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      • EUV Plasma Processes Oscar Versolato Wim Ubachs
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
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      • High-Harmonic Generation and EUV Science Peter Kraus
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  • Successful PhD defense Christos Messinis

    December 1, 2022

    Christos Messinis (Computational Imaging group) successfully defended his dissertation ‘Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology’ on November 29th. In his dissertation Messinis writes about his investigation of the …

  • Lars Behnke wins second prize at SPIE conference

    November 2, 2022

    PhD student Lars Behnke (EUV Plasma Processes) has won the second prize with his talk Two-micrometer-wavelength laser-produced tin plasma EUV sources at the International Conference on Extreme Ultraviolet Lithography 2022 …

  • Wim Ubachs farewell symposium

    October 17, 2022

    ARCNL group leader and VU professor Wim Ubachs will step down at the end of this month. In honor of his extensive contributions to science a farewell symposium will be …

  • Successful long-awaited Open Day

    October 12, 2022

    After three years of Covid restrictions, ARCNL together with other research organizations at Amsterdam Science Park welcomed its visitors again for the Open Day on October 1st. Many of those …

  • Detailed insight into friction: how objects start to slide

    October 6, 2022

    A collaboration of chemists and physicists have shed light on a crucial aspect of friction: how things begin to slide. Using fluorescence microscopy and dedicated fluorescent molecules, they were able …

  • Best poster prize

    September 6, 2022

    ARCNL researcher Klaas Bijlsma (middle in the picture) has won the best poster prize at the International Conference on the Physics of Highly Charged Ions (HCI 2022) in Matsue, Japan.

  • Wim van der Zande appointed interim director of ARCNL

    August 19, 2022

    Dr. Wim van der Zande (ASML) has been appointed as interim director of the Advanced Research Center for Nanolithography (ARCNL) as of October 1st, 2022. Until a permanent successor has …

  • ARCNL Newsletter June 2022

    June 29, 2022

    Read our latest Newsletter of June 2022. With highlights of the past months.

  • NWO XS grant for live photoemission of plasma-based CO2 conversion

    June 23, 2022

    The group of Roland Bliem (Materials & Surface Science for Extreme Ultraviolet Lithography) has received an NWO XS grant of 50.000 euros to investigate the process of photoelectron spectroscopy in …

  • Departure Fred Brouwer: photochemistry research at ARCNL ends

    June 21, 2022

    Group leader Fred Brouwer has left ARCNL on March 1st. He will continue to work as full-time professor at the Van ‘t Hoff Institute for Molecular Sciences of the University …

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter