ARCNL and EUV Litho hosted successful Source Workshop

On October 21-23, a record number of 129 participants from many countries attended the successful 2024 Source Workshop in Amsterdam. This premier yearly workshop, with Chinese, Japanese, American and European speakers from industry and academia, focused on the light source technology driving the chip revolution.

This year’s edition was kicked off with a keynote presentation from ASML fellow Jan van Schoot on high-NA lithography (Numerical Aperture), the exciting next step for the industry.

The Source Workshop was organized and hosted by ARCNL and EUV Litho. If you have questions, please contact Oscar Versolato (email: O.Versolato@arcnl.nl, group leader of EUV Plasma Processes – ARCNL).