Peter Kraus starts new group on High-Harmonic generation and EUV Science

Published on May 3, 2018
Categories General, High-Harmonic Generation and EUV Science

As of May 1, Peter Kraus has been appointed as tenure-track group leader at ARCNL. He will lead a program to develop extreme ultraviolet (EUV) sources from high-harmonic generation and apply them for ultrafast spectroscopy and nanoscale metrology experiments with relevance to nanolithography.

The High-Harmonic generation and EUV science group develops and utilizes new high-harmonic generation based EUV and soft x-ray sources in the energy range from 10 – 600 eV for spectroscopy and metrology applications. Specific areas of interest are attosecond and femtosecond time-resolved spectroscopy of complex chemical and solid-state dynamics, new strategies for efficient high-harmonic generation, as well as new routes for nanometer-scale imaging of semiconductor structures. New types of attosecond and femtosecond transient absorption and reflection spectroscopies, as well as scattering techniques, will be developed, and applied to fundamental questions with particular relevance to nanolithography.

Peter Kraus performed his PhD work at ETH Zurich (Switzerland) between 2011-2015. He developed and advanced the techniques of high harmonic-spectroscopy for investigations of electronic and nuclear structure and dynamics of molecular systems. These advances enabled the study of valence–shell electron currents in neutral molecules on the femtosecond time scale as well as the measurement and laser control of attosecond-time-scale electronic charge migration. For his PhD work, Peter was awarded the ETH medal and the Justin Jankunas doctoral dissertation award of the American Physical Society (APS) for the best thesis in chemical physics. Peter subsequently worked at the University of California, Berkeley (USA) as a fellow of the Swiss National Science Foundation (SNSF) on the development of new experimental techniques for investigating attosecond phenomena in solid-state materials.