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Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Short-Wavelength Light Sources for EUV Metrology
Angana Mondal
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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A. Ivanina, B. Lochocki, A. Koglbauer, S. Sokolov, S.A. Goorden and L.V. Amitonova,
Transmission matrix of a multimode fiber: In-line vs off-axis holography
, PLOS ONE
21
, (2), e0340823: 1-14 (2026)
F. Bijloo, M Ogienko, A.J. den Boef, P.M. Kraus and A.F. Koenderink,
All-Optical Nonlinear Real and Fourier-Space Shaping with All-Dielectric Fano Resonant Metasurfaces
, ACS Nano
20
, (6), 4845-4854 (2026)
T. Vernooij, H.T. Çiftçi, N. Shahidzadeh and B. Weber,
Amorphous CaSO4 nanocrystal deposits for friction and wear reduction at silicon interfaces
, Wear
586
, 206457: 1-6 (2026)
L. Guery, F. Bijloo and P.M. Kraus,
Digital Holography Using Harmonic Generation from Solids for Reconstruction of Subwavelength Nanostructures
, ACS Photonics
13
, (4), 1055-1064 (2026)
K. Murzyn, T.W.P. van Horen and P.M. Kraus,
Control and scaling of nonlinear emission for super-resolution microscopy
, Optica
13
, (1), 164-171 (2026)
T.N. Hogenelst, C. Leriche, A. Troglia, B. Weber and R. Bliem,
Pulsed laser deposition of (TaNbHfTiZr)C high-entropy carbide layers with 38 GPa hardness
, Surf. Coat. Technol.
520
, 132976: 1-10 (2026)
L. de Wolf, M. Lipp, M. Cochez, A.J. den Boef and L.V. Amitonova,
Vision Transformer network for optical overlay metrology on semiconductor wafers
, APL Mach. Learn.
4
, (1), 016101: 1-10 (2026)
H.T. Çiftçi, J. Cottom, R. Hahury, E. Olsson and B. Weber,
Adhesion Control Through Electric Field-Induced Water Adsorption at Oxidized Silicon Interfaces
, Tribol. Lett.
74
, (1), 4: 1-10 (2026)
F. Bijloo,
Dynamic nonlinear light control and metrology with resonant metasurfaces
, University of Amsterdam, UvA, 2025-12-17
N. Feldman,
Optical Metasurfaces for Information Efficient Nanoscale Metrology
, University of Amsterdam, UvA, 2025-12-17
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Short-Wavelength Light Sources for EUV Metrology
Angana Mondal
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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People
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Events
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Contact
ARCNL Newsletter