Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter
Directory

Publications

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • L. Poirier, Ion diagnostics for Extreme Ultraviolet Nanolithography, VU University Amsterdam, 2023-10-06

  • F.-C. Hsia, Nanoscale Topography and Wear of Ceramic Interfaces and their effect on Macroscale Friction, University of Amsterdam, 2023-10-06

  • L. Behnke, Efficient EUV Light Plasma Sources Driven by a 2-μm-Wavelength Laser, VU University Amsterdam, 2023-10-02

  • Y. Huo, M.K. Espinoza Cangahuala, V. Zamudio-Bayer, M. Goulart, M. Kubin, M. Timm, J.T. Lau, B. von Issendorff, R. Hoekstra, S. Faraji and T. Schlathölter, A comparative laboratory study of soft X-ray-induced ionization and fragmentation of five small PAH cations, Eur. Phys. J. D 77, (10), 181: 1-11 (2023)

  • M.C. Velsink, M. Illienko, P. Sudera and S. Witte, Optimizing pump–probe reflectivity measurements of ultrafast photoacoustics with modulated asynchronous optical sampling, Rev. Sci. Instrum. 94, (10), 103002: 1-10 (2023)

  • J. Vandersmissen, R.A. Meijer, J. Sukham, A. Erkelens, A. Jan Bonne and E. Verhagen, Optical readout and actuation of plasmonic nano-optomechanical drum resonators, Opt. Mater. Express 13, (10), 2979-2996 (2023)

  • N. Sadegh, Spectroscopic investigations of photon-induced reactions in tin-oxo cage photoresists, University of Amsterdam, 2023-09-20

  • J. Sheil, J. Colgan and O.O. Versolato: Atomic Origins of EUV Light In: Photon Sources for Lithography and Metrology, V. Bakshi, Ed., SPIE Press, Bellingham, Washington, SPIE-Intl Soc Optical Eng, 2023. - pp. 111-148

  • L. Cruciani, S. van Vliet, A. Troglia, R. Bliem, N.J. van Druten and P.C.M. Planken, Femtosecond laser induced emission of coherent terahertz pulses from ruthenium thin films, , (2023)

  • C. Leriche, C. Xiao, S.E. Franklin and B. Weber, From atomic attrition to mild wear at multi-asperity interfaces: The wear of hard Si3N4 repeatedly contacted against soft Si, Wear 528-529, 204975: 1-8 (2023)

  • « Previous
  • 1
  • 2
  • 3
  • …
  • 9
  • 10
  • 11
  • 12
  • 13
  • …
  • 41
  • 42
  • 43
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter