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      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Materials & Surface Science for EUVL Roland Bliem
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  • S. Rai, K.I. Bijlsma, I. Rabadán, L. Méndez, P.A.J. Wolff, M. Salverda, O.O. Versolato and R. Hoekstra, Charge exchange in collisions of 1–100-keV Sn3+ ions with H2 and D2, Phys. Rev. A 106, (1), 012804: 1-10 (2022)

  • A. Goyal, M. van der Laan, A. Troglia, M. Lin, H. Agrawal, J. van de Groep, R. Bliem, J.M.J. Paulusse, P. Schall and K. Dohnalová, Microscopic Proof of Photoluminescence from Mechanochemically Synthesized 1-Octene-Capped Quantum-Confined Silicon Nanoparticles: Implications for Light-Emission Applications, ACS Omega 7, (28), 24881-24887 (2022)

  • B. Lochocki, J.M. Hoozemans, J.F. de Boer and L.V. Amitonova, Epi-fluorescence imaging of the human brain through a multimode fiber, 7, (7), 071301: 1-7 (2022)

  • L. Poirier, A. Lassise, Y. Mostafa, L. Behnke, N. Braaksma, L. Assink, R. Hoekstra and O.O. Versolato, Energy- and charge-state-resolved spectrometry of tin laser-produced plasma using a retarding field energy analyzer, Appl. Phys. B: Lasers Opt. 128, (7), 135: 1-7 (2022)

  • Y. Liu, L. Wang and C. Xiao, The synergistic mechanism between transfer layer and surface passivation of diamond-like carbon film under different gas pressure environments, Appl.Surf. Sci. 587, 152874: 1-8 (2022)

  • C. Leriche, S.E. Franklin and B. Weber, Measuring multi-asperity wear with nanoscale precision, Wear 498-499, 204284: 1-5 (2022)

  • R.A. Meijer, D. Kurilovich, B. Liu, Z. Mazzotta, J. Hernandez-Rueda, O.O. Versolato and S. Witte, Nanosecond laser ablation threshold of liquid tin microdroplets, Appl. Phys. A 128, (7), 570: 1-8 (2022)

  • S.D.C. Roscam Abbing, R. Kolkowski, Z.-Y. Zhang, F. Campi, L. Lötgering, A.F. Koenderink and P.M. Kraus, Extreme-ultraviolet shaping and imaging by high-harmonic generation from nanostructured silica, Phys.Rev.Lett. 128, (22), 223902: 1-7 (2022)

  • ZP. Lyu, G. Osnabrugge, P.W.H. Pinkse and L.V. Amitonova, Focus quality in raster-scan imaging via a multimode fiber, Appl.Opt. 61, (15), 4363-4369 (2022)

  • C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef, Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects, Opt. Continuum 1, (5), 1202-1217 (2022)

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter