Logo
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter
Directory
menu
Search
Publications
Category
Articles
Bachelor Thesis
Book Chapters
Master Thesis
Proceedings
Theses
L. Poirier,
Ion diagnostics for Extreme Ultraviolet Nanolithography
, VU University Amsterdam, 2023-10-06
F.-C. Hsia,
Nanoscale Topography and Wear of Ceramic Interfaces and their effect on Macroscale Friction
, University of Amsterdam, 2023-10-06
L. Behnke,
Efficient EUV Light Plasma Sources Driven by a 2-μm-Wavelength Laser
, VU University Amsterdam, 2023-10-02
Y. Huo, M.K. Espinoza Cangahuala, V. Zamudio-Bayer, M. Goulart, M. Kubin, M. Timm, J.T. Lau, B. von Issendorff, R. Hoekstra, S. Faraji and T. Schlathölter,
A comparative laboratory study of soft X-ray-induced ionization and fragmentation of five small PAH cations
, Eur. Phys. J. D
77
, (10), 181: 1-11 (2023)
M.C. Velsink, M. Illienko, P. Sudera and S. Witte,
Optimizing pump–probe reflectivity measurements of ultrafast photoacoustics with modulated asynchronous optical sampling
, Rev. Sci. Instrum.
94
, (10), 103002: 1-10 (2023)
J. Vandersmissen, R.A. Meijer, J. Sukham, A. Erkelens, A. Jan Bonne and E. Verhagen,
Optical readout and actuation of plasmonic nano-optomechanical drum resonators
, Opt. Mater. Express
13
, (10), 2979-2996 (2023)
N. Sadegh,
Spectroscopic investigations of photon-induced reactions in tin-oxo cage photoresists
, University of Amsterdam, 2023-09-20
J. Sheil, J. Colgan and O.O. Versolato:
Atomic Origins of EUV Light
In:
Photon Sources for Lithography and Metrology, V. Bakshi, Ed., SPIE Press, Bellingham, Washington, SPIE-Intl Soc Optical Eng, 2023. - pp. 111-148
L. Cruciani, S. van Vliet, A. Troglia, R. Bliem, J.N. van Druten and P.C.M. Planken,
Femtosecond laser induced emission of coherent terahertz pulses from ruthenium thin films
, , (2023)
C. Leriche, C. Xiao, S.E. Franklin and B. Weber,
From atomic attrition to mild wear at multi-asperity interfaces: The wear of hard Si3N4 repeatedly contacted against soft Si
, Wear
528-529
, 204975: 1-8 (2023)
Logo
Close
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter