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Paul Planken
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Arie den Boef
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Peter Kraus
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Lyuba Amitonova
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Bart Weber
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Roland Bliem
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Emilia Olsson
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ARCNL and ASML renew collaboration at yearly Strategy Day
June 20, 2025
Marcelo Ackermann appointed new director of ARCNL
June 11, 2025
Experiments shed new light on the limits of laser-writing method
May 19, 2025
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July 3, 2025
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September 4, 2025
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
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