Excursion to Twente fosters connection between ARCNL and XUV Optics researchers
On June 17, the people of ARCNL got on a bus to visit their colleagues in the XUV Optics research group at the University of Twente in Enschede. Both XUV and ARCNL work on advancing lithography technology in collaboration with ASML. The visit was the first in a future series, and this inaugural ARCNL/XUV day allowed the two groups to get to know each other better by visiting the lab in Twente and sharing scientific highlights.
Building on existing connections
The day in Twente began with a welcome from ARCNL director Marcelo Ackermann, who also chairs the XUV Optics group (XUV) at the University of Twente. This was followed by an overview of the agenda by XUV postdoctoral researcher Stefan van Vliet, who completed his PhD at ARCNL in 2025 in the group of Roland Bliem. These existing connections and overlapping research topics between ARCNL and XUV set the stage for exploring opportunities for collaboration.
With around 40 people from ARCNL and another 40 from XUV participating, the visit had a great turnout and made for a lively day.
Sharing insights and good news
Researchers from both ARCNL and XUV shared various findings and insights from their work in a symposium-style setting. During one of the talks, ARCNL PhD candidate Felix Kohlmeier happily reported that a paper on the same topic as his presentation had just 30 minutes prior been accepted for publication in the journal Nature Communications Physics. The talks were all well received and were followed by active discussions, emphasizing the mutual interests of both groups.
Discussions continued over lunch and during the poster session, at which time ARCNL visitors were also invited for tours of the XUV labs. The lab tours were impressive, with many high-tech experimental setups showcasing what can be achieved in a combined industrial-academic research ecosystem.
Looking forward
The visit was a great success, highlighting the many opportunities for collaboration between ARCNL and XUV researchers. In six months, XUV will visit ARCNL so the two groups can continue getting to know each other better.
Contact
If you have questions about this visit, please contact Roland Bliem or Marcelo Ackermann.
