Publications - Articles - ARCNL

A. Pelekanidis, K.S.E. Eikema and S. Witte, Far-field optical propagators with user-defined object-plane pixel size for ptychography, Opt. Continuum 4, (4), 804-825 (2025)
P. van Essen, B. de Keijzer, T. Horen, E.B. Molinero, A. Jiménez Galán, R.E.F. Silva and P.M. Kraus, Spatial polarization gating of high-harmonic generation in solids, Phys. Rev. Res. 7, (1), L012063: 1-6 (2025)
L. Oltra, L. Méndez, I. Rabadán, K. Bijlsma, E. de Wit and R. Hoekstra, Sequential Synchronous Mechanism for Double-Electron Capture: Insights into Unforeseen Large Cross Sections in Low-Energy Sn3++H2 Collisions, Phys. Rev. Lett. 134, (9), 093002: 1-6 (2025)
A. Pelekanidis, F. Zhang, K.S.E. Eikema and S. Witte, Generation Dynamics of Broadband Extreme Ultraviolet Vortex Beams, ACS Photonics 12, (3), 1638-1649 (2025)
T.J. van den Hooven and P.C.M. Planken, Wavelength-dependent optical detection of strain waves near intrinsic and artificial optical resonances, Opt. Lett. 50, (5), 1445-1448 (2025)
E. de Wit, L. Tinge, K. Bijlsma and R. Hoekstra, Single and Double Electron Capture by 1–16 keV Sn4+ Ions Colliding on H2, Atoms 13, (2), 12: 1-9 (2025)
E. Abram, N. Orlov, E.C. Garnett and P.C.M. Planken, Sub-ablation-threshold light-induced modification of thin ruthenium layers detected using optical reflectance, J. Appl. Phys. 136, (24), 245305: 1-14 (2024)
O.O. Versolato, I. Kaganovich, K. Bera, T. Lill, H.-C. Lee, R. Hoekstra, J. Sheil and S.K. Nam, Plasma sources for advanced semiconductor applications, Appl. Phys. Lett. 125, (23), 230401: 1-9 (2024)
R. Bliem, Buiten de grenzen van ultrahoog vacuüm, NEVAC 62, (3), 10-14 (2024)
A. Troglia, C. Leriche, M.L. van de Poll, C. Morsche, G.H. ten Brink, B.J. Kooi, B. Weber and R. Bliem, Bridging the gap between high-entropy alloys and metallic glasses: Control over disorder and mechanical properties of coatings, Mater. Today Commun. 41, 110604: 1-10 (2024)

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