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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

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  • T.N. Hogenelst, C. Leriche, A. Troglia, B. Weber and R. Bliem, Pulsed laser deposition of (TaNbHfTiZr)C high-entropy carbide layers with 38 GPa hardness, Surf. Coat. Technol. 520, 132976: 1-10 (2026)

  • L. de Wolf, M. Lipp, M. Cochez, A.J. den Boef and L.V. Amitonova, Vision Transformer network for optical overlay metrology on semiconductor wafers, APL Mach. Learn. 4, (1), 016101: 1-10 (2026)

  • N. Sadegh, J. Haitjema, Y. Zhang, L. Wu, O.C.M. Lugier, I. Bespalov, D. Kazazis, M. Vockenhuber, Y. Ekinci, K. Witte, B. Watts, I. Pollentier, D. De Simone and A.M. Brouwer, Extreme ultraviolet induced reactions of tin–oxo cage photoresists, J. Mater. Chem. C, (2026)

  • H.T. Çiftçi, J. Cottom, R. Hahury, E. Olsson and B. Weber, Adhesion Control Through Electric Field-Induced Water Adsorption at Oxidized Silicon Interfaces, Tribol. Lett. 74, (1), 4: 1-10 (2026)

  • S.J.J. de Lange, J. Gonzales, D.J. Engels, F.M. Kohlmeier and J. Sheil, Ion emission properties of tin plasmas generated by 2 µm-wavelength laser pulses, Plasma Sources Sci. Technol. 34, (12), 125013: 1-10 (2025)

  • F. Bijloo, Dynamic nonlinear light control and metrology with resonant metasurfaces, University of Amsterdam, UvA, 2025-12-17

  • N. Feldman, Optical Metasurfaces for Information Efficient Nanoscale Metrology, University of Amsterdam, UvA, 2025-12-17

  • F. Zhang, Methods and Applications of Extreme Ultraviolet Multi-Wavelength Ptychography in Nanoscale Imaging, University of Amsterdam, UvA, 2025-12-11

  • N. Feldman, A.J. den Boef, L.V. Amitonova and A.F. Koenderink, Information advantage in sensing revealed by Fano-resonant Fourier scatterometry, Nat. Commun. 16, (1), 11388: 1-11 (2025)

  • R. van der Linden, N. Kuzkova and P.M. Kraus, Nonlinear refractive index measurements of solids and the impact of B-integral on the phase of generated high-order harmonics, Opt. Express 33, (25), 53268: 1-11 (2025)

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter