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John Sheil
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Stefan Witte
Kjeld Eikema
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Paul Planken
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Arie den Boef
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Peter Kraus
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Lyuba Amitonova
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Bart Weber
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Roland Bliem
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Emilia Olsson
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Ion Interactions
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EUV Generation & Imaging
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Panel discussion and book launch highlight successful public-private partnerships
September 12, 2025
All eyes on ARCNL research at European Optical Society Annual Meeting
September 3, 2025
Ronnie Hoekstra gives keynote presentation at ICPEAC in Japan
August 26, 2025
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Wetenschapsdag 2025
October 4, 2025
Transition to Marcelo Ackermann as ARCNL Director
November 1, 2025
Defense: Dion Engels
November 26, 2025
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact
ARCNL Newsletter
