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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • L. Peng, S. Kooij, H.T. Çiftçi, D. Bonn and B. Weber, Strong electroadhesion at low voltage enabled by nanoscale roughness, Phys. Rev. Res. 8, (3), 033143: 1-7 (2026)

  • M. Kharbedia, H. França, H.K. Schubert, D.J. Engels, M. Jalaal and O.O. Versolato, Singular jets in free-falling droplets, Phys. Rev. Fluids 11, (7), 073602: 1-21 (2026)

  • D.B. Dias, G.G. Mentasti, A. Gupta, A. Lambertz, E. Alarcón-Lladó, P. Schall, R. Bliem and J. van de Groep, Large-Area Deterministic Stamping of 2D Materials on Patterned Surfaces, ACS Nano 20, (29), 20611-20622 (2026)

  • K. Murzyn, Controlling high-harmonic generation from solids for subdiffraction imaging, Vrije Universiteit Amsterdam, VU, 2026-07-01

  • A. Ivanina, Engineering Illumination Through Multimode Fibers for Imaging and Metrology, Vrije Universiteit Amsterdam, VU, 2026-06-23

  • R.A. Meijer, G. Lajoinie, B. Liu, S. Witte and O.O. Versolato, Controlled interference of laser-induced shock waves in microdroplet jetting, Phys. Rev. Res. 8, (2), 023287: 1-7 (2026)

  • M. Illienko, Picosecond Ultrasonics for Nanoscale Subsurface Structural Characterization, Vrije Universiteit Amsterdam, VU, 2026-06-08

  • A. Karpavicius, M. Gouder and S. Witte, High-speed computational imaging achieved by fly-scan ptychography, Opt. Express 34, (12), 21563: 1-14 (2026)

  • A. Tiede, N. Feldman, A. Lambertz, A.F. Koenderink, A. Fontcuberta i Morral and E. Alarcón-Lladó, Blob detection for photonic metasurface designing: angular and spectral control of scattered light, Adv. Photonics 8, (3), 036005: 1-10 (2026)

  • F. Corazza, E. Kechaoglou, L. Guery, Z. Nie, P. Phadke, C.S. Lehmann, R. Bliem and P.M. Kraus, Broadband extreme ultraviolet zeroth order scatterometry for nanostructure metrology, Nat. Commun. 17, (1) (2026)

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter