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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

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  • Articles
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  • T.N. Hogenelst, C. Leriche, A. Troglia, B. Weber and R. Bliem, Pulsed laser deposition of (TaNbHfTiZr)C high-entropy carbide layers with 38 GPa hardness, Surf. Coat. Technol. 520, 132976: 1-10 (2026)

  • H.T. Çiftçi, J. Cottom, R. Hahury, E. Olsson and B. Weber, Adhesion Control Through Electric Field-Induced Water Adsorption at Oxidized Silicon Interfaces, Tribol. Lett. 74, (1), 4: 1-10 (2026)

  • N. Feldman, Optical Metasurfaces for Information Efficient Nanoscale Metrology, University of Amsterdam, UvA, 2025-12-17

  • F. Bijloo, Dynamic nonlinear light control and metrology with resonant metasurfaces, University of Amsterdam, UvA, 2025-12-17

  • R. van der Linden, N. Kuzkova and P.M. Kraus, Nonlinear refractive index measurements of solids and the impact of B-integral on the phase of generated high-order harmonics, Opt. Express 33, (25), 53268: 1-11 (2025)

  • N. Feldman, A.J. den Boef, L.V. Amitonova and A.F. Koenderink, Information advantage in sensing revealed by Fano-resonant Fourier scatterometry, Nat. Commun. 16, (1), 11388: 1-11 (2025)

  • H.K. Schubert, Laser-Induced Modulation, Vaporization; and Plasma Formation of Free-Flying Liquid Tin Sheets, Vrije Universiteit Amsterdam, VU, 2025-12-09

  • M.P. Domínguez, R. Büchner, M. Fondell and A.M. Brouwer, Photochemistry of Aromatic N‐Oxides in Water Probed by Time‐Resolved X‐ray Absorption Spectroscopy, Chem. Eur. J., e02775: 1-13 (2025)

  • D.J. Engels, Solid-state-laser-driven vaporization and ionization of tin: for extreme ultraviolet light sources, Vrije Universiteit Amsterdam, VU, 2025-11-26

  • F. Zhang, X. Liu, A. Pelekanidis, M. Gouder, K.S.E. Eikema and S. Witte, Material-Sensitive and Thickness-Resolved Transmission Imaging Using Coherent Extreme Ultraviolet Radiation, ACS Photonics, (2025)

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter