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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • P.C.M. Laan, M.J. Mekkering, F.J. de Zwart, A. Troglia, R. Bliem, K. Zhao, J.G. Norbert, B. de Bruin, G. Rothenberg, J.N.H. Reek and N. Yan, Tuning catalytic performance of platinum single atoms by choosing the shape of cerium dioxide supports, Catal. Sci. Technol. 14, (19), 5662-5670 (2024)

  • J. Mathijssen, E.J. Salumbides, K.S.E. Eikema and S. Witte, Sub-cycle dynamics in two-color high-harmonic generation from laser-produced plasmas, Opt. Express 32, (17), 30824-30838 (2024)

  • Q. Evrard, N. Sadegh, S. Mathew, E. Zuidinga, B. Watts, M. Paradiz Dominguez, A. Giglia, N. Mahne, S. Nannarone, A. Nishimura, T. Goya, T. Sugioka, M. Vockenhuber, Y. Ekinci and A.M. Brouwer, Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions, ACS Appl. Mater. Interfaces 16, (32), 42947-42956 (2024)

  • H.C. Strauch, F. Zhang, S. Mathias, T. Hohage, S. Witte and G.S.M. Jansen, Fast spectroscopic imaging using extreme ultraviolet interferometry, Opt. Express 32, (16), 28644-26654 (2024)

  • B. de Keijzer, P. van Essen and P.M. Kraus, Effect of photoexcitation on high-harmonic generation in semiconductors, J. Opt. Soc. Am. B 41, (8), 1754-1763 (2024)

  • T.-D. Terwisscha-Dekker, A.M. Brouwer, B. Weber and D. Bonn, Elastic contact between rough surfaces: Bridging the gap between theory and experiment, J Mech. Phys. Solids 188, 105676: 1-9 (2024)

  • L. Assink, J. Brötzner, C. Cupak, M. Salverda, H.T. Jonkman, O.O. Versolato, R.A. Wilhelm and R. Hoekstra, On the question whether surface roughness can explain the absence of a prominent single-collision peak in keV heavy-ion scattering off a polycrystalline Ru surface, Nucl. Instrum. Methods. Phys. Res., Sect B 554, 165442: 1-6 (2024)

  • M.J. Mekkering, P.C.M. Laan, A. Troglia, R. Bliem, A.C. Kizilkaya, G. Rothenberg and N. Yan, Bottom-Up Synthesis of Platinum Dual-Atom Catalysts on Cerium Oxide, ACS Catal. 14, (13), 9850-9859 (2024)

  • H.K. Schubert, D.J. Engels, R.A. Meijer, B. Liu and O.O. Versolato, Scaling relations in laser-induced vaporization of thin free-flying liquid metal sheets, Phys. Rev. Res. 6, (2), 023182: 1-12 (2024)

  • M. Illienko, M.C. Velsink and S. Witte, Understanding photoacoustic signal formation in the presence of transparent thin films, Photoacoustics 38, 100617: 1-8 (2024)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter