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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
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EUV Generation & Imaging
Stefan Witte
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Short-Wavelength Light Sources for EUV Metrology
Angana Mondal
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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H.T. Çiftçi, J. Cottom, R. Hahury, E. Olsson and B. Weber,
Adhesion Control Through Electric Field-Induced Water Adsorption at Oxidized Silicon Interfaces
, Tribol. Lett.
74
, (1), 4: 1-10 (2026)
S.J.J. de Lange, J. Gonzales, D.J. Engels, F.M. Kohlmeier and J. Sheil,
Ion emission properties of tin plasmas generated by 2 µm-wavelength laser pulses
, Plasma Sources Sci. Technol.
34
, (12), 125013: 1-10 (2025)
F. Bijloo,
Dynamic nonlinear light control and metrology with resonant metasurfaces
, University of Amsterdam, UvA, 2025-12-17
N. Feldman,
Optical Metasurfaces for Information Efficient Nanoscale Metrology
, University of Amsterdam, UvA, 2025-12-17
F. Zhang,
Methods and Applications of Extreme Ultraviolet Multi-Wavelength Ptychography in Nanoscale Imaging
, University of Amsterdam, UvA, 2025-12-11
R. van der Linden, N. Kuzkova and P.M. Kraus,
Nonlinear refractive index measurements of solids and the impact of B-integral on the phase of generated high-order harmonics
, Opt. Express
33
, (25), 53268: 1-11 (2025)
N. Feldman, A.J. den Boef, L.V. Amitonova and A.F. Koenderink,
Information advantage in sensing revealed by Fano-resonant Fourier scatterometry
, Nat. Commun.
16
, (1), 11388: 1-11 (2025)
H.K. Schubert,
Laser-Induced Modulation, Vaporization; and Plasma Formation of Free-Flying Liquid Tin Sheets
, Vrije Universiteit Amsterdam, VU, 2025-12-09
M.P. Domínguez, R. Büchner, M. Fondell and A.M. Brouwer,
Photochemistry of Aromatic N‐Oxides in Water Probed by Time‐Resolved X‐ray Absorption Spectroscopy
, Chem. Eur. J., e02775: 1-13 (2025)
D.J. Engels,
Solid-state-laser-driven vaporization and ionization of tin: for extreme ultraviolet light sources
, Vrije Universiteit Amsterdam, VU, 2025-11-26
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Short-Wavelength Light Sources for EUV Metrology
Angana Mondal
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact
ARCNL Newsletter