Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter
Directory

Publications

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • A. Pelekanidis, F. Zhang, M. Gouder, J. Seifert, M. Du, K.S.E. Eikema and S. Witte, Illumination diversity in multiwavelength extreme ultraviolet ptychography, Photon. Res. 12, (12), 2757-2771 (2024)

  • F. Zhang, A. Pelekanidis, A. Karpavicius, M. Gouder, J. Seifert, K.S.E. Eikema and S. Witte, Characterizing post-compression of mJ-level ultrafast pulses via loose focusing in a gas cell, Opt. Express 32, (23), 40990-40990 (2024)

  • S. Payá, N. Diez, J. Cottom, E. Olsson and M. Sevilla, MgSO4 as an Effective, Low-Temperature Sulfur Dopant for Carbon Materials Enabling Fast Sodium Storage, ACS Appl. Energy Mater. 7, (21), 10061-10072 (2024)

  • Z. Lyu and L.V. Amitonova, Wavefront shaping and imaging through a multimode hollow-core fiber, Opt. Express 32, (21), 37098: 1-10 (2024)

  • F. Bijloo, K. Murzyn, F. van Emmerik, A.J. den Boef, P.M. Kraus and A.F. Koenderink, Near-Unity All-Optical Modulation of Third-Harmonic Generation with a Fano-Resonant Dielectric Metasurface, Nano Lett. 24, (41), 12942-12947 (2024)

  • I. Babenko, Y. Mostafa, Z. Bouza, O.O. Versolato and M. Bayraktar, Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates, AIP Advances 14, (10), 105021: 1-7 (2024)

  • S.D.C. Roscam Abbing, N. Kuzkova, van der Linden, F. Campi, B. de Keijzer, C. Morice, Z.-Y. Zhang, M.L.S. van der Geest and P.M. Kraus, Enhancing the efficiency of high-order harmonics with two-color non-collinear wave mixing in silica, Nature Commun. 15, (1), 8355: 1-7 (2024)

  • J.H. Buss, S. Starosielec, M. Schulz, R. Riedel, F. Campi, C.S. Lehmann, S. Witte and P.M. Kraus, Mid-infrared optical parametric chirped-pulse amplifier at 50 W and 38 fs pumped by a high-power Yb-InnoSlab platform, Opt. Express 32, (21), 36185-36192 (2024)

  • S.J.J. de Lange, D.J. Hemminga, Y. Mostafa, R.A. Meijer, O.O. Versolato and J. Sheil, Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 textmu m-wavelength laser for future EUV lithography, Plasma Sources Sci. Technol. 33, (10), 105003: 1-14 (2024)

  • J. Sheil, L. Poirier, A.C. Lassise, D.J. Hemminga, S. Schouwenaars, N. Braaksma, A. Frenzel, R. Hoekstra and O.O. Versolato, Power-Law Scaling Relating the Average Charge State and Kinetic Energy in Expanding Laser-Driven Plasmas, Phys. Rev. Lett. 133, (12), 125101: 1-6 (2024)

  • « Previous
  • 1
  • 2
  • 3
  • 4
  • 5
  • 6
  • 7
  • …
  • 41
  • 42
  • 43
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter