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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • M.C. Velsink, M. Illienko, K. Chaudhary and S. Witte, Improving signal-to-noise ratios in pump-probe spectroscopy on light-sensitive samples by adapting pulse repetition rates, Opt. Express 33, (11), 23632-23632 (2025)

  • M. Illienko, K. Chaudhary, M.C. Velsink and S. Witte, Characterization of Sub-Optical-Wavelength Structures through Optically Opaque Films Using Picosecond Ultrasonics, Nano Lett., (2025)

  • L. Cruciani, Ruthenium thin films: terahertz generation and direct laser patterning, University of Amsterdam, 2025-05-01

  • S. van Vliet, Surface chemistry of ruthenium, University of Amsterdam, 2025-04-30

  • L. Peng, T. Roch, D. Bonn and B. Weber, Decrease of Static Friction Coefficient with Interface Growth from Single to Multiasperity Contact, Phys. Rev. Lett. 134, (17), 176202: 1-7 (2025)

  • P. Ducarme, B. Weber, M. van Hecke and J.T.B. Overvelde, Exotic mechanical properties enabled by countersnapping instabilities, PNAS 122, (16), e2423301122: 1-8 (2025)

  • J. Cottom, Q. Cai and E. Olsson, Vacancy enhanced Li, Na, and K clustering on graphene, Sustain. Energy Fuels, (2025)

  • A. Pelekanidis, K.S.E. Eikema and S. Witte, Far-field optical propagators with user-defined object-plane pixel size for ptychography, Opt. Continuum 4, (4), 804-825 (2025)

  • A. Ivanina, M. Marshall, K. Abrashitova, T. van Leeuwen and L.V. Amitonova, Quantitative phase imaging with a multimode fiber, APL Photonics 10, (4), 046116 : 1-11 (2025)

  • J. Mathijssen, High-order harmonic generation in laser-produced plasmas, VU University Amsterdam, 2025-03-25

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter