Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter
Directory

Publications - Articles

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • C. Xiao, L. Peng, C. Leriche, F.-C. Hsia, B. Weber and S.E. Franklin, Capillary adhesion governs the friction behavior of electrochemically corroded polycrystalline diamond, Carbon 205, 345-352 (2023)

  • J. Du, S.E. Franklin and B. Weber, A force controlled tribometer for pre-sliding measurements at the nanometer scale, Front. Mech. Eng. 9, 1019979: 1-7 (2023)

  • S. Rai, K.I. Bijlsma, L. Poirier, E. de Wit, L. Assink, A. Lassise, I. Rabadán, L. Méndez, J. Sheil, O.O. Versolato and R. Hoekstra, Evidence of production of keV Sn+ ions in the H2 buffer gas surrounding an Sn-plasma EUV source, Plasma Sources Sci. Technol. 32, (3), 035006: 1-9 (2023)

  • C.-C. Hsu, L. Peng, F.-C. Hsia, B. Weber, D. Bonn and A.M. Brouwer, Molecular Probing of the Stress Activation Volume in Vapor Phase Lubricated Friction, ACS Appl. Mater. Interfaces 15, (9), 12603-12608 (2023)

  • M. Du, X. Liu, A. Pelekanidis, F. Fengling, L. Lötgering, P. Konold, C.L. Porter, P. Smorenburg, K.S.E. Eikema and S. Witte, High-resolution wavefront sensing and aberration analysis of multi-spectral extreme ultraviolet beams, Optica 10, (2), 255-263 (2023)

  • T.-D. Terwisscha-Dekker, T. Hogenelst, R. Bliem, B. Weber and D. Bonn, Why Teflon is so slippery while other polymers are not, Phys. Rev. E 107, (2), 024801: 1-6 (2023)

  • G.Z. Li, C. Xiao, S. Zhang, S. Luo, Y. Chen and Y. Wu, Study of the humidity-controlled CeO2 fixed-abrasive chemical mechanical polishing of a single crystal silicon wafer, Tribol.Int. 178, 108087: 1-13 (2023)

  • Y.H. Liu, H. Zhang, Y. Luo, L. Wang and C. Xiao, Probing the low friction mechanism of hydrogen-free DLC film in oxygen and nitrogen environments by first-principles calculations and molecular dynamics simulation, Surf. Coat. Technol. 455, 129219: 1-11 (2023)

  • Y.M. Fan, E. Olsson, G.M. Liang, Z.J. Wang, A.M. D'Angelo, B. Johannessen, L. Thomsen, B. Cowie, L. Jingxi, F. Zhang, Y. Zhao, W.K. Pang, Q. Cai and Z. Guo, Stabilizing Cobalt‐free Li‐rich Layered Oxide Cathodes through Oxygen Lattice Regulation by Two‐phase Ru Doping, Angew. Chem. Int. Ed. 62, (5), e20221380: 1-9 (2023)

  • S. van Vliet, A. Troglia, E. Olsson and R. Bliem, Identifying silicides via plasmon loss satellites in photoemission of the Ru-Si system, Appl. Surf. Sci. 608, 155139: 1-6 (2023)

  • 1
  • 2
  • 3
  • …
  • 22
  • 23
  • 24
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • Twitter
  • LinkedIn

© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter