In December, the groups of Peter Kraus and Stefan Witte received an Open Technology Programme (OTP) grant for the project ‘Ultrafast metrology of semiconductor nanostructures with a next-generation table-top soft-X-ray …
This fall NWO published in their magazine Onderzoek an interview with Bart Noordam (ASML) and Joost Frenken (ARCNL). The article illustrates how the academic and industrial partners look at their …
On December 11th, PhD student Ruslan Röhrich successfully defended his thesis ‘Unconventional metrology: merging nanophotonics with computational imaging’ at the University of Amsterdam. Röhrich worked on a joint research project …
On November 18th PhD student Lianjia Wu obtained the doctorate degree after defending her thesis ‘Metal oxo clusters: molecular design for extreme ultraviolet lithography’ at the University of Amsterdam. The …
On Tuesday, November 10th, Joris Scheers successfully defended his thesis Charge-state-resolved spectroscopy of multiply-charged tin ions at the Vrije Universiteit Amsterdam. Scheers did his doctoral research in the EUV Plasma …
Group leader Peter Kraus is one of the fifteen technical talents (Techniektalenten) of 2020 in the Netherlands, that were identified by the Dutch technical journal De Ingenieur. Fundamental science research …
De jaarlijkse open dag op zaterdag 3 oktober was dit jaar een online editie op ZOOM. Wim Symens (ASML) en Joost Frenken (ARCNL) gaven een lezing over computer- en geheugenchips …
The Contact Dynamics group has installed a new commercial Atomic Force Microscopy (AFM) system for the characterization of surface topography and material properties at the nanoscale. The purchased Bruker Innova …
In the lab for Materials and Surface Science for EUV Lithography the long awaited setup for thin-film growth using pulsed laser deposition (PLD) has recently been installed. The new setup …
