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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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N. Sadegh, Q. Evrard, N. Mahne, A. Giglia, S. Nannarone and A.M. Brouwer,
Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists
, J. Photopolym. Sci. Technol.
36
, (5), 373-378 (2023)
P.C.M. Laan, F.J. de Zwart, E.M. Wilson, A. Troglia, O.C.M. Lugier, J.G. Norbert, R. Bliem, J.N.H. Reek, B. de Bruin, G. Rothenberg and N. Yan,
Understanding the Oxidative Properties of Nickel Oxyhydroxide in Alcohol Oxidation Reactions
, ACS Catal.
13
, (13), 8467-8476 (2023)
F. Cassin, R. Hahury, T. Lançon, S.E. Franklin and B. Weber,
The nucleation, growth, and adhesion of water bridges in sliding nano-contacts
, J. Chem. Phys.
158
, (22), 224703: 1-8 (2023)
M. Adhikary, T. van Gardingen-Cromwijk, de Wit, S. Witte, J.F. de Boer and A.J. den Boef,
Illumination spot profile correction in digital holographic microscopy for overlay metrology
, J. Micro/Nanopattern. Mater. Metrol.
22
, (2), 024001: 1-14 (2023)
T.J. van den Hooven and P.C.M. Planken,
Surface-plasmon-enhanced strain-wave-induced optical diffraction changes from a segmented grating
, Photoacoustics
31
, 100497: 1-13 (2023)
B. Lochocki, A. Ivanina, A. Bandhoe, J.F. de Boer and L.V. Amitonova,
Swept-source multimode fiber imaging
, Sci. Rep
13
, (1), 8071: 1-9 (2023)
J. Mathijssen, Z. Mazzotta, A.M. Heinzerling, K.S.E. Eikema and S. Witte,
Material-specific high-order harmonic generation in laser-produced plasmas for varying plasma dynamics
, Appl. Phys. B- Lasers O
129
, 91: 1-11 (2023)
Y. Huo, M.K. Espinoza Cangahuala, V. Zamudio-Bayer, M. Goulart, M. Kubin, M. Timm, J.T. Lau, B. von Issendorff, R. Hoekstra, S. Faraji and T. Schlathölter,
An X-ray spectroscopy study of structural stability of superhydrogenated pyrene derivatives
, MNRAS
523
, (1), 865-875 (2023)
Q. Evrard, N. Sadegh, C.-C. Hsu, N. Mahne, A. Giglia, S. Nannarone, Y. Ekinci, M. Vockenhuber, A. Nishimura, T. Goya, T. Sugioka and A.M. Brouwer:
Influence of the anion in tin-based EUV photoresists properties
In:
Advances in Patterning Materials and Processes XL 12498, SPIE-Intl Soc Optical Eng, 2023.
D.J. Hemminga, L. Poirier, J. Hernandez-Rueda, B. Liu, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato:
Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography
In:
Proceedings of SPIE 12494 ,Optical and EUV Nanolithography XXXVI, SPIE-Intl Soc Optical Eng, 2023.
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter