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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • S.J.J. de Lange, D.J. Hemminga, Y. Mostafa, R.A. Meijer, O.O. Versolato and J. Sheil, Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 textmu m-wavelength laser for future EUV lithography, Plasma Sources Sci. Technol. 33, (10), 105003: 1-14 (2024)

  • J. Sheil, L. Poirier, A.C. Lassise, D.J. Hemminga, S. Schouwenaars, N. Braaksma, A. Frenzel, R. Hoekstra and O.O. Versolato, Power-Law Scaling Relating the Average Charge State and Kinetic Energy in Expanding Laser-Driven Plasmas, Phys. Rev. Lett. 133, (12), 125101: 1-6 (2024)

  • X. Liu, Spectrally resolved Extreme Ultraviolet Lensless Imaging With High-Order Harmonic Generation Sources, VU University Amsterdam, 2024-09-16

  • A. Troglia, Optimizing thin-film properties via atomic-scale modification, University of Amsterdam, 2024-09-13

  • J. Antonowicz, A. Olczak, K. Sokolowski-Tinten, P. Zalden, I. Milov, R. Sobierajski and et. al, Structural pathways for ultrafast melting of optically excited thin polycrystalline Palladium films, Acta Mater. 276, 120043: 1-15 (2024)

  • T. Nieboer, Semi-classical energy loss in EUV plasma generated tin ion collisions with a hydrogen buffer gas, University of Groningen, 2024-08-16

  • P.C.M. Laan, M.J. Mekkering, F.J. de Zwart, A. Troglia, R. Bliem, K. Zhao, J.G. Norbert, B. de Bruin, G. Rothenberg, J.N.H. Reek and N. Yan, Tuning catalytic performance of platinum single atoms by choosing the shape of cerium dioxide supports, Catal. Sci. Technol. 14, (19), 5662-5670 (2024)

  • J. Mathijssen, E.J. Salumbides, K.S.E. Eikema and S. Witte, Sub-cycle dynamics in two-color high-harmonic generation from laser-produced plasmas, Opt. Express 32, (17), 30824-30838 (2024)

  • Q. Evrard, N. Sadegh, S. Mathew, E. Zuidinga, B. Watts, M. Paradiz Dominguez, A. Giglia, N. Mahne, S. Nannarone, A. Nishimura, T. Goya, T. Sugioka, M. Vockenhuber, Y. Ekinci and A.M. Brouwer, Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions, ACS Appl. Mater. Interfaces 16, (32), 42947-42956 (2024)

  • H.C. Strauch, F. Zhang, S. Mathias, T. Hohage, S. Witte and G.S.M. Jansen, Fast spectroscopic imaging using extreme ultraviolet interferometry, Opt. Express 32, (16), 28644-26654 (2024)

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  • Logo The province of Noord-Holland

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter