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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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T.-D. Terwisscha-Dekker, A.M. Brouwer, B. Weber and D. Bonn,
Elastic contact between rough surfaces: Bridging the gap between theory and experiment
, J Mech. Phys. Solids
188
, 105676: 1-9 (2024)
L. Assink, J. Brötzner, C. Cupak, M. Salverda, H.T. Jonkman, O.O. Versolato, R.A. Wilhelm and R. Hoekstra,
On the question whether surface roughness can explain the absence of a prominent single-collision peak in keV heavy-ion scattering off a polycrystalline Ru surface
, Nucl. Instrum. Methods. Phys. Res., Sect B
554
, 165442: 1-6 (2024)
M.J. Mekkering, P.C.M. Laan, A. Troglia, R. Bliem, A.C. Kizilkaya, G. Rothenberg and N. Yan,
Bottom-Up Synthesis of Platinum Dual-Atom Catalysts on Cerium Oxide
, ACS Catal.
14
, (13), 9850-9859 (2024)
H.K. Schubert, D.J. Engels, R.A. Meijer, B. Liu and O.O. Versolato,
Scaling relations in laser-induced vaporization of thin free-flying liquid metal sheets
, Phys. Rev. Res.
6
, (2), 023182: 1-12 (2024)
M. Illienko, M.C. Velsink and S. Witte,
Understanding photoacoustic signal formation in the presence of transparent thin films
, Photoacoustics
38
, 100617: 1-8 (2024)
R. Kolkowski, A. Berkhout, S.D.C. Roscam Abbing, D. Pal, C.D. Dieleman, J.J. Geuchies, A.J. Houtepen, B. Ehrler and A.F. Koenderink,
Temporal Dynamics of Collective Resonances in Periodic Metasurfaces
, ACS Photonics
11
, (6), 2480-2496 (2024)
F. Akhmetov, J. Vorberger, I. Milov, I. Makhotkin and M. Ackermann,
Ab initio-simulated optical response of hot electrons in gold and ruthenium
, Opt. Express
32
, (11), 19117-19132 (2024)
J. Gonzales Muñoz and J. Sheil,
On the role of target mass in extreme ultraviolet light generation from CO2-driven tin plasmas for nanolithography
, Phys. Plasmas
31
, (5), 050701: 1-7 (2024)
P. van Essen, Z. Nie, B. de Keijzer and P.M. Kraus,
Toward Complete All-Optical Intensity Modulation of High-Harmonic Generation from Solids
, ACS Photonics
11
, (5), 1832-1843 (2024)
L. Cruciani, M. Vreugdenhil, S. van Vliet, E. Abram, D. van Oosten, R. Bliem, K. van Druten and P.C.M. Planken,
Direct laser patterning of ruthenium below the optical diffraction limit
, Appl. Phys. Lett.
124
, (17), 171902 : 1-7 (2024)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
More
More
People
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Events
Repository
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ARCNL Newsletter