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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • New measurement technology to further sensing capabilities

    January 13, 2026

    The research teams of Lyuba Amitonova (ARCNL) and Femius Koenderink (AMOLF) investigated new optical detection strategies to efficiently measure perturbations at the nanometer scale. For their experiments they used metasurfaces, …

  • Harnessing water’s stickiness for adhesion control 

    January 13, 2026

    Printing computer chips with nanoscale features requires extremely precise positioning. Electric charges and water on surfaces can impact this precision, but these effects have not been fully understood. Now, ARCNL postdoctoral researcher Tunç Çiftçi and his …

  • Angana Mondal brings a new research group to ARCNL

    January 6, 2026

    As of January 1, Dr. Angana Mondal joins ARCNL as a tenure-track group leader. Her new research group, ‘Short-Wavelength Light Sources for EUV Metrology’, will explore the generation of light …

  • New research to venture beyond extreme ultraviolet light

    December 18, 2025

    John Sheil, leader of the Plasma Theory and Modeling group at ARCNL, will lead a research program in collaboration with the groups of Oscar Versolato and Ronnie Hoekstra on the …

  • Computing at the speed of light with optics

    December 16, 2025

    What if we could run AI on light in computer chips instead of electricity? This would have tremendous advantages. First of all, the computation would be more efficient since light …

  • Grant awarded for algorithmic nanoscale imaging collaboration

    December 1, 2025

    The CHAIN collaboration is one of twelve new research projects awarded funding from NWO under the Perspectief program. The CHAIN project is a collaboration between researchers from TU Delft, ARCNL, …

  • Leadership change at ARCNL – reflections from the outgoing and new director

    November 4, 2025

    As of 1 November 2025, ARCNL welcomes its new director, Marcelo Ackermann, succeeding Wim van der Zande. In a reflective conversation, the outgoing and incoming directors look back and forward …

  • New charge-trapping insights could help design longer-lasting batteries

    October 28, 2025

    Scientists have uncovered a mechanism by which trapped charges called ‘polarons’ alter the structure of silicon nitride when lithium ions enter the material. Using computer models of atomic interactions, they …

  • Wetenschapsdag 2025 brings many curious visitors to ARCNL

    October 10, 2025

    We had another great edition of the Wetenschapsdag this past weekend! It was a pleasure to welcome many curious visitors to our institute for fun demonstrations, lectures and lab tours.  …

  • AMOLF-ARCNL PhD collaboration brings to light new nanostructure metrology technique

    October 9, 2025

    The joint PhD program between AMOLF and ARCNL continues to prove its strength in combining fundamental physics with industrial relevance. Falco Bijloo’s research, recently published in ACS Nano, showcases the …

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

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  • More
    • More

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