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    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • N. Sadegh, Spectroscopic investigations of photon-induced reactions in tin-oxo cage photoresists, University of Amsterdam, 2023-09-20

  • J. Sheil, J. Colgan and O.O. Versolato: Atomic Origins of EUV Light In: Photon Sources for Lithography and Metrology, V. Bakshi, Ed., SPIE Press, Bellingham, Washington, SPIE., 2023. - pp. 111-148

  • C. Leriche, C. Xiao, S.E. Franklin and B. Weber, From atomic attrition to mild wear at multi-asperity interfaces: The wear of hard Si3N4 repeatedly contacted against soft Si, Wear 528-529, 204975: 1-8 (2023)

  • M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef: Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy In: Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE., 2023. - pp. 126180W: 1-6

  • Y. Mostafa, Z. Bouza, J. Byers, I. Babenko, W.M.G. Ubachs, O.O. Versolato and M. Bayraktar, Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates, Opt. Lett. 48, (16), 4316-4318 (2023)

  • L. Poirier, A. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato, Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4–40×10^10 W/cm2 range, Phys. Plasmas 30, (8), 083505 : 1-10 (2023)

  • L.P. Behnke, E.J. Salumbides, G. Göritz, Y. Mostafa, D. Engels, W.M.G. Ubachs and O.O. Versolato, High-energy parametric oscillator and amplifier pulsed light source at 2-μm, Opt. Express 31, (15), 24142-24156 (2023)

  • G. Yetik, Thermal Stability of Nanolayers for EUV Optics, University of Amsterdam, 2023-07-06

  • J. Guo, Y. Liu, L. Duan, F. Zhang and C. Xiao, Towards a deeper understanding of temperature-dependent material removal of single-crystal AlN: An atomistic study, Tribol.Int. 185, 108575: 1-10 (2023)

  • B. Liu, R.A. Meijer, W. Li, J. Hernandez-Rueda, H. Gelderblom and O.O. Versolato, Mass partitioning in fragmenting tin sheets, Phys. Rev. Appl. 20, (1), 014048: 1-18 (2023)

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter