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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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A. Pelekanidis, K.S.E. Eikema and S. Witte,
Far-field optical propagators with user-defined object-plane pixel size for ptychography
, Opt. Continuum
4
, (4), 804-825 (2025)
P. van Essen, B. de Keijzer, T. Horen, E.B. Molinero, A. Jiménez Galán, R.E.F. Silva and P.M. Kraus,
Spatial polarization gating of high-harmonic generation in solids
, Phys. Rev. Res.
7
, (1), L012063: 1-6 (2025)
L. Oltra, L. Méndez, I. Rabadán, K. Bijlsma, E. de Wit and R. Hoekstra,
Sequential Synchronous Mechanism for Double-Electron Capture: Insights into Unforeseen Large Cross Sections in Low-Energy Sn3++H2 Collisions
, Phys. Rev. Lett.
134
, (9), 093002: 1-6 (2025)
A. Pelekanidis, F. Zhang, K.S.E. Eikema and S. Witte,
Generation Dynamics of Broadband Extreme Ultraviolet Vortex Beams
, ACS Photonics
12
, (3), 1638-1649 (2025)
T.J. van den Hooven and P.C.M. Planken,
Wavelength-dependent optical detection of strain waves near intrinsic and artificial optical resonances
, Opt. Lett.
50
, (5), 1445-1448 (2025)
E. de Wit, L. Tinge, K. Bijlsma and R. Hoekstra,
Single and Double Electron Capture by 1–16 keV Sn4+ Ions Colliding on H2
, Atoms
13
, (2), 12: 1-9 (2025)
E. Abram, N. Orlov, E.C. Garnett and P.C.M. Planken,
Sub-ablation-threshold light-induced modification of thin ruthenium layers detected using optical reflectance
, J. Appl. Phys.
136
, (24), 245305: 1-14 (2024)
O.O. Versolato, I. Kaganovich, K. Bera, T. Lill, H.-C. Lee, R. Hoekstra, J. Sheil and S.K. Nam,
Plasma sources for advanced semiconductor applications
, Appl. Phys. Lett.
125
, (23), 230401: 1-9 (2024)
R. Bliem,
Buiten de grenzen van ultrahoog vacuüm
, NEVAC
62
, (3), 10-14 (2024)
A. Troglia, C. Leriche, M.L. van de Poll, C. Morsche, G.H. ten Brink, B.J. Kooi, B. Weber and R. Bliem,
Bridging the gap between high-entropy alloys and metallic glasses: Control over disorder and mechanical properties of coatings
, Mater. Today Commun.
41
, 110604: 1-10 (2024)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter