Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials & Surface Science for EUVL Roland Bliem
      • Nanophotochemistry Fred Brouwer
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter
Directory

News - Computational Imaging

Category
  • Atomic Plasma Processes
  • Computational Imaging
  • Contact Dynamics
  • EUV Generation & Imaging
  • EUV Photoemission
  • EUV Photoresists
  • EUV Plasma Dynamics
  • EUV Plasma Modeling
  • EUV Plasma Processes
  • EUV Targets
  • General
  • High-Harmonic Generation and EUV Science
  • Light-Matter Interaction
  • Materials & Surface Science for EUV Lithography
  • Materials Theory and Modeling
  • Nanolayers
  • Nanophotochemistry
  • Nanoscale Imaging and Metrology
  • Plasma Theory and Modeling
  • The future of metrology is powered by algorithms

    June 30, 2020

    Yesterday, ASML published on their website a very interesting story about Arie den Boef’s research: The future of metrology is powered by algorithms. Den Boef developed YieldStar metrology and is …

Partners:

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • Twitter
  • LinkedIn

© ARCNL 2022

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials & Surface Science for EUVL Roland Bliem
      • Nanophotochemistry Fred Brouwer
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter