Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter
Directory

Latest news

Category
  • Atomic Plasma Processes
  • Computational Imaging
  • Contact Dynamics
  • EUV Generation & Imaging
  • EUV Photoemission
  • EUV Photoresists
  • EUV Plasma Dynamics
  • EUV Plasma Modeling
  • EUV Plasma Processes
  • EUV Targets
  • General
  • High-Harmonic Generation and EUV Science
  • Light-Matter Interaction
  • Materials & Surface Science for EUV Lithography
  • Nanolayers
  • Nanophotochemistry
  • Nanoscale Imaging and Metrology
  • Season’s greetings

    December 23, 2020

    Season’s greetings from ARCNL …

  • ARCNL groups receive OTP grant

    December 22, 2020

    In December, the groups of Peter Kraus and Stefan Witte received an Open Technology Programme (OTP) grant for the project ‘Ultrafast metrology of semiconductor nanostructures with a next-generation table-top soft-X-ray …

  • ‘Ondernemende Onderzoekers’ interview in NWO magazine

    December 21, 2020

    This fall NWO published in their magazine Onderzoek an interview with Bart Noordam (ASML) and Joost Frenken (ARCNL). The article illustrates how the academic and industrial partners look at their …

  • Ruslan Röhrich PhD defense

    December 18, 2020

    On December 11th, PhD student Ruslan Röhrich successfully defended his thesis ‘Unconventional metrology: merging nanophotonics with computational imaging’ at the University of Amsterdam. Röhrich worked on a joint research project …

  • Lianjia Wu PhD defense

    November 30, 2020

    On November 18th PhD student Lianjia Wu obtained the doctorate degree after defending her thesis ‘Metal oxo clusters: molecular design for extreme ultraviolet lithography’ at the University of Amsterdam. The …

  • PhD defense Joris Scheers

    November 13, 2020

    On Tuesday, November 10th, Joris Scheers successfully defended his thesis Charge-state-resolved spectroscopy of multiply-charged tin ions at the Vrije Universiteit Amsterdam. Scheers did his doctoral research in the EUV Plasma …

  • Peter Kraus ‘techniektalent’ of 2020

    November 12, 2020

    Group leader Peter Kraus is one of the fifteen technical talents (Techniektalenten) of 2020 in the Netherlands, that were identified by the Dutch technical journal De Ingenieur. Fundamental science research …

  • Open dag 2020, de online editie, op video

    October 12, 2020

    De jaarlijkse open dag op zaterdag 3 oktober was dit jaar een online editie op ZOOM. Wim Symens (ASML) en Joost Frenken (ARCNL) gaven een lezing over computer- en geheugenchips …

  • New atomic force microscopy system

    October 2, 2020

    The Contact Dynamics group has installed a new commercial Atomic Force Microscopy (AFM) system for the characterization of surface topography and material properties at the nanoscale. The purchased Bruker Innova …

  • Pulsed Laser Deposition for Materials and Surface Science

    September 28, 2020

    In the lab for Materials and Surface Science for EUV Lithography the long awaited setup for thin-film growth using pulsed laser deposition (PLD) has recently been installed. The new setup …

  • 1
  • 2
  • 3
  • …
  • 8
  • 9
  • 10
  • Next »

Partners:

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • Twitter
  • LinkedIn

© ARCNL 2021

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter