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December issue ARCNL Newsletter

Published on December 21, 2017

ARCNL proudly presents the 6th newsletter of the Advanced Research Center for Nanolithography (ARCNL) with highlights of the past six months. ARCNL wishes you a wonderful Christmas and a happy new year.

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« Dr. Larissa Juschkin appointed as WISE fellow at ARCNL Bart Weber revisits Leonardo da Vinci’s friction law »

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© ARCNL 2021

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter