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Paul Planken
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Arie den Boef
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Peter Kraus
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Lyuba Amitonova
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Bart Weber
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Roland Bliem
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Emilia Olsson
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Y. Mostafa,
Mass & Energy Efficient Tin Laser Produced Plasma Light Sources
, VU University Amsterdam, 2025-01-10
E. Abram, N. Orlov, E.C. Garnett and P.C.M. Planken,
Sub-ablation-threshold light-induced modification of thin ruthenium layers detected using optical reflectance
, J. Appl. Phys.
136
, (24), 245305: 1-14 (2024)
Z. Lyu,
High-resolution Imaging Through a Multimode Fiber: From Raster-scanning to Compressive Sensing
, VU University Amsterdam, 2024-12-11
A. Troglia, C. Leriche, M.L. van de Poll, C. Morsche, G.H. ten Brink, B.J. Kooi, B. Weber and R. Bliem,
Bridging the gap between high-entropy alloys and metallic glasses: Control over disorder and mechanical properties of coatings
, Mater. Today Commun.
41
, 110604: 1-10 (2024)
Z. Lyu, S.-T. Hung, C.S. Smith and L.V. Amitonova,
Speckle-based 3D sub-diffraction imaging of sparse samples through a multimode fiber
, APL Photonics
9
, (12), 126104: 1-10 (2024)
N. Feldman, K.M.M. Goeloe, A.J. den Boef, L.V. Amitonova and A.F. Koenderink,
Nanometer Interlaced Displacement Metrology Using Diffractive Pancharatnam-Berry and Detour Phase Metasurfaces
, ACS Photonics, (2024)
T. van Gardingen-Cromwijk, S.G.J. Mathijssen, M. Noordam, S. Witte, J.F. de Boer and A.J. den Boef,
Enhancing diffraction-based overlay metrology capabilities in digital holographic microscopy using model-based signal separation
, J. Micro/Nanopattern. Mater. Metrol.
23
, (4), 044006: 1-14 (2024)
J. Cottom, S. van Vliet, J. Meyer, R. Bliem and E. Olsson,
Coverage-Dependent Stability of RuxSiy on Ru(0001): A Comparative DFT and XPS Study
, Phys. Chem. Chem. Phys.
26
, (46), 28793-28799 (2024)
K. Murzyn, M.L.S. van der Geest, L. Guery, Z. Nie, P. van Essen, S. Witte and P.M. Kraus,
Breaking Abbe’s diffraction limit with harmonic deactivation microscopy
, Sci. Adv.
10
, (46), eadp3056: 1-8 (2024)
Z. Nie, K. Murzyn, L. Guery, T.J. van den Hooven and P.M. Kraus,
Ultrafast Permittivity Engineering Enables Broadband Enhancement and Spatial Emission Control of Harmonic Generation in ZnO
, ACS Photonics
11
, (12), 5084-5050 (2024)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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ARCNL Newsletter