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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • Emilia Olsson joins Deep Tech Day panel on translating research to impact

    February 6, 2026

    On January 28, ARCNL research group leader Emilia Olsson participated in the panel discussion on the role of deep tech in academia, as part of University of Amsterdam Faculty of Science’s Deep Tech Day.   The …

  • Tiny salt crystals reduce friction and wear on silicon surfaces

    February 5, 2026

    During his MSc project, ARCNL PhD candidate Tijn Vernooij discovered that calcium sulfate, a widely used material, could be used in the form of thin nanocrystals to reduce friction between …

  • Shrinking the spotlight: super-resolution microscopy without labels

    January 30, 2026

    ARCNL researchers in the group of Peter Kraus have demonstrated a way to overcome the diffraction limit in optical microscopy, using laser techniques that shape light in both space and …

  • ARCNL research well represented at NWO Physics 2026 in Veldhoven

    January 29, 2026

    ARCNL had a strong and visible presence at NWO Physics, held on 20-21 January 2026 in Veldhoven. The annual conference brought together the Dutch physics community, and ARCNL research was …

  • New measurement technology to further sensing capabilities

    January 13, 2026

    The research teams of Lyuba Amitonova (ARCNL) and Femius Koenderink (AMOLF) investigated new optical detection strategies to efficiently measure perturbations at the nanometer scale. For their experiments they used metasurfaces, …

  • Harnessing water’s stickiness for adhesion control 

    January 13, 2026

    Printing computer chips with nanoscale features requires extremely precise positioning. Electric charges and water on surfaces can impact this precision, but these effects have not been fully understood. Now, ARCNL postdoctoral researcher Tunç Çiftçi and his …

  • Angana Mondal brings a new research group to ARCNL

    January 6, 2026

    As of January 1, Dr. Angana Mondal joins ARCNL as a tenure-track group leader. Her new research group, ‘Short-Wavelength Light Sources for EUV Metrology’, will explore the generation of light …

  • New research to venture beyond extreme ultraviolet light

    December 18, 2025

    John Sheil, leader of the Plasma Theory and Modeling group at ARCNL, will lead a research program in collaboration with the groups of Oscar Versolato and Ronnie Hoekstra on the …

  • Computing at the speed of light with optics

    December 16, 2025

    What if we could run AI on light in computer chips instead of electricity? This would have tremendous advantages. First of all, the computation would be more efficient since light …

  • Grant awarded for algorithmic nanoscale imaging collaboration

    December 1, 2025

    The CHAIN collaboration is one of twelve new research projects awarded funding from NWO under the Perspectief program. The CHAIN project is a collaboration between researchers from TU Delft, ARCNL, …

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter