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EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
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Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Ion Interactions
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EUV Generation & Imaging
EUV Plasma Processes
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Light-Matter Interaction
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Materials Theory and Modeling
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Plasma Theory and Modeling
News
Wim Ubachs special issue Molecular Physics
November 14, 2023
ARCNL group leader Arie den Boef appointed as Fellow of the Netherlands Academy of Engineering (NAE)
November 3, 2023
Open Day
October 16, 2023
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Events
ARCNL is closed
December 25 - 26, 2023
_FUTURE_
January 23 - 24, 2024
Hamed Sadeghian (CEO Nearfield Instruments B.V., Rotterdam)
March 20, 2024
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
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