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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Y. Huo, M.K. Espinoza Cangahuala, V. Zamudio-Bayer, M. Goulart, M. Kubin, M. Timm, J.T. Lau, B. von Issendorff, R. Hoekstra, S. Faraji and T. Schlathölter,
A comparative laboratory study of soft X-ray-induced ionization and fragmentation of five small PAH cations
, Eur. Phys. J. D
77
, (10), 181: 1-11 (2023)
J. Vandersmissen, R.A. Meijer, J. Sukham, A. Erkelens, A. Jan Bonne and E. Verhagen,
Optical readout and actuation of plasmonic nano-optomechanical drum resonators
, Opt. Mater. Express
13
, (10), 2979-2996 (2023)
L. Cruciani, S. van Vliet, A. Troglia, R. Bliem, J.N. van Druten and P.C.M. Planken,
Femtosecond laser induced emission of coherent terahertz pulses from ruthenium thin films
, , (2023)
C. Leriche, C. Xiao, S.E. Franklin and B. Weber,
From atomic attrition to mild wear at multi-asperity interfaces: The wear of hard Si3N4 repeatedly contacted against soft Si
, Wear
528-529
, 204975: 1-8 (2023)
Y. Mostafa, Z. Bouza, J. Byers, I. Babenko, W.M.G. Ubachs, O.O. Versolato and M. Bayraktar,
Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates
, Opt. Lett.
48
, (16), 4316-4318 (2023)
L. Poirier, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato,
Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4–40×10^10 W/cm2 range
, Phys. Plasmas
30
, (8), 083505 : 1-10 (2023)
L. Behnke, E.J. Salumbides, G. Göritz, Y. Mostafa, D.J. Engels, W.M.G. Ubachs and O.O. Versolato,
High-energy parametric oscillator and amplifier pulsed light source at 2-μm
, Opt. Express
31
, (15), 24142-24156 (2023)
J. Guo, Y. Liu, L. Duan, F. Zhang and C. Xiao,
Towards a deeper understanding of temperature-dependent material removal of single-crystal AlN: An atomistic study
, Tribol.Int.
185
, 108575: 1-10 (2023)
B. Liu, R.A. Meijer, W. Li, J. Hernandez-Rueda, H. Gelderblom and O.O. Versolato,
Mass partitioning in fragmenting tin sheets
, Phys. Rev. Appl.
20
, (1), 014048: 1-18 (2023)
C. Xiao, S. van Vliet, R. Bliem, B. Weber and S.E. Franklin,
Electrochemically-stimulated nanoscale mechanochemical wear of silicon
, Friction
11
, (2023)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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