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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • H.K. Schubert, D.J. Engels, M. Kharbedia, H. Gelderblom and O.O. Versolato, Observation of discrete concentric surface modulations on free-flying liquid tin sheets, Phys. Fluids 37, (9), 094108: 1-13 (2025)

  • F. Bijloo, A.J. den Boef, P.M. Kraus and A.F. Koenderink, Structure-in-Void Quasi-Bound State in the Continuum Metasurface for Deeply Subwavelength Nanostructure Metrology, ACS Nano, (2025)

  • T.J. van den Hooven, L. Cruciani and P.C.M. Planken, Broadband optical detection of strain waves in a thin ruthenium film, Opt. Express 33, (16), 33232-33247 (2025)

  • J. Cottom, L. Hückmann, J. Meyer and E. Olsson, Forged by Charge: Polaron-Induced Matrix Formation in Silicon Nitride Conversion-Type Anodes for Lithium-ion Batteries, J. Mater. Chem. A, (2025)

  • A. Pradhan, M.H. Müser, M.H. Miller, J.P. Abdelnabe, L. Afferrante, D. Albertini, C. Leriche, B. Weber and et. al, The Surface-Topography Challenge: A Multi-Laboratory Benchmark Study to Advance the Characterization of Topography, Tribol. Lett. 73, 110: 1-26 (2025)

  • F. Betz, F. Binkowski, J.D. Fischbach, N. Feldman, L. Zschiedrich, C. Rockstuhl, A.F. Koenderink and S. Burger, Uncovering Hidden Resonances in Non‐Hermitian Systems with Scattering Thresholds, Laser & Photonics Rev., e00811: 1-6 (2025)

  • D.J. Engels, H.K. Schubert, M. Kharbedia, W.M.G. Ubachs and O.O. Versolato, Spectroscopic imaging of tin vapor near plasma threshold, Phys. Rev. Res. 7, (2), 023307: 1-8 (2025)

  • E. Abram and P.C.M. Planken, Light-induced optical and nanostructural changes of Si gratings, Opt. Express 33, (13), 27839: 1-17 (2025)

  • M.C. Velsink, M. Illienko, K. Chaudhary and S. Witte, Improving signal-to-noise ratios in pump-probe spectroscopy on light-sensitive samples by adapting pulse repetition rates, Opt. Express 33, (11), 23632-23632 (2025)

  • M. Illienko, K. Chaudhary, M.C. Velsink and S. Witte, Characterization of Sub-Optical-Wavelength Structures through Optically Opaque Films Using Picosecond Ultrasonics, Nano Lett. 25, (22), 8909-8914 (2025)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter