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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
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Ronnie Hoekstra
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Stefan Witte
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Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Short-Wavelength Light Sources for EUV Metrology
Angana Mondal
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Short-Wavelength Light Sources for EUV Metrology
Ion Interactions
Computational Imaging
Contact Dynamics
EUV Generation & Imaging
EUV Plasma Processes
High-Harmonic Generation & EUV Science
Light-Matter Interaction
Materials & Surface Science for EUVL
Materials Theory and Modeling
Nanoscale Imaging and Metrology
Plasma Theory and Modeling
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Unique collaboration demonstrates promising new imaging tool
September 14, 2026
First ARCNL Talent Fellowship awarded to support PhD research
September 11, 2026
Four new Doctors add their covers to the Theses Wall this summer
September 7, 2026
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PhD defense Luc Assink
September 29, 2026
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Short-Wavelength Light Sources for EUV Metrology
Angana Mondal
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact
ARCNL Newsletter