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EUV Plasma Processes
Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Short-Wavelength Light Sources for EUV Metrology
Angana Mondal
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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T.N. Hogenelst, C. Leriche, A. Troglia, B. Weber and R. Bliem,
Pulsed laser deposition of (TaNbHfTiZr)C high-entropy carbide layers with 38 GPa hardness
, Surf. Coat. Technol.
520
, 132976: 1-10 (2026)
H.T. Çiftçi, J. Cottom, R. Hahury, E. Olsson and B. Weber,
Adhesion Control Through Electric Field-Induced Water Adsorption at Oxidized Silicon Interfaces
, Tribol. Lett.
74
, (1), 4: 1-10 (2026)
N. Feldman,
Optical Metasurfaces for Information Efficient Nanoscale Metrology
, University of Amsterdam, UvA, 2025-12-17
F. Bijloo,
Dynamic nonlinear light control and metrology with resonant metasurfaces
, University of Amsterdam, UvA, 2025-12-17
R. van der Linden, N. Kuzkova and P.M. Kraus,
Nonlinear refractive index measurements of solids and the impact of B-integral on the phase of generated high-order harmonics
, Opt. Express
33
, (25), 53268: 1-11 (2025)
N. Feldman, A.J. den Boef, L.V. Amitonova and A.F. Koenderink,
Information advantage in sensing revealed by Fano-resonant Fourier scatterometry
, Nat. Commun.
16
, (1), 11388: 1-11 (2025)
H.K. Schubert,
Laser-Induced Modulation, Vaporization; and Plasma Formation of Free-Flying Liquid Tin Sheets
, Vrije Universiteit Amsterdam, VU, 2025-12-09
M.P. Domínguez, R. Büchner, M. Fondell and A.M. Brouwer,
Photochemistry of Aromatic N‐Oxides in Water Probed by Time‐Resolved X‐ray Absorption Spectroscopy
, Chem. Eur. J., e02775: 1-13 (2025)
D.J. Engels,
Solid-state-laser-driven vaporization and ionization of tin: for extreme ultraviolet light sources
, Vrije Universiteit Amsterdam, VU, 2025-11-26
F. Zhang, X. Liu, A. Pelekanidis, M. Gouder, K.S.E. Eikema and S. Witte,
Material-Sensitive and Thickness-Resolved Transmission Imaging Using Coherent Extreme Ultraviolet Radiation
, ACS Photonics, (2025)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Short-Wavelength Light Sources for EUV Metrology
Angana Mondal
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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Contact
ARCNL Newsletter