Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials & Surface Science for EUVL Roland Bliem
      • Nanophotochemistry Fred Brouwer
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter
Directory

News Archive

Category
  • Atomic Plasma Processes
  • Computational Imaging
  • Contact Dynamics
  • EUV Generation & Imaging
  • EUV Photoemission
  • EUV Photoresists
  • EUV Plasma Dynamics
  • EUV Plasma Modeling
  • EUV Plasma Processes
  • EUV Targets
  • General
  • High-Harmonic Generation and EUV Science
  • Light-Matter Interaction
  • Materials & Surface Science for EUV Lithography
  • Materials Theory and Modeling
  • Nanolayers
  • Nanophotochemistry
  • Nanoscale Imaging and Metrology
  • Plasma Theory and Modeling
  • ARCNL publication selected as 2021 PCCP HOT Article

    August 23, 2021

    Editors and referees of the journal Physical Chemistry Chemical Physics have selected a publication by PhD student Neha Thakur for the journal’s online rolling collection of hottest work. The open …

  • Two PhD defenses on June 30th

    July 2, 2021

    June has been a busy month for ARCNL, with a record number of four PhD defenses in one month. The final two defenses took place on June 30th: Cristina Sfiligoj …

  • Mengqi Du PhD defense

    June 24, 2021

    On June 9th Mengqi Du successfully defended her thesis ‘Computational Depth-resolved Imaging and Metrology’ at the Vrije Universiteit. Du did her doctoral research in the EUV Generation & Imaging group …

  • Olivier Lugier defends PhD thesis

    June 15, 2021

    On June 3rd Olivier Lugier successfully defended his thesis ‘Surface-mounted metal-organic frameworks for extreme ultraviolet lithography’at the University of Amsterdam (UvA). Lugier did his doctoral research in the EUV Photoresists …

  • Vanessa Verrina defends PhD thesis

    April 16, 2021

    On April 6th Vanessa Verrina successfully defended her thesis ‘Laser-induced ultrasound for the detection of buried micro- and nano-structures’ at the University of Amsterdam. Verrina did her doctoral research in …

  • PhD defense Ruben Schupp

    March 29, 2021

      On Wednesday, March 17th PhD student Ruben Schupp defended his thesis ‘Spectral characterization of solid-state laser-driven plasma sources of EUV light’ at the Vrije Universiteit in Amsterdam. Schupp performed …

  • ARCNL Newsletter 10

    February 19, 2021

    ARCNL proudly presents Newsletter 10 with highlights of the past months. Click here to open the newsletter …

  • Editor’s choice Applied Physics A

    January 26, 2021

    The journal Applied Physics A has selected a publication from the EUV Generation and Imaging group led by Stefan Witte as this month’s Editor’s Choice. First author Tiago Pinto and …

  • Spreading focus for better imaging

    January 25, 2021

    Extreme Ultraviolet (EUV) light in microscopy offers the advantage of obtaining a high-resolution image combined with spectral information about the object under study. However, because EUV microscopy uses diffraction instead …

  • Season’s greetings

    December 23, 2020

    Season’s greetings from ARCNL …

  • « Previous
  • 1
  • 2
  • 3
  • 4
  • 5
  • …
  • 10
  • 11
  • 12
  • Next »

Partners:

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • Twitter
  • LinkedIn

© ARCNL 2022

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials & Surface Science for EUVL Roland Bliem
      • Nanophotochemistry Fred Brouwer
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter