News

ARCNL publication selected as 2021 PCCP HOT Article

Published on August 23, 2021
Category EUV Photoresists

Editors and referees of the journal Physical Chemistry Chemical Physics have selected a publication by PhD student Neha Thakur for the journal’s online rolling collection of hottest work. The open access publication ‘Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography’, has been included on the journal’s 2021 PCCP HOT Articles page. The work is a collaboration with the University of Bremen.