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Cees van der Ven
Zhouping Lyu
Milan Herczog
Najmeh Sadegh
Sjors Essen
Vanessa Verrina
Patrick Konold
Christiaan Buijse
Dylan Loozen
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Research Groups
Nanoscale Imaging and Metrology
Materials & Surface
Science for EUV Lithography
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EUV Photoresists
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Nanolayers
News
ARCNL has closed its offices and labs
March 24, 2020
ARCNL researchers report on helical soft-X-ray beams
February 17, 2020
Where did the tin go? Mass loss from a thin sheet of tin
February 14, 2020
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Events
[CANCELLED] NEVAC Symposium 2020
May 15, 2020
Exciting tin-oxo cages: light-induced chemistry for nanopatterning
June 3, 2020
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