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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • Y.M. Fan, E. Olsson, B. Johannessen, A.M. D'Angelo, L. Thomsen, B. Cowie, L. Smillie, G.M. Liang, Y. Lei, Y. Zhao, W.K. Pang, Q. Cai and Z. Guo, Manipulation of Transition Metal Migration via Cr-Doping for Better-Performance Li-Rich, Co-Free Cathodes, ACS Energy Lett. 9, (2), 487-496 (2024)

  • J. Cottom, L. Hückmann, E. Olsson and J. Meyer, From Jekyll to Hyde and Beyond: Hydrogen’s Multifaceted Role in Passivation, H-Induced Breakdown, and Charging of Amorphous Silicon Nitride, J. Phys. Chem. Lett. 15, (3), 840-848 (2024)

  • P. Juergens, S.D.C. Roscam Abbing, M. Mero, C.L. Garcia, G.G. Brown, M.J.J. Vrakking, A. Mermillod-Blondin, P.M. Kraus and A. Husakou, Linking High-Harmonic Generation and Strong-Field Ionization in Bulk Crystals, ACS Photonics 11, (1), 247-256 (2024)

  • T. van Gardingen-Cromwijk, S. Konijnenberg, W. Coene, M. Adhikary, T. Tukker, S. Witte, J.F. de Boer and A.J. den Boef, Non-isoplanatic lens aberration correction in dark-field digital holographic microscopy for semiconductor metrology, Light adv. manuf. 4, (4), 453-465 (2023)

  • D.J. Engels, R.A. Meijer, H.K. Schubert, W.J. van der Zande, W.M.G. Ubachs and O.O. Versolato, High-resolution spectroscopic imaging of atoms and nanoparticles in thin film vaporization, Appl. Phys. Lett. 123, (25), 254102 : 1-7 (2023)

  • V. Kumar, Q. Evrard, C. Leuvrey, M. Lenertz, Y. Garcia, P. Rabu and G. Rogez, Incorporation of Photo- and Thermoresponsive N-Salicylidene Aniline Derivatives into Cobalt and Zinc Layered Hydroxides, Inorg. Chem. 62, (51), 21101-21114 (2023)

  • Z. Nie, L. Guery, E.B. Molinero, P. Juergens, T.J. van den Hooven, Y. Wang, A. Jiménez Galán, P.C.M. Planken, R.E.F. Silva and P.M. Kraus, Following the Nonthermal Phase Transition in Niobium Dioxide by Time-Resolved Harmonic Spectroscopy, Phys. Rev. Lett. 131, (24), 243201: 1-7 (2023)

  • Y. Mostafa, L. Behnke, D.J. Engels, Z. Bouza, J. Sheil, W.M.G. Ubachs and O.O. Versolato, Production of 13.5 nm light with 5% conversion efficiency from 2 μm laser-driven tin microdroplet plasma, Appl. Phys. Lett. 123, (23), 234101: 1-7 (2023)

  • L. Peng, C.-C. Hsu, C. Xiao, D. Bonn and B. Weber, Controlling Macroscopic Friction through Interfacial Siloxane Bonding, Phys. Rev. Lett. 131, (22), 226201: 1-7 (2023)

  • M.L.S. van der Geest, J. de Boer, K. Murzyn, P. Jürgens, B. Ehrler and P.M. Kraus, Transient High-Harmonic Spectroscopy in an Inorganic–Organic Lead Halide Perovskite, J. Phys. Chem. Lett. 14, (48), 10810-10818 (2023)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter