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Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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C. Leriche, C. Xiao, S.E. Franklin and B. Weber,
From atomic attrition to mild wear at multi-asperity interfaces: The wear of hard Si3N4 repeatedly contacted against soft Si
, Wear
528-529
, 204975: 1-8 (2023)
Y. Mostafa, Z. Bouza, J. Byers, I. Babenko, W.M.G. Ubachs, O.O. Versolato and M. Bayraktar,
Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates
, Opt. Lett.
48
, (16), 4316-4318 (2023)
L. Poirier, A. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato,
Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4–40×10^10 W/cm2 range
, Phys. Plasmas
30
, (8), 083505 : 1-10 (2023)
L. Behnke, E.J. Salumbides, G. Göritz, Y. Mostafa, D. Engels, W.M.G. Ubachs and O.O. Versolato,
High-energy parametric oscillator and amplifier pulsed light source at 2-μm
, Opt. Express
31
, (15), 24142-24156 (2023)
J. Guo, Y. Liu, L. Duan, F. Zhang and C. Xiao,
Towards a deeper understanding of temperature-dependent material removal of single-crystal AlN: An atomistic study
, Tribol.Int.
185
, 108575: 1-10 (2023)
B. Liu, R.A. Meijer, W. Li, J. Hernandez-Rueda, H. Gelderblom and O.O. Versolato,
Mass partitioning in fragmenting tin sheets
, Phys. Rev. Appl.
20
, (1), 014048: 1-18 (2023)
C. Xiao, S. van Vliet, R. Bliem, B. Weber and S.E. Franklin,
Electrochemically-stimulated nanoscale mechanochemical wear of silicon
, Friction
11
, (2023)
W. Li, K. Abrashitova and L.V. Amitonova,
Super-resolution multimode fiber imaging with an untrained neural network
, Opt. Lett.
48
, (13), 3363-3366 (2023)
P.C.M. Laan, F.J. de Zwart, E.M. Wilson, A. Troglia, O.C.M. Lugier, J.G. Norbert, R. Bliem, J.N.H. Reek, B. de Bruin, G. Rothenberg and N. Yan,
Understanding the Oxidative Properties of Nickel Oxyhydroxide in Alcohol Oxidation Reactions
, ACS Catal.
13
, (13), 8467-8476 (2023)
F. Cassin, R. Hahury, T. Lançon, S.E. Franklin and B. Weber,
The nucleation, growth, and adhesion of water bridges in sliding nano-contacts
, J. Chem. Phys.
158
, (22), 224703: 1-8 (2023)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
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