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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • J. Cottom, Q. Cai and E. Olsson, Vacancy enhanced Li, Na, and K clustering on graphene, Sustain. Energy Fuels, (2025)

  • A. Pelekanidis, K.S.E. Eikema and S. Witte, Far-field optical propagators with user-defined object-plane pixel size for ptychography, Opt. Continuum 4, (4), 804-825 (2025)

  • L. de Reus, Investigating Tin Vapor Broadening and Shifting Mechanisms for Gas Parameter Extraction Using UV Shadowgraphy, Eindhoven University of Technology, 2025-04-09

  • A. Ivanina, M. Marshall, K. Abrashitova, T. van Leeuwen and L.V. Amitonova, Quantitative phase imaging with a multimode fiber, APL Photonics 10, (4), 046116 : 1-11 (2025)

  • J. Mathijssen, High-order harmonic generation in laser-produced plasmas, VU University Amsterdam, 2025-03-25

  • P. van Essen, B. de Keijzer, T. Horen, E.B. Molinero, A. Jiménez Galán, R.E.F. Silva and P.M. Kraus, Spatial polarization gating of high-harmonic generation in solids, Phys. Rev. Res. 7, (1), L012063: 1-6 (2025)

  • L. Oltra, L. Méndez, I. Rabadán, K. Bijlsma, E. de Wit and R. Hoekstra, Sequential Synchronous Mechanism for Double-Electron Capture: Insights into Unforeseen Large Cross Sections in Low-Energy Sn3++H2 Collisions, Phys. Rev. Lett. 134, (9), 093002: 1-6 (2025)

  • L. Kemme, A Molecular Dynamics Study of the Elastic Properties of Cu-Zr-Al Metallic Glasses, University of Amsterdam, 2025-03-04

  • A. Pelekanidis, F. Zhang, K.S.E. Eikema and S. Witte, Generation Dynamics of Broadband Extreme Ultraviolet Vortex Beams, ACS Photonics 12, (3), 1638-1649 (2025)

  • C. Leriche, Visualizing, quantifying, and understanding nanowear of multi-asperity contacts, University of Amsterdam, 2025-02-25

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter