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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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T.J. van den Hooven, L. Cruciani and P.C.M. Planken,
Broadband optical detection of strain waves in a thin ruthenium film
, Opt. Express
33
, (16), 33232-33247 (2025)
J. Cottom, J. Meyer and E. Olsson,
Forged by Charge: Polaron-Induced Matrix Formation in Silicon Nitride Conversion-Type Anodes for Lithium-ion Batteries
, J. Mater. Chem. A, (2025)
A. Pradhan, M.H. Müser, M.H. Miller, J.P. Abdelnabe, L. Afferrante, D. Albertini, C. Leriche, B. Weber and et. al,
The Surface-Topography Challenge: A Multi-Laboratory Benchmark Study to Advance the Characterization of Topography
, Tribol. Lett.
73
, 110: 1-26 (2025)
T. Molenaar,
Strain engineering of 2D KIB anode materials
, University of Amsterdam, 2025-07-23
F. Betz, F. Binkowski, J.D. Fischbach, N. Feldman, L. Zschiedrich, C. Rockstuhl, A.F. Koenderink and S. Burger,
Uncovering Hidden Resonances in Non‐Hermitian Systems with Scattering Thresholds
, Laser & Photonics Rev., e00811: 1-6 (2025)
R. Van Straaten,
Measuring the energy spectrum of tin ions from a laser produced plasma in a single shot.
, VU University Amsterdam, 2025-07-09
T. Bierens,
Comparing the simulation thickness profile and expansion curve to those of experiments
, VU University Amsterdam, 2025-07-09
T.C. Cromwijk,
Advancing overlay metrology using digital holographic microscopy
, VU University Amsterdam, 2025-07-03
D.J. Engels, H.K. Schubert, M. Kharbedia, W.M.G. Ubachs and O.O. Versolato,
Spectroscopic imaging of tin vapor near plasma threshold
, Phys. Rev. Res.
7
, (2), 023307: 1-8 (2025)
T.J. van den Hooven,
Broadband Optical Detection of Ultrafast Strain Waves in Metals
, University of Amsterdam, 2025-06-16
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
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More
People
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Events
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ARCNL Newsletter