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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • ARCNL one step closer to Extreme Ultraviolet light (EUV)

    May 19, 2015

    ARCNL researchers recently generated plasma in the ARCNL extreme ultraviolet (EUV) generating source. The researchers used a powerful laser beam to hit a number of small indium-tin droplets turning them …

  • ERC Advanced Grant for ARCNL group leader Wim Ubachs

    May 7, 2015

    Wim Ubachs was awarded an ERC Advanced Grant of 2.5 million Euro for his proposal “Physics Beyond the Standard Model from Molecules”. Ubachs will use his grant to measure very …

  • ARCNL at Hannover Messe

    April 20, 2015

    Last week ARCNL presented itself at the Holland High Tech House of Hannover Messe. NWO coordinated the Dutch presence showing technological achievements in the Netherlands. Among the visitors was Henk …

  • Joost Frenken appointed as professor in ‘Nanoscale Surface Physics’ at VU and UvA

    February 10, 2015

    ARCNL director and group leader Joost Frenken has been appointed as professor in ‘Nanoscale Surface Physics’ both at the VU University Amsterdam and at the University of Amsterdam. The appointment …

  • ARCNL at FOM Veldhoven

    January 26, 2015

    On Tuesday, January 20th ARCNL made its first presence at the big stage of Physics@FOM meeting in Veldhoven. The annual conference of the Dutch physics community proved to be an …

  • ERC Starting Grant for ARCNL group leader Stefan Witte

    November 27, 2014

    Stefan Witte was awarded an ERC Starting Grant of 1.5 million Euro for his proposal “High-resolution microscopy without lenses: a new generation of imaging technology”. The Starting Grants of the …

  • Advanced Research Center for Nanolithography starts on 1 January 2014

    November 7, 2013

    Joost Frenken has been appointed first ARCNL director. This is a joint press release by ASML, AMOLF, FOM, NWO, University of Amsterdam, and VU. Amsterdam, 7 November 2013 - The …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter