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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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A. Pelekanidis, F. Zhang, K.S.E. Eikema and S. Witte,
Generation Dynamics of Broadband Extreme Ultraviolet Vortex Beams
, ACS Photonics
12
, (3), 1638-1649 (2025)
M. Noordam, T. van Gardingen-Cromwijk and A.J. den Boef,
Diffraction-based overlay metrology using polarization-resolved dark-field digital holographic microscopy
, J. Micro/Nanopattern. Mater. Metrol.
24
, (01), 014002: 1-13 (2025)
T.J. van den Hooven and P.C.M. Planken,
Wavelength-dependent optical detection of strain waves near intrinsic and artificial optical resonances
, Opt. Lett.
50
, (5), 1445-1448 (2025)
J. Kim, T. van Gardingen-Cromwijk, M. Noordam, M. Adhikary, J.F. de Boer, C. Park, Y. Kang and A.J. den Boef,
Correcting spurious apodization effects in digital holographic microscopy using a simple Fourier transform spectrometer
, Opt. Continuum
4
, (2), 382-395 (2025)
J. Gonzalez and J. Sheil,
Langdon effect in the realm of extreme ultraviolet source plasmas
, Phys. Rev. E
111
, (2), L023201: 1-6 (2025)
E. de Wit, L. Tinge, K. Bijlsma and R. Hoekstra,
Single and Double Electron Capture by 1–16 keV Sn4+ Ions Colliding on H2
, Atoms
13
, (2), 12: 1-9 (2025)
C. Xiao, L. Peng, C. Leriche, F.-C. Hsia, B. Weber and S.E. Franklin,
Corrigendum to “Capillary adhesion governs the friction behavior of electrochemically corroded polycrystalline diamond” [Carbon 205 (2023) 345–352]
, Carbon
232
, 119773: 1-1 (2025)
K. Chaudhary, M. Illienko, T.J. van den Hooven, S. Witte and P.C.M. Planken,
Optically enhancing and controlling photoacoustic signals using ultra-thin semiconductor coatings on metal surfaces
, Opt. Express
33
, (1), 199-214 (2025)
E. Abram, N. Orlov, E.C. Garnett and P.C.M. Planken,
Sub-ablation-threshold light-induced modification of thin ruthenium layers detected using optical reflectance
, J. Appl. Phys.
136
, (24), 245305: 1-14 (2024)
O.O. Versolato, I. Kaganovich, K. Bera, T. Lill, H.-C. Lee, R. Hoekstra, J. Sheil and S.K. Nam,
Plasma sources for advanced semiconductor applications
, Appl. Phys. Lett.
125
, (23), 230401: 1-9 (2024)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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More
People
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Repository
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ARCNL Newsletter