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    • Mission and vision
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    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
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  • T. de Faria Pinto, J. Mathijssen, R.A. Meijer, H. Zhang, A. Bayerle, D. Kurilovich, O.O. Versolato, K.S.E. Eikema and S. Witte, Cylindrically and non-cylindrically symmetric expansion dynamics of tin microdroplets after ultrashort laser pulse impact, Appl. Phys. A 127, 2: 93: 1-10 (2021)

  • O.O. Versolato, L. Behnke, R. Schupp, Z. Bouza, M. Bayraktar, Z. Mazzotta, R.A. Meijer, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra, Extreme ultraviolet light from a tin plasma driven by a 2-si{micrometer}-wavelength laser, Opt. Express, (2020)

  • L. Loetgering, S. Witte, X. Liu, A.C.C. de Beurs, M. Du, G. Kuijper and K.S.E. Eikema, Extreme ultraviolet multispectral ptychography with minimum entropy beams, Optica, (2020)

  • R. Röhrich and A.F. Koenderink, Double moiré localized plasmon structured illumination microscopy, Nanophotonics, (2020)

  • R. Röhrich, Unconventional metrology: Merging nanophotonics with computational imaging, University of Amsterdam, 2020-12-11

  • N.J. Schilder, T. A. W. Wolterink, C. Mennes, R. Röhrich and A.F. Koenderink, Phase-retrieval Fourier microscopy of partially temporally coherent nanoantenna radiation patterns, Opt. Express 28, 25: 37844-37859 (2020)

  • J. Sheil, O.O. Versolato, A.J. Neukirch and J. Colgan, Multiply-excited states and their contribution to opacity in CO2 laser-driven tin-plasma conditions, J. Phys. B: At. At. Mol. Opt. Phys., (2020)

  • C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A. den Boef, Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms, Opt. Express 28, 25: 37419-37435 (2020)

  • L. Wu, Metal oxo clusters: molecular design for extreme ultraviolet lithography, University of Amsterdam, 2020-11-18

  • H.C. Hendrikse, A. van der Weijden, M. Ronda‐Lloret, T. Yang, R. Bliem, R.N. Shiju, M. van Hecke, L. Li and W.L. Noorduin, Shape‐Preserving Chemical Conversion of Architected Nanocomposites, Adv.Mater., 2003999: 1-7 (2020)

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© ARCNL 2021

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter