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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

Category
  • Articles
  • Bachelor Thesis
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  • Master Thesis
  • Proceedings
  • Theses
  • M. Noordam, T. van Gardingen-Cromwijk and A.J. den Boef, Diffraction-based overlay metrology using polarization-resolved dark-field digital holographic microscopy, J. Micro/Nanopattern. Mater. Metrol. 24, (01), 014002: 1-13 (2025)

  • T.J. van den Hooven and P.C.M. Planken, Wavelength-dependent optical detection of strain waves near intrinsic and artificial optical resonances, Opt. Lett. 50, (5), 1445-1448 (2025)

  • J. Gonzalez and J. Sheil, Langdon effect in the realm of extreme ultraviolet source plasmas, Phys. Rev. E 111, (2), L023201: 1-6 (2025)

  • J. Kim, T. van Gardingen-Cromwijk, M. Noordam, M. Adhikary, J.F. de Boer, C. Park, Y. Kang and A.J. den Boef, Correcting spurious apodization effects in digital holographic microscopy using a simple Fourier transform spectrometer, Opt. Continuum 4, (2), 382-395 (2025)

  • E. de Wit, L. Tinge, K. Bijlsma and R. Hoekstra, Single and Double Electron Capture by 1–16 keV Sn4+ Ions Colliding on H2, Atoms 13, (2), 12: 1-9 (2025)

  • C. Xiao, L. Peng, C. Leriche, F.-C. Hsia, B. Weber and S.E. Franklin, Corrigendum to “Capillary adhesion governs the friction behavior of electrochemically corroded polycrystalline diamond” [Carbon 205 (2023) 345–352], Carbon 232, 119773: 1-1 (2025)

  • Y. Mostafa, Mass & Energy Efficient Tin Laser Produced Plasma Light Sources, VU University Amsterdam, 2025-01-10

  • K. Chaudhary, M. Illienko, T.J. van den Hooven, S. Witte and P.C.M. Planken, Optically enhancing and controlling photoacoustic signals using ultra-thin semiconductor coatings on metal surfaces, Opt. Express 33, (1), 199-214 (2025)

  • E. Abram, N. Orlov, E.C. Garnett and P.C.M. Planken, Sub-ablation-threshold light-induced modification of thin ruthenium layers detected using optical reflectance, J. Appl. Phys. 136, (24), 245305: 1-14 (2024)

  • Z. Lyu, High-resolution Imaging Through a Multimode Fiber: From Raster-scanning to Compressive Sensing, VU University Amsterdam, 2024-12-11

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter