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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • New perspectives on light-induced damage

    March 2, 2026

    ARCNL alumnus Ester Abram conducted her PhD research on how high-intensity laser light can damage material surfaces, with an interest in semiconductor manufacturing processes. Now, she and her collaborators from …

  • Five ARCNL PhD students defend their theses in one month

    February 19, 2026

    Within one month, five ARCNL PhD students successfully defended their theses. Congratulations to Doctors Dion Engels, Karl Schubert, Fengling Zhang, Falco Bijloo and Nick Feldman! Dion Engels Dion Engels did …

  • LOTUS project receives funding to push the limits of optical metrology

    February 18, 2026

    Anchit Srivastava, postdoctoral researcher at ARCNL, has been awarded an ERC Marie Skłodowska-Curie Actions postdoctoral fellowship for advancing the frontiers of optical metrology. The goal of his LOTUS project is …

  • Study association visits ARCNL for engaging excursion

    February 17, 2026

    On February 6, students from the Fysisch-Mathematische Faculteitsvereniging (FMF) at University of Groningen came to ARCNL to visit labs, talk to researchers and learn about opportunities for students to get …

  • Visitors from local schools enjoy a day of physics at Viva Fysica

    February 12, 2026

    On January 30, the University of Amsterdam Institute of Physics (UvA-IoP) hosted Viva Fysica 2026. The event showcases physics and astronomy research at Amsterdam Science Park for interested high school …

  • Emilia Olsson joins Deep Tech Day panel on translating research to impact

    February 6, 2026

    On January 28, ARCNL research group leader Emilia Olsson participated in the panel discussion on the role of deep tech in academia, as part of University of Amsterdam Faculty of Science’s Deep Tech Day.   The …

  • Tiny salt crystals reduce friction and wear on silicon surfaces

    February 5, 2026

    During his MSc project, ARCNL PhD candidate Tijn Vernooij discovered that calcium sulfate, a widely used material, could be used in the form of thin nanocrystals to reduce friction between …

  • Shrinking the spotlight: super-resolution microscopy without labels

    January 30, 2026

    ARCNL researchers in the group of Peter Kraus have demonstrated a way to overcome the diffraction limit in optical microscopy, using laser techniques that shape light in both space and …

  • ARCNL research well represented at NWO Physics 2026 in Veldhoven

    January 29, 2026

    ARCNL had a strong and visible presence at NWO Physics, held on 20-21 January 2026 in Veldhoven. The annual conference brought together the Dutch physics community, and ARCNL research was …

  • New measurement technology to further sensing capabilities

    January 13, 2026

    The research teams of Lyuba Amitonova (ARCNL) and Femius Koenderink (AMOLF) investigated new optical detection strategies to efficiently measure perturbations at the nanometer scale. For their experiments they used metasurfaces, …

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
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