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New People
Najmeh Sadegh
Lars Behnke
Roland Bliem
Simon Voogel
Bob Krijger
John Sheil
Ayla Sluiter
Dorus van der Linde
Steijn Pos
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Research Groups
Materials & Surface Science for EUV Lithography
Computational Imaging
High-Harmonic generation and EUV science
Contact Dynamics
EUV Photoresists
Nanophotochemistry
EUV Plasma Processes
EUV Targets
EUV Generation & Imaging
Nanolayers
News
Roland Bliem starts new group on Materials and Surface Science for Extreme Ultraviolet Lithography
February 15, 2019
ARCNL moves to new location
December 19, 2018
ARCNL News Letter 7
September 10, 2018
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Events
NWO connect meeting @ ARCNL
September 26, 2019
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