Publications - ARCNL

A. Troglia, C. Leriche, M.L. van de Poll, C. Morsche, G.H. ten Brink, B.J. Kooi, B. Weber and R. Bliem, Bridging the gap between high-entropy alloys and metallic glasses: Control over disorder and mechanical properties of coatings, Mater. Today Commun. 41, 110604: 1-10 (2024)
J. Cottom, S. van Vliet, J. Meyer, R. Bliem and E. Olsson, Coverage-Dependent Stability of RuxSiy on Ru(0001): A Comparative DFT and XPS Study, Phys. Chem. Chem. Phys., (2024)
A. Pelekanidis, F. Zhang, M. Gouder, J. Seifert, M. Du, K.S.E. Eikema and S. Witte, Illumination diversity in multiwavelength extreme ultraviolet ptychography, Photon. Res. 12, (12), 2757-2771 (2024)
S. Payá, N. Diez, J. Cottom, E. Olsson and M. Sevilla, MgSO4 as an Effective, Low-Temperature Sulfur Dopant for Carbon Materials Enabling Fast Sodium Storage, ACS Appl. Energy Mater. 7, (21), 10061-10072 (2024)
F. Bijloo, K. Murzyn, F. van Emmerik, A.J. den Boef, P.M. Kraus and A.F. Koenderink, Near-Unity All-Optical Modulation of Third-Harmonic Generation with a Fano-Resonant Dielectric Metasurface, Nano Lett. 24, (41), 12942-12947 (2024)
I. Babenko, Y. Mostafa, Z. Bouza, O.O. Versolato and M. Bayraktar, Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates, AIP Advances 14, (10), 105021: 1-7 (2024)
S.D.C. Roscam Abbing, N. Kuzkova, van der Linden, F. Campi, B. de Keijzer, C. Morice, Z.-Y. Zhang, M.L.S. van der Geest and P.M. Kraus, Enhancing the efficiency of high-order harmonics with two-color non-collinear wave mixing in silica, Nature Commun. 15, (1) (2024)
J.H. Buss, S. Starosielec, M. Schulz, R. Riedel, F. Campi, C.S. Lehmann, S. Witte and P.M. Kraus, Mid-infrared optical parametric chirped-pulse amplifier at 50 W and 38 fs pumped by a high-power Yb-InnoSlab platform, Opt. Express 32, (21), 36185-36192 (2024)
S.J.J. de Lange, D.J. Hemminga, Y. Mostafa, R.A. Meijer, O.O. Versolato and J. Sheil, Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 textmu m-wavelength laser for future EUV lithography, Plasma Sources Sci. Technol. 33, (10), 105003: 1-14 (2024)
J. Sheil, L. Poirier, A.C. Lassise, D.J. Hemminga, S. Schouwenaars, N. Braaksma, A. Frenzel, R. Hoekstra and O.O. Versolato, Power-Law Scaling Relating the Average Charge State and Kinetic Energy in Expanding Laser-Driven Plasmas, Phys. Rev. Lett. 133, (12), 125101: 1-6 (2024)

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