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      • EUV Plasma Processes Oscar Versolato
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News - Nanophotochemistry

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  • PhD defense Neha Thakur

    April 5, 2022

    PhD student Neha Thakur successfully defensed her thesis 'Zinc Oxoclusters for Extreme Ultraviolet Lithography' on March 28th. Thakur did her research in the Nanophotochemistry group under supervision of promotors Fred …

  • Two ARCNL publications highlighted

    October 7, 2021

    Two ARCNL publications were recently highlighted by the editors of the two journals: The Editorial Board of Physical Chemistry Chemical Physics (PCCP) selected the publication UV and VUV-induced fragmentation of …

  • ARCNL publication selected as 2021 PCCP HOT Article

    August 23, 2021

    Editors and referees of the journal Physical Chemistry Chemical Physics have selected a publication by PhD student Neha Thakur for the journal’s online rolling collection of hottest work. The open …

  • Lianjia Wu PhD defense

    November 30, 2020

    On November 18th PhD student Lianjia Wu obtained the doctorate degree after defending her thesis ‘Metal oxo clusters: molecular design for extreme ultraviolet lithography’ at the University of Amsterdam. The …

  • PhD defenses on Zoom

    June 25, 2020

    In June two PhD students of ARCNL successfully defended their theses at the University of Amsterdam. Because of the Covid-19 measures their PhD defenses were held online through ZOOM. On …

  • PhD defense Yu Zhang

    April 18, 2019

    On Thursday, April 11th ARCNL PhD student Yu Zhang successfully defended her thesis ‘Organotin Photoresists for Extreme Ultraviolet Lithography’ at the University of Amsterdam. Zhang did her doctoral research in …

  • Bart Weber revisits Leonardo da Vinci’s friction law

    March 2, 2018

    The concept of friction was already investigated five hundred years ago by Leonardo da Vinci. His most important result, the proportionality of friction to the normal force, is still used …

  • Fred Brouwer receives award in Japan

    September 15, 2017

    At this year’s conference of the Japanese Photochemistry Association in Sendai, ARCNL group leader Fred Brouwer received the prestigious Honda-Fujishima Lectureship Award. This award is handed out each year to …

  • Chemistry under extreme ultraviolet light

    September 23, 2016

    In a new international project named ELENA a total of 15 young researchers will investigate the chemistry and physics involved in emerging techniques for the creation of nanostructures. One of …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter