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Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
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Brian de Keijzer
Zonghui Nie
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Computational Imaging
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EUV Generation & Imaging
EUV Photoresists
EUV Plasma Processes
High-Harmonic generation and EUV science
Light-Matter Interaction
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for EUVL
Nanolayers
Nanophotochemistry
Nanoscale Imaging and Metrology
News
Vanessa Verrina defends PhD thesis
April 16, 2021
PhD defense Ruben Schupp
March 29, 2021
ARCNL Newsletter 10
February 19, 2021
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Events
ARCNL Colloquium
June 16, 2021
Patterning Colloidal Nanocrystals with Light and Electrons
June 30, 2021
Towards stable nanolayers for EUV optics
June 30, 2021
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
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