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  • Successful PhD defense Christos Messinis

    December 1, 2022

    Christos Messinis (Computational Imaging group) successfully defended his dissertation ‘Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology’ on November 29th. In his dissertation Messinis writes about his investigation of the …

  • The future of metrology is powered by algorithms

    June 30, 2020

    Yesterday, ASML published on their website a very interesting story about Arie den Boef’s research: The future of metrology is powered by algorithms. Den Boef developed YieldStar metrology and is …

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter