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      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
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      • Nanolayers Joost Frenken
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  • ARCNL Working Conditions Survey 2020

    July 24, 2020

    In a well-attended Zoom-session for all employees of ARCNL, Pim Stalenhoef from the company MonitorGroep presented the results of the Working Conditions Survey that his company conducted in May among …

  • Detecting hidden nanostructures by converting light into sound

    July 8, 2020

    Researchers at ARCNL have found a way to detect nanostructures buried under many layers of opaque material, using very high frequency sound waves induced by light. Their findings are promising …

  • ARCNL filling up again

    July 1, 2020

    After several months of strongly reduced presence, due to the corona crisis, 1 July marked the point where ARCNL was back to admitting 50% of its people in the Matrix …

  • The future of metrology is powered by algorithms

    June 30, 2020

    Yesterday, ASML published on their website a very interesting story about Arie den Boef’s research: The future of metrology is powered by algorithms. Den Boef developed YieldStar metrology and is …

  • PhD defenses on Zoom

    June 25, 2020

    In June two PhD students of ARCNL successfully defended their theses at the University of Amsterdam. Because of the Covid-19 measures their PhD defenses were held online through ZOOM. On …

  • ARCNL News Letter 9

    June 4, 2020

    ARCNL proudly presents News Letter 9 with highlights of the past months.   Click here to open the news letter …

  • The exceptional origin of EUV light in hot tin plasma

    May 11, 2020

    Extreme ultraviolet light (EUV light) does not naturally occur on earth, but it can be produced. In the latest nanolithography machines, that is realized using an immensely hot tin plasma.

  • Fiber imaging beyond the limits of resolution and speed

    May 8, 2020

    Researchers at ARCNL and Vrije Universiteit Amsterdam have developed a compact setup for fast, super-resolution microscopy through an ultrathin fiber. Using smart signal processing, they beat the theoretical limits of …

  • Name change group Paul Planken

    May 6, 2020

    Over the years, the focus of the research group of Paul Planken has shifted so much that its original name EUV Targets group no longer reflects the scientific focus of …

  • High-harmonic generation research of Stefan Witte in LaserFocusWorld

    April 29, 2020

    Recently, group leader Stefan Witte was interviewed on his research by LaserFocusWorld.  You can read the article High-harmonic generation sources enables ultraviolet lensless imaging here.

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© ARCNL 2021

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter