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S. Edward, A. Antoncecchi, H. Zhang, H. Sielken, S. Witte and P.C.M. Planken,
Detection of periodic structures through opaque metal layers by optical measurements of ultrafast electron dynamics
, Opt. Express
26
, 18: 23380-23396 (2018)
A. Stodolna, R. de Faria Pinto, F. Ali, A. Bayerle, D. Kurilovich, J. Mathijssen, R. Hoekstra, O.O. Versolato, K.S.E. Eikema and S. Witte,
Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair
, J.Appl.Phys
124
, 053303: 1-7 (2018)
S.A. Reijers, D. Kurilovich, F. Torretti, H. Gelderblom and O.O. Versolato,
Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light
, J.Appl.Phys
124
, 013102: 1-7 (2018)
J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos and A.M. Brouwer,
Photo-Induced Fragmentation of a Tin-Oxo Cage Compound
, J. Photopolymer. Sci.Tec.
31
, 2: 243-247 (2018)
Y. Zhang, J. Haitjema, M. Baljozovic, M. Vockenhuber, D. Kazazis, T. Jung, Y. Ekinci and A.M. Brouwer,
Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure
, J. Photopolymer. Sci.Tec.
31
, 2: 249-255 (2018)
G.S.M. Jansen, A. de Beurs, X. Liu, K.S.E. Eikema and S. Witte,
Diffractive shear interferometry for extreme ultraviolet high-resolution lensless imaging
, Opt. Express
26
, 10: 12479-12489 (2018)
R. Fallica, J. Haitjema, L. Wu, S. Castellanos, A.M. Brouwer and Y. Ekinci,
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
, J. Micro/Nanolith. MEMS MOEMS
17
, 2: 023505: 1-7 (2018)
J.L. Ellis, K.M. Dorney, D.D. Hickstein, N.J. Brooks, C. Gentry, C. Hernández-García, D. Zusin, J.M. Shaw, Q.L. Nguyen, C.A. Mancuso, G.S. Matthijs Jansen, S. Witte, H.C. Kapteyn and M.M. Murnane,
High harmonics with spatially varying ellipticity
, Optica
5
, 4: 479-485 (2018)
A. Bayerle, M.J. Deuzeman, S. van der Heijden, D. Kurilovich, R. de Faria Pinto, A. Stodolna, S. Witte, K.S.E. Eikema, W. Ubachs, R. Hoekstra and O.O. Versolato,
Sn ion energy distributions of ns- and ps-laser produced plasmas
, Plasma Sources Sci. Technol.
27
, 045001:1-8 (2018)
S. Castellanos, L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, Y. Ekinci and T. Jung:
Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
In:
Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography held 25 February - 1 March 2018 San Jose, California, United States, SPIE., 2018. - pp. 105830A: 1-12 (Proceedings SPIE; 10583)
