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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Y. Mostafa, L. Behnke, D.J. Engels and O.O. Versolato,
Mass use in 2 μm laser-driven tin plasma using sheet targets
, J. Appl. Phys.
138
, (14), 143304: 1-8 (2025)
H.L. França, H.K. Schubert, O.O. Versolato and M. Jalaal,
Laser-induced droplet deformation: curvature inversion explained from instantaneous pressure impulse
, J. Fluid Mech.
1020
, A21: 1-29 (2025)
C. Leriche, E. Pedretti, O. Sahin, D. Kang, M.C. Righi and B. Weber,
Passivation Species Suppress Atom-by-Atom Wear of Microcrystalline Diamond
, ACS Appl. Mater. Interfaces
17
, (39), 55511-55520 (2025)
A. Pelekanidis,
Multi-wavelength extreme ultraviolet ptychography for imaging and wavefront sensing
, VU University Amsterdam, 2025-09-17
H.K. Schubert, D.J. Engels, M. Kharbedia, H. Gelderblom and O.O. Versolato,
Observation of discrete concentric surface modulations on free-flying liquid tin sheets
, Phys. Fluids
37
, (9), 094108: 1-13 (2025)
F. Bijloo, A.J. den Boef, P.M. Kraus and A.F. Koenderink,
Structure-in-Void Quasi-Bound State in the Continuum Metasurface for Deeply Subwavelength Nanostructure Metrology
, ACS Nano, (2025)
H. Brookhuis:
ASML en de Nederlandse natuurkunde: Een geschiedenis van het Advanced Research Center for Nanolithography (ARCNL, 2014-2024)
Amsterdam University Press (AUP), 2025.
H. Brookhuis:
ASML and Dutch Physics: A History of the Advanced Research Center for Nanolithography (ARCNL), 2014-2024
Amsterdam University Press (AUP), 2025.
T.J. van den Hooven, L. Cruciani and P.C.M. Planken,
Broadband optical detection of strain waves in a thin ruthenium film
, Opt. Express
33
, (16), 33232-33247 (2025)
J. Cottom, L. Hückmann, J. Meyer and E. Olsson,
Forged by Charge: Polaron-Induced Matrix Formation in Silicon Nitride Conversion-Type Anodes for Lithium-ion Batteries
, J. Mater. Chem. A, (2025)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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People
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Events
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Contact
ARCNL Newsletter