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Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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P. Ducarme, B. Weber, M. van Hecke and J.T.B. Overvelde,
Exotic mechanical properties enabled by countersnapping instabilities
, PNAS
122
, (16), e2423301122: 1-8 (2025)
J. Cottom, Q. Cai and E. Olsson,
Vacancy enhanced Li, Na, and K clustering on graphene
, Sustain. Energy Fuels
9
, (10), 2813-2826 (2025)
A. Pelekanidis, K.S.E. Eikema and S. Witte,
Far-field optical propagators with user-defined object-plane pixel size for ptychography
, Opt. Continuum
4
, (4), 804-825 (2025)
A. Ivanina, M. Marshall, K. Abrashitova, T. van Leeuwen and L.V. Amitonova,
Quantitative phase imaging with a multimode fiber
, APL Photonics
10
, (4), 046116 : 1-11 (2025)
P. van Essen, B. de Keijzer, T. Horen, E.B. Molinero, A. Jiménez Galán, R.E.F. Silva and P.M. Kraus,
Spatial polarization gating of high-harmonic generation in solids
, Phys. Rev. Res.
7
, (1), L012063: 1-6 (2025)
L. Oltra, L. Méndez, I. Rabadán, K. Bijlsma, E. de Wit and R. Hoekstra,
Sequential Synchronous Mechanism for Double-Electron Capture: Insights into Unforeseen Large Cross Sections in Low-Energy Sn3++H2 Collisions
, Phys. Rev. Lett.
134
, (9), 093002: 1-6 (2025)
A. Pelekanidis, F. Zhang, K.S.E. Eikema and S. Witte,
Generation Dynamics of Broadband Extreme Ultraviolet Vortex Beams
, ACS Photonics
12
, (3), 1638-1649 (2025)
M. Noordam, T. van Gardingen-Cromwijk and A.J. den Boef,
Diffraction-based overlay metrology using polarization-resolved dark-field digital holographic microscopy
, J. Micro/Nanopattern. Mater. Metrol.
24
, (01), 014002: 1-13 (2025)
T.J. van den Hooven and P.C.M. Planken,
Wavelength-dependent optical detection of strain waves near intrinsic and artificial optical resonances
, Opt. Lett.
50
, (5), 1445-1448 (2025)
J. Kim, T. van Gardingen-Cromwijk, M. Noordam, M. Adhikary, J.F. de Boer, C. Park, Y. Kang and A.J. den Boef,
Correcting spurious apodization effects in digital holographic microscopy using a simple Fourier transform spectrometer
, Opt. Continuum
4
, (2), 382-395 (2025)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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More
People
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Repository
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ARCNL Newsletter