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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • A. Troglia, C. Leriche, M.L. van de Poll, C. Morsche, G.H. ten Brink, B.J. Kooi, B. Weber and R. Bliem, Bridging the gap between high-entropy alloys and metallic glasses: Control over disorder and mechanical properties of coatings, Mater. Today Commun. 41, 110604: 1-10 (2024)

  • N. Feldman, K.M.M. Goeloe, A.J. den Boef, L.V. Amitonova and A.F. Koenderink, Nanometer Interlaced Displacement Metrology Using Diffractive Pancharatnam-Berry and Detour Phase Metasurfaces, ACS Photonics, (2024)

  • T. van Gardingen-Cromwijk, S.G.J. Mathijssen, M. Noordam, S. Witte, J.F. de Boer and A.J. den Boef, Enhancing diffraction-based overlay metrology capabilities in digital holographic microscopy using model-based signal separation, J. Micro/Nanopattern. Mater. Metrol. 23, (4), 044006: 1-14 (2024)

  • J. Cottom, S. van Vliet, J. Meyer, R. Bliem and E. Olsson, Coverage-Dependent Stability of RuxSiy on Ru(0001): A Comparative DFT and XPS Study, Phys. Chem. Chem. Phys. 26, (46), 28793-28799 (2024)

  • K. Murzyn, M.L.S. van der Geest, L. Guery, Z. Nie, P. van Essen, S. Witte and P.M. Kraus, Breaking Abbe’s diffraction limit with harmonic deactivation microscopy, Sci. Adv. 10, (46), eadp3056: 1-8 (2024)

  • Z. Nie, K. Murzyn, L. Guery, T.J. van den Hooven and P.M. Kraus, Ultrafast Permittivity Engineering Enables Broadband Enhancement and Spatial Emission Control of Harmonic Generation in ZnO, ACS Photonics 11, (12), 5084-5050 (2024)

  • M. Verhage, H.T. Çiftçi, M. Reul, T. Cromwijk, T.J.N. van Stralen, B. Koopmans, O. Kurnosikov and K. Flipse, Switchable-magnetization planar probe MFM sensor for imaging magnetic textures of complex metal oxide perovskite, J. Appl. Phys. 136, (18), 184504: 1-10 (2024)

  • A. Pelekanidis, F. Zhang, M. Gouder, J. Seifert, M. Du, K.S.E. Eikema and S. Witte, Illumination diversity in multiwavelength extreme ultraviolet ptychography, Photon. Res. 12, (12), 2757-2771 (2024)

  • F. Zhang, A. Pelekanidis, A. Karpavicius, M. Gouder, J. Seifert, K.S.E. Eikema and S. Witte, Characterizing post-compression of mJ-level ultrafast pulses via loose focusing in a gas cell, Opt. Express 32, (23), 40990-40990 (2024)

  • S. Payá, N. Diez, J. Cottom, E. Olsson and M. Sevilla, MgSO4 as an Effective, Low-Temperature Sulfur Dopant for Carbon Materials Enabling Fast Sodium Storage, ACS Appl. Energy Mater. 7, (21), 10061-10072 (2024)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter