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EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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ZP. Lyu, G. Osnabrugge, P.W.H. Pinkse and L.V. Amitonova,
Focus quality in raster-scan imaging via a multimode fiber
, Appl. Opt.
61
, (15), 4363-4369 (2022)
C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef,
Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects
, Opt. Continuum
1
, (5), 1202-1217 (2022)
J. Guo, S. Tan and C. Xiao,
Atomistic understanding of scratching-induced material attrition of wurtzite single-crystal AlN using nanoscale diamond abrasive
, Tribol.Int.
169
, 107483: 1-9 (2022)
X. Yao, E. Olsson, M. Wang, J.A. Wang, Q. Cai, N.H. Peng, R. Webb and Y. Zhao,
Xenon Ion Implantation Induced Surface Compressive Stress for Preventing Dendrite Penetration in Solid‐State Electrolytes
, Small, 2108124: 1-9 (2022)
A.C.C. de Beurs, L. Lötgering, M. Herczog, M. Du, K.S.E. Eikema and S. Witte,
aPIE: an angle calibration algorithm for reflection ptychography
, Opt. Lett.
47
, (8), 1949-1952 (2022)
A. Troglia, S. van Vliet, G. Yetik, I.El. Wakil, J. Momand, B.J. Kooi and R. Bliem,
Free-standing nanolayers based on Ru silicide formation on Si(100)
, Phys. Rev. Mater.
6
, (4), 043402: 1-8 (2022)
M. Meier, J. Hulva, Z. Jakub, F. Kraushofer, M. Bobić, R. Bliem, M. Setvin, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson,
CO oxidation by Pt-2/Fe3O4: Metastable dimer and support configurations facilitate lattice oxygen extraction
, Sci. Adv.
8
, (13), eabn4580: 1-8 (2022)
N. Tavakoli, R. Spalding, A. Lambertz, P. Koppejan, G. Gkantzounis, C. Wan, R. Röhrich, E. Kontoleta, A.F. Koenderink, R. Sapienza, M. Florescu and E. Alarcón-Lladó,
Over 65% Sunlight Absorption in a 1 μm Si Slab with Hyperuniform Texture
, ACS Photonics, (2022)
K. Abrashitova and L.V. Amitonova,
High-speed label-free multimode-fiber-based compressive imaging beyond the diffraction limit
, Opt. Express
30
, (7), 10456-10469 (2022)
R.A. Meijer, D. Kurilovich, K.S.E. Eikema, O.O. Versolato and S. Witte,
The transition from short- to long-timescale pre-pulses: Laser-pulse impact on tin microdroplets
, J. Appl. Phys.
131
, (10), 105905: 1-11 (2022)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter