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Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
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Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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J. Mathijssen,
High-order harmonic generation in laser-produced plasmas
, VU University Amsterdam, 2025-03-25
P. van Essen, B. de Keijzer, T. Horen, E.B. Molinero, A. Jiménez Galán, R.E.F. Silva and P.M. Kraus,
Spatial polarization gating of high-harmonic generation in solids
, Phys. Rev. Res.
7
, (1), L012063: 1-6 (2025)
L. Oltra, L. Méndez, I. Rabadán, K. Bijlsma, E. de Wit and R. Hoekstra,
Sequential Synchronous Mechanism for Double-Electron Capture: Insights into Unforeseen Large Cross Sections in Low-Energy Sn3++H2 Collisions
, Phys. Rev. Lett.
134
, (9), 093002: 1-6 (2025)
A. Pelekanidis, F. Zhang, K.S.E. Eikema and S. Witte,
Generation Dynamics of Broadband Extreme Ultraviolet Vortex Beams
, ACS Photonics
12
, (3), 1638-1649 (2025)
C. Leriche,
Visualizing, quantifying, and understanding nanowear of multi-asperity contacts
, University of Amsterdam, 2025-02-25
T.J. van den Hooven and P.C.M. Planken,
Wavelength-dependent optical detection of strain waves near intrinsic and artificial optical resonances
, Opt. Lett.
50
, (5), 1445-1448 (2025)
E. de Wit, L. Tinge, K. Bijlsma and R. Hoekstra,
Single and Double Electron Capture by 1–16 keV Sn4+ Ions Colliding on H2
, Atoms
13
, (2), 12: 1-9 (2025)
Y. Mostafa,
Mass & Energy Efficient Tin Laser Produced Plasma Light Sources
, VU University Amsterdam, 2025-01-10
E. Abram, N. Orlov, E.C. Garnett and P.C.M. Planken,
Sub-ablation-threshold light-induced modification of thin ruthenium layers detected using optical reflectance
, J. Appl. Phys.
136
, (24), 245305: 1-14 (2024)
Z. Lyu,
High-resolution Imaging Through a Multimode Fiber: From Raster-scanning to Compressive Sensing
, VU University Amsterdam, 2024-12-11
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
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Events
Repository
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ARCNL Newsletter