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  • Mission
    • Mission and vision
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  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
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New People

  • Cristiane Stilhano Vilas Boas
  • Zeudi Mazzotta
  • Georgios Araizi Kanoutas
  • Thomas van den Hooven
  • Olivier Schulte Fischedick
  • Wei Li
  • Martijn Everts
  • Felix Cassin
  • Matthijs Velsink
View all

Research Groups

  • Computational Imaging
  • Contact Dynamics
  • EUV Generation & Imaging
  • EUV Photoresists
  • EUV Plasma Processes
  • High-Harmonic generation and EUV science
  • Light-Matter Interaction
  • Materials & Surface Science for EUVL
  • Nanolayers
  • Nanophotochemistry
  • Nanoscale Imaging and Metrology

News

  • Season’s greetings
    December 23, 2020
  • ARCNL groups receive OTP grant
    December 22, 2020
  • ‘Ondernemende Onderzoekers’ interview in NWO magazine
    December 21, 2020
View all news

Events

  • ARCNL website unavailable on Monday January 18th from 11:00-14:00
    January 18, 2021
  • Physics@Veldhoven
    January 18 - 20, 2021
  • Andreas Freise (Nikhef, Amsterdam)
    January 27, 2021
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  • Science Park 106
  • 1098 XG Amsterdam
  • arcnlsecretariaat@arcnl.nl
  • +31 20 8517100
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  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

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  • 1098 XG Amsterdam
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© ARCNL 2021

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter