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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

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  • Articles
  • Bachelor Thesis
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  • Theses
  • S. Schilstra, Observation of double electron capture by Sn ions from H$_2$ using reaction microscopy, University of Groningen, 2024-04-19

  • W.T.L. Beumer, Crystacean: a novel non-epitaxial interface configuration generator, tested on the SiC/SiO2 interface, VU University Amsterdam, 2024-04-18

  • M. Lipp, W. Li, K. Abrashitova, P. Forré and L.V. Amitonova, Lightweight super-resolution multimode fiber imaging with regularized linear regression, Opt. Express 32, (9), 15147-15155 (2024)

  • Z. Nur, Interactions of heavy, low-energy ions with a Ru surface, University of Groningen, 2024-03-26

  • G. D’Auria, R. Hoekstra, T.G. Lucas and et. al, The CompactLight Design Study, Eur. Phys. J. Spec. Top. 233, 1-208 (2024)

  • C. Wang, P. Sombut, L. Puntscher, Z. Jakub, M. Meier, J. Pavelec, R. Bliem, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson, CO‐Induced Dimer Decay Responsible for Gem‐Dicarbonyl Formation on a Model Single‐Atom Catalyst, Angew. Chem. Int. Ed. 63, (16), e202317347: 1-8 (2024)

  • L.V. Amitonova, Multimode fiber endoscopes for computational brain imaging, Neurophotonics 11, (S1), S11509: 1-7 (2024)

  • K. Mongey, S.J.J. de Lange, R. Brady, D.J. Hemminga, B. Delaney, M.M. Basko, E. Sokell, F. O'Reilly and J. Sheil, Characterization of experimental and simulated micrometer-scale soft x-ray-emitting laser plasmas: Toward predictive radiance calculations, Appl. Phys. Lett. 124, (10), 102104 : 1-7 (2024)

  • N. Sadegh, Q. Evrard, P.M. Kraus and A.M. Brouwer, XUV Absorption Spectroscopy and Photoconversion of a Tin-Oxo Cage Photoresist, J. Phys. Chem. C 128, (9), 3965-3974 (2024)

  • B. Demirkurt, D. Petrova, D.K. Sharma, M. Vacha, B. Weber, D. Bonn and A.M. Brouwer, Resolving Multi-Asperity Contacts at the Nanoscale through Super-Resolution Fluorescence Imaging, J. Phys. Chem. Lett. 15, (7), 1936-1942 (2024)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter