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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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J. Cottom, S. van Vliet, J. Meyer, R. Bliem and E. Olsson,
Coverage-Dependent Stability of RuxSiy on Ru(0001): A Comparative DFT and XPS Study
, Phys. Chem. Chem. Phys., (2024)
A. Pelekanidis, F. Zhang, M. Gouder, J. Seifert, M. Du, K.S.E. Eikema and S. Witte,
Illumination diversity in multiwavelength extreme ultraviolet ptychography
, Photon. Res.
12
, (12), 2757-2771 (2024)
S. Payá, N. Diez, J. Cottom, E. Olsson and M. Sevilla,
MgSO4 as an Effective, Low-Temperature Sulfur Dopant for Carbon Materials Enabling Fast Sodium Storage
, ACS Appl. Energy Mater.
7
, (21), 10061-10072 (2024)
F. Bijloo, K. Murzyn, F. van Emmerik, A.J. den Boef, P.M. Kraus and A.F. Koenderink,
Near-Unity All-Optical Modulation of Third-Harmonic Generation with a Fano-Resonant Dielectric Metasurface
, Nano Lett.
24
, (41), 12942-12947 (2024)
I. Babenko, Y. Mostafa, Z. Bouza, O.O. Versolato and M. Bayraktar,
Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates
, AIP Advances
14
, (10), 105021: 1-7 (2024)
S.D.C. Roscam Abbing, N. Kuzkova, van der Linden, F. Campi, B. de Keijzer, C. Morice, Z.-Y. Zhang, M.L.S. van der Geest and P.M. Kraus,
Enhancing the efficiency of high-order harmonics with two-color non-collinear wave mixing in silica
, Nature Commun.
15
, (1) (2024)
J.H. Buss, S. Starosielec, M. Schulz, R. Riedel, F. Campi, C.S. Lehmann, S. Witte and P.M. Kraus,
Mid-infrared optical parametric chirped-pulse amplifier at 50 W and 38 fs pumped by a high-power Yb-InnoSlab platform
, Opt. Express
32
, (21), 36185-36192 (2024)
S.J.J. de Lange, D.J. Hemminga, Y. Mostafa, R.A. Meijer, O.O. Versolato and J. Sheil,
Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 textmu m-wavelength laser for future EUV lithography
, Plasma Sources Sci. Technol.
33
, (10), 105003: 1-14 (2024)
J. Sheil, L. Poirier, A.C. Lassise, D.J. Hemminga, S. Schouwenaars, N. Braaksma, A. Frenzel, R. Hoekstra and O.O. Versolato,
Power-Law Scaling Relating the Average Charge State and Kinetic Energy in Expanding Laser-Driven Plasmas
, Phys. Rev. Lett.
133
, (12), 125101: 1-6 (2024)
J. Antonowicz, A. Olczak, K. Sokolowski-Tinten, P. Zalden, I. Milov, R. Sobierajski and et. al,
Structural pathways for ultrafast melting of optically excited thin polycrystalline Palladium films
, Acta Mater.
276
, 120043: 1-15 (2024)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter