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Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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N. Sadegh,
Spectroscopic investigations of photon-induced reactions in tin-oxo cage photoresists
, University of Amsterdam, 2023-09-20
J. Sheil, J. Colgan and O.O. Versolato:
Atomic Origins of EUV Light
In:
Photon Sources for Lithography and Metrology, V. Bakshi, Ed., SPIE Press, Bellingham, Washington, SPIE., 2023. - pp. 111-148
C. Leriche, C. Xiao, S.E. Franklin and B. Weber,
From atomic attrition to mild wear at multi-asperity interfaces: The wear of hard Si3N4 repeatedly contacted against soft Si
, Wear
528-529
, 204975: 1-8 (2023)
M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef:
Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy
In:
Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE., 2023. - pp. 126180W: 1-6
Y. Mostafa, Z. Bouza, J. Byers, I. Babenko, W.M.G. Ubachs, O.O. Versolato and M. Bayraktar,
Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates
, Opt. Lett.
48
, (16), 4316-4318 (2023)
L. Poirier, A. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato,
Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4–40×10^10 W/cm2 range
, Phys. Plasmas
30
, (8), 083505 : 1-10 (2023)
L.P. Behnke, E.J. Salumbides, G. Göritz, Y. Mostafa, D. Engels, W.M.G. Ubachs and O.O. Versolato,
High-energy parametric oscillator and amplifier pulsed light source at 2-μm
, Opt. Express
31
, (15), 24142-24156 (2023)
G. Yetik,
Thermal Stability of Nanolayers for EUV Optics
, University of Amsterdam, 2023-07-06
J. Guo, Y. Liu, L. Duan, F. Zhang and C. Xiao,
Towards a deeper understanding of temperature-dependent material removal of single-crystal AlN: An atomistic study
, Tribol.Int.
185
, 108575: 1-10 (2023)
B. Liu, R.A. Meijer, W. Li, J. Hernandez-Rueda, H. Gelderblom and O.O. Versolato,
Mass partitioning in fragmenting tin sheets
, Phys. Rev. Appl.
20
, (1), 014048: 1-18 (2023)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
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Events
Repository
Contact & Directions
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