Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter
Directory

Publications

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • M.J. Mekkering, P.C.M. Laan, A. Troglia, R. Bliem, A.C. Kizilkaya, G. Rothenberg and N. Yan, Bottom-Up Synthesis of Platinum Dual-Atom Catalysts on Cerium Oxide, ACS Catal. 14, (13), 9850-9859 (2024)

  • H.K. Schubert, D.J. Engels, R.A. Meijer, B. Liu and O.O. Versolato, Scaling relations in laser-induced vaporization of thin free-flying liquid metal sheets, Phys. Rev. Res. 6, (2), 023182: 1-12 (2024)

  • M. Illienko, M.C. Velsink and S. Witte, Understanding photoacoustic signal formation in the presence of transparent thin films, Photoacoustics 38, 100617: 1-8 (2024)

  • R. Kolkowski, A. Berkhout, S.D.C. Roscam Abbing, D. Pal, C.D. Dieleman, J.J. Geuchies, A.J. Houtepen, B. Ehrler and A.F. Koenderink, Temporal Dynamics of Collective Resonances in Periodic Metasurfaces, ACS Photonics 11, (6), 2480-2496 (2024)

  • L. Tinge, Charge transfer in low energy Sn4+ collisions with molecular hydrogen, University of Groningen, 2024-05-16

  • F. Akhmetov, J. Vorberger, I. Milov, I. Makhotkin and M. Ackermann, Ab initio-simulated optical response of hot electrons in gold and ruthenium, Opt. Express 32, (11), 19117-19132 (2024)

  • J. Gonzales Muñoz and J. Sheil, On the role of target mass in extreme ultraviolet light generation from CO2-driven tin plasmas for nanolithography, Phys. Plasmas 31, (5), 050701: 1-7 (2024)

  • P. van Essen, Z. Nie, B. de Keijzer and P.M. Kraus, Toward Complete All-Optical Intensity Modulation of High-Harmonic Generation from Solids, ACS Photonics 11, (5), 1832-1843 (2024)

  • S.R. Totorica, K. Lezhnin, D.J. Hemminga, J. Gonzales Muñoz, J. Sheil, A. Diallo, A. Hyder and W. Fox, Acceleration mechanisms of energetic ion debris in laser-driven tin plasma EUV sources, Appl. Phys. Lett. 124, (17), 174101: 1-8 (2024)

  • L. Cruciani, M. Vreugdenhil, S. van Vliet, E. Abram, D. van Oosten, R. Bliem, K. van Druten and P.C.M. Planken, Direct laser patterning of ruthenium below the optical diffraction limit, Appl. Phys. Lett. 124, (17), 171902 : 1-7 (2024)

  • « Previous
  • 1
  • 2
  • 3
  • …
  • 7
  • 8
  • 9
  • 10
  • 11
  • …
  • 43
  • 44
  • 45
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter