Publications - ARCNL

L. Wu, I. Bespalov, K. Witte, O. Lugier, J. Haitjema, M. Vockenhuber, Y. Ekinci, B. Watts, A.M. Brouwer and S. Castellanos, Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy, J.Mater.Chem.C, (2020)
N. Thakur, R. Bliem, I. Mochi, M. Vockenhuber, Y. Ekinci and S. Castellanos, Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography, J.Mater.Chem.C, (2020)
V. Verrina, S. Edward, H. Zhang, A. Antoncecchi, S. Witte and P.C.M. Planken, Role of scattering by surface roughness in the photoacoustic detection of hidden micro-structures, Appl.Opt., (2020)
R. Röhrich, G. Oliveri, S. Kovaios, V.T. Tenner, A. den Boef, J.T.B. Overvelde and A.F. Koenderink, Uncertainty estimation and design optimization of 2D diffraction-based overlay metrology targets, ACS Photonics, (2020)
Z. Bouza, J. Scheers, A.N. Ryabtsev, R. Schupp, L. Behnke, C. Shah, J. Sheil, M. Bayraktar, J.R. Crespo López-Urrutia, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, EUV spectroscopy of Sn5-Sn10+ions in an electron beam ion trap and laser-produced plasmas, J. Phys. B: At. At. Mol. Opt. Phys. 53, 19: 195001: 1-11 (2020)
V. Verrina, S. Edward, H. Zhang, S. Witte and P.C.M. Planken, Photoacoustic detection of low duty cycle gratings through optically opaque layers, Appl.Phys.Lett. 117, 5: 051104: 1-6 (2020)
S. Edward, H. Zhang, S. Witte and P.C.M. Planken, Laser-induced ultrasonics for detection of low-amplitude grating through metal layers with finite roughness, Opt. Express 28, 16: 23374-23387 (2020)
J. Scheers, R. Schupp, R.A. Meijer, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Time- and space-resolved optical Stark spectroscopy in the afterglow of laser-produced tin-droplet plasma, Phys.Rev.E 102, 1: 013204: 1-9 (2020)
S. Edward, H. Zhang, I. Setija, V. Verrina, A. Antoncecchi, S. Witte and P.C.M. Planken, Detection of hidden gratings through multilayer nanostructures using light and sound, Phys. Rev. Appl. 14, 1: 014015-1-16 (2020)
O. Lugier, A. Troglia, N. Sadegh, L. Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos, Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers, J. Photopolym. Sci. Tec. 33, 2: 229-234 (2020)

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