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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • New insights into the Langdon effect in extreme ultraviolet source plasmas

    February 20, 2025

    Jorge Gonzalez and John Sheil from ARCNL have published a paper in ‘Physical Review E’ that sheds new light on the Langdon effect in extreme ultraviolet (EUV) source plasmas. The …

  • Oscar Versolato new Professor of EUV plasma processes

    February 17, 2025

    As of 17 February, physicist and ARCNL Group Leader Oscar Versolato has been appointed Professor of EUV plasma processes. His chair is embedded in the Physics and Astronomy department of …

  • Universal warning signal for optical damage onset 

    January 27, 2025

    Universal and easy-to-measure warning signals for catastrophic damage occur in the metals used to transport data in computer chips. That is what ARCNL PhD student Ester Abram discovered and described …

  • New paper! Wavefront shaping and imaging through a multimode hollow-core fiber

    December 13, 2024

    Wavefront shaping and imaging through a multimode hollow-core fiber Researchers from Nanoscale Imaging and Metrology group have made significant progress in high-resolution imaging by utilizing multimode hollow-core fibers (MHCFs). Their work introduces innovative …

  • TeraTom project aims to develop innovative prototype for semiconductor industry

    December 6, 2024

    The National Growth Fund Future-proof high-tech equipment finances the project TeraTom (Terahertz Tomography for heterogeneous systems on chip). Jaime Gómez Rivas (Eindhoven University of Technology) leads the project, with academic …

  • Unique opportunities for Wetenschapsdag visitors

    November 19, 2024

    Once a year, ARCNL opens its doors wide to welcome a diverse group of visitors. The event, called Wetenschapsdag, is organized in collaboration with various research organizations at Amsterdam Science …

  • Improving super-resolution microscopy with donut-shaped light and multicolored sources

    November 14, 2024

    Researchers from the High-harmonic generation and EUV science group, led by Peter Kraus, have recently made two groundbreaking advances in the field of high-harmonic generation (HHG). This unlocks new potential …

  • ARCNL and EUV Litho hosted successful Source Workshop

    November 6, 2024

    On October 21-23, a record number of 129 participants from many countries attended the successful 2024 Source Workshop in Amsterdam. This premier yearly workshop, with Chinese, Japanese, American and European …

  • Simple universal model captures complex plasma behavior

    October 24, 2024

    If you want to get an idea of the average charge state of fast particles escaping a dense tin plasma, you only need to know the initial plasma temperature. After …

  • New position for Stefan Witte

    September 17, 2024

    ARCNL group leader Stefan Witte (EUV Generation & Imaging) has accepted a new position outside ARCNL. He has become professor at Delft University of Technology. Stefan will remain attached to …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter