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EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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S. van Vliet, A. Troglia, E. Olsson and R. Bliem,
Identifying silicides via plasmon loss satellites in photoemission of the Ru-Si system
, Appl.Surf. Sci.
608
, 155139: 1-6 (2023)
L. Peng, F.-C. Hsia, S. Woutersen, M. Bonn, B. Weber and D. Bonn,
Nonmonotonic Friction due to Water Capillary Adhesion and Hydrogen Bonding at Multiasperity Interfaces
, Phys.Rev.Lett.
129
, (25), 256101: 1-6 (2022)
B. Liu,
Morphology of liquid tin sheets formed by laser impact on droplets
, VU University Amsterdam, 2022-12-13
L. Poirier, D.J. Hemminga, A. Lassise, L. Assink, R. Hoekstra, J. Sheil and O.O. Versolato,
Strongly anisotropic ion emission in the expansion of Nd:YAG-laser-produced plasma
, Phys. Plasmas
29
, (12), 123102: 1-11 (2022)
A. Troglia, Victor Vollema, S. Cassanelli, E. van Heumen, J. van de Groep, A. de Visser and R. Bliem,
Tuning material properties via disorder: From crystalline alloy to metallic glass
, Mater. Today Phys.
29
, 100893: 1-8 (2022)
J. Gao, H. Zhou, J. Du, W. Peng, Y. Lin, C. Xiao, B. Yu and L.M. Qian,
Effect of counter-surface chemical activity on mechanochemical removal of GaAs surface
, Tribol.Int.
176
, 107928: 1-8 (2022)
C. Messinis,
Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology
, VU University Amsterdam, 2022-11-29
W. Li, K. Abrashitova, G. Osnabrugge and L.V. Amitonova,
Generative Adversarial Network for Superresolution Imaging through a Fiber
, Phys. Rev. Appl.
18
, (3), 034075: 1-9 (2022)
B. Mastiani, G. Osnabrugge and I.M. Vellekoop,
Wavefront shaping for forward scattering
, Opt. Express
30
, (21), 37436-37445 (2022)
C.-C. Hsu, F.-C. Hsia, B. Weber, M.B. de Rooij, D. Bonn and A.M. Brouwer,
Local Shearing Force Measurement during Frictional Sliding Using Fluorogenic Mechanophores
, J. Phys. Chem. Lett.
13
, (38), 8840-8844 (2022)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter