. Applied
13
, 2: 024035: 1-10 (2020)
A. Beurs, X. Liu, G.S.M. Jansen, A.P. Konijnenberg, W.M.J. Coene, K.S.E. Eikema and S. Witte,
Extreme ultraviolet lensless imaging without object support through rotational diversity in diffractive shearing interferometry
, Opt. Express
28
, 4: 5257-5266 (2020)
R. Hu, S.Yu. Krylov and J.W.M. Frenken,
Response to Comment on “On the Origin of Frictional Energy Dissipation”, by B.N.J. Persson
, Tribol Lett
68
, 35: 1-2 (2020)
M. Du, L. Loetgering, K.S.E. Eikema and S. Witte,
Measuring laser beam quality, wavefronts, and lens aberrations using ptychography
, Opt. Express
28
, 4: 5022-5034 (2020)
I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos,
The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography
, ACS Appl. Mater. Interfaces
12
, 8: 9881-0889 (2020)
L.V. Amitonova and J.F. Boer,
Sensitivity analysis of Raman endoscopy with and without wavefront shaping
,
28
, 3: 3779-3788 (2020)
