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  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
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New People

  • Jorge Gonzalez Muñoz
  • Hugo França
  • Maximilian Lipp
  • Pieter van Essen
  • Ellen Barents – Pool
  • Abhishek Babu
  • Ralph Jacobs
  • Jordi Lopez Leyva
  • Semi Hizi
View all

Research Groups

  • Ion Interactions
  • Computational Imaging
  • Contact Dynamics
  • EUV Generation & Imaging
  • EUV Plasma Processes
  • High-Harmonic generation and EUV science
  • Light-Matter Interaction
  • Materials & Surface Science for EUVL
  • Materials Theory and Modeling
  • Nanoscale Imaging and Metrology
  • Plasma Theory and Modeling

News

  • SHINE consortium receives NWO funding to combine the best of two worlds
    May 15, 2023
  • NWO funding OTP project Peter Kraus
    May 1, 2023
  • Sylvianne Roscam Abbing PhD defense
    March 31, 2023
View all news

Events

  • ASML Technology Conference
    June 15, 2023
  • Thermal Stability of Nanolayers for EUV Optics
    July 6, 2023
  • International Highly Charged Ions Conference 2024
    September 2 - 6, 2024
View all events

Contact

  • Science Park 106
  • 1098 XG Amsterdam
  • arcnlsecretariaat@arcnl.nl
  • +31 20 8517100
More info

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  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
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Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

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  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter