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  • Mission
    • Mission and vision
      • Mission
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  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
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New People

  • Alessandro Antoncecchi
  • Mirte Hiensch
  • Isabel Droste
  • Max Verweg
  • Vincent Benning
  • Mike van de Poll
  • Ursula Smeele
  • Xander Locsin Jr
  • Emeric Sauzeau
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Research Groups

  • Jobs
  • Computational Imaging
  • Contact Dynamics
  • EUV Generation & Imaging
  • EUV Photoresists
  • EUV Plasma Processes
  • High-Harmonic generation and EUV science
  • Light-Matter Interaction
  • Materials & Surface Science for EUVL
  • Nanolayers
  • Nanophotochemistry
  • Nanoscale Imaging and Metrology
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News

  • Vanessa Verrina defends PhD thesis
    April 16, 2021
  • PhD defense Ruben Schupp
    March 29, 2021
  • ARCNL Newsletter 10
    February 19, 2021
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Events

  • ARCNL is closed
    April 26 - 27, 2021
  • ARCNL is closed
    May 5, 2021
  • ARCNL is closed
    May 13 - 14, 2021
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  • Science Park 106
  • 1098 XG Amsterdam
  • arcnlsecretariaat@arcnl.nl
  • +31 20 8517100
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  • 1098 XG Amsterdam
  • The Netherlands

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© ARCNL 2021

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter