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Najmeh Sadegh
Wesley Post
Javier Hernandez Rueda
Ilona Jaeqx
Hao Zhang
Mark Mol
Stefan van Vliet
Lyuba Amitonova
Alexandra Zeltsi
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Research Groups
Nanoscale Imaging and Metrology
Materials & Surface
Science for EUV Lithography
Computational Imaging
High-Harmonic generation and EUV science
Contact Dynamics
EUV Photoresists
Nanophotochemistry
EUV Plasma Processes
EUV Targets
EUV Generation & Imaging
Nanolayers
News
Lyuba Amitonova starts a new group on Nanoscale Imaging and Metrology
October 1, 2019
Bart Weber starts as tenure track group leader
September 24, 2019
Prizes for ARCNL students
September 9, 2019
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Events
Spectroscopy of highly-charged Sn ions for extreme ultraviolet nanolithography
December 19, 2019
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