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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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New People

  • Divya Bharti
  • Lucy Karremans
  • Sander van Belois
  • Someshwar Sanjay Ade
  • Tera Molenaar
  • Nathan Isaac
  • Adrianus van Grunsven
  • Junghoon Kim
  • Fleur Veen
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Research Groups

  • Ion Interactions
  • Computational Imaging
  • Contact Dynamics
  • EUV Generation & Imaging
  • EUV Plasma Processes
  • High-Harmonic Generation & EUV Science
  • Light-Matter Interaction
  • Materials & Surface Science for EUVL
  • Materials Theory and Modeling
  • Nanoscale Imaging and Metrology
  • Plasma Theory and Modeling

News

  • ARCNL researchers share results and ideas at ECOTRIB 2025
    August 2, 2025
  • ARCNL helps redefine how we measure roughness in worldwide Surface-Topography Challenge
    July 30, 2025
  • First-year bachelor students complete research project at ARCNL
    July 15, 2025
View all news

Events

  • ARCNL Colloquium with Roberto Lo Conte
    September 3, 2025
  • Event ‘ARCNL, pionier in publiek-private samenwerking’
    September 4, 2025
  • Defense Antonios Pelekanidis
    September 17, 2025
View all events

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  • Science Park 106
  • 1098 XG Amsterdam
  • arcnlsecretariaat@arcnl.nl
  • +31 20 8517100
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  • 1098 XG Amsterdam
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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter