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Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
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Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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K. Bijlsma,
Electron capture in collisions of tin ions with molecular hydrogen
, University of Groningen, 2024-06-18
M.J. Mekkering, P.C.M. Laan, A. Troglia, R. Bliem, A.C. Kizilkaya, G. Rothenberg and N. Yan,
Bottom-Up Synthesis of Platinum Dual-Atom Catalysts on Cerium Oxide
, ACS Catal.
14
, (13), 9850-9859 (2024)
M. Illienko, M.C. Velsink and S. Witte,
Understanding photoacoustic signal formation in the presence of transparent thin films
, Photoacoustics
38
, 100617: 1-8 (2024)
H.K. Schubert, D.J. Engels, R.A. Meijer, B. Liu and O.O. Versolato,
Scaling relations in laser-induced vaporization of thin free-flying liquid metal sheets
, Phys. Rev. Res.
6
, (2), 023182: 1-12 (2024)
R. Kolkowski, A. Berkhout, S.D.C. Roscam Abbing, D. Pal, C.D. Dieleman, J.J. Geuchies, A.J. Houtepen, B. Ehrler and A.F. Koenderink,
Temporal Dynamics of Collective Resonances in Periodic Metasurfaces
, ACS Photonics
11
, (6), 2480-2496 (2024)
F. Akhmetov, J. Vorberger, I. Milov, I. Makhotkin and M. Ackermann,
Ab initio-simulated optical response of hot electrons in gold and ruthenium
, Opt. Express
32
, (11), 19117-19132 (2024)
J. Gonzales Muñoz and J. Sheil,
On the role of target mass in extreme ultraviolet light generation from CO2-driven tin plasmas for nanolithography
, Phys. Plasmas
31
, (5), 050701: 1-7 (2024)
P. van Essen, Z. Nie, B. de Keijzer and P.M. Kraus,
Toward Complete All-Optical Intensity Modulation of High-Harmonic Generation from Solids
, ACS Photonics
11
, (5), 1832-1843 (2024)
S.R. Totorica, K. Lezhnin, D.J. Hemminga, J. Gonzales Muñoz, J. Sheil, A. Diallo, A. Hyder and W. Fox,
Acceleration mechanisms of energetic ion debris in laser-driven tin plasma EUV sources
, Appl. Phys. Lett.
124
, (17), 174101: 1-8 (2024)
L. Cruciani, M. Vreugdenhil, S. van Vliet, E. Abram, D. van Oosten, R. Bliem, K. van Druten and P.C.M. Planken,
Direct laser patterning of ruthenium below the optical diffraction limit
, Appl. Phys. Lett.
124
, (17), 171902 : 1-7 (2024)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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