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Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
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Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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C. Leriche,
Visualizing, quantifying, and understanding nanowear of multi-asperity contacts
, University of Amsterdam, 2025-02-25
T.J. van den Hooven and P.C.M. Planken,
Wavelength-dependent optical detection of strain waves near intrinsic and artificial optical resonances
, Opt. Lett.
50
, (5), 1445-1448 (2025)
E. de Wit, L. Tinge, K. Bijlsma and R. Hoekstra,
Single and Double Electron Capture by 1–16 keV Sn4+ Ions Colliding on H2
, Atoms
13
, (2), 12: 1-9 (2025)
Y. Mostafa,
Mass & Energy Efficient Tin Laser Produced Plasma Light Sources
, VU University Amsterdam, 2025-01-10
E. Abram, N. Orlov, E.C. Garnett and P.C.M. Planken,
Sub-ablation-threshold light-induced modification of thin ruthenium layers detected using optical reflectance
, J. Appl. Phys.
136
, (24), 245305: 1-14 (2024)
Z. Lyu,
High-resolution Imaging Through a Multimode Fiber: From Raster-scanning to Compressive Sensing
, VU University Amsterdam, 2024-12-11
O.O. Versolato, I. Kaganovich, K. Bera, T. Lill, H.-C. Lee, R. Hoekstra, J. Sheil and S.K. Nam,
Plasma sources for advanced semiconductor applications
, Appl. Phys. Lett.
125
, (23), 230401: 1-9 (2024)
Z. Lyu, S.-T. Hung, C.S. Smith and L.V. Amitonova,
Speckle-based 3D sub-diffraction imaging of sparse samples through a multimode fiber
, APL Photonics
9
, (12), 126104: 1-10 (2024)
A. Troglia, C. Leriche, M.L. van de Poll, C. Morsche, G.H. ten Brink, B.J. Kooi, B. Weber and R. Bliem,
Bridging the gap between high-entropy alloys and metallic glasses: Control over disorder and mechanical properties of coatings
, Mater. Today Commun.
41
, 110604: 1-10 (2024)
N. Feldman, K.M.M. Goeloe, A.J. den Boef, L.V. Amitonova and A.F. Koenderink,
Nanometer Interlaced Displacement Metrology Using Diffractive Pancharatnam-Berry and Detour Phase Metasurfaces
, ACS Photonics, (2024)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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Events
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ARCNL Newsletter