Publications - Articles - ARCNL

T.-D. Terwisscha-Dekker, T. Hogenelst, R. Bliem, B. Weber and D. Bonn, Why Teflon is so slippery while other polymers are not, Phys. Rev. E 107, (2), 024801: 1-6 (2023)
G.Z. Li, C. Xiao, S. Zhang, S. Luo, Y. Chen and Y. Wu, Study of the humidity-controlled CeO2 fixed-abrasive chemical mechanical polishing of a single crystal silicon wafer, Tribol.Int. 178, 108087: 1-13 (2023)
Y.H. Liu, H. Zhang, Y. Luo, L. Wang and C. Xiao, Probing the low friction mechanism of hydrogen-free DLC film in oxygen and nitrogen environments by first-principles calculations and molecular dynamics simulation, Surf. Coat. Technol. 455, 129219: 1-11 (2023)
Y.M. Fan, E. Olsson, G.M. Liang, Z.J. Wang, A.M. D'Angelo, B. Johannessen, L. Thomsen, B. Cowie, L. Jingxi, F. Zhang, Y. Zhao, W.K. Pang, Q. Cai and Z. Guo, Stabilizing Cobalt‐free Li‐rich Layered Oxide Cathodes through Oxygen Lattice Regulation by Two‐phase Ru Doping, Angew. Chem. Int. Ed. 62, (5), e20221380: 1-9 (2023)
S. van Vliet, A. Troglia, E. Olsson and R. Bliem, Identifying silicides via plasmon loss satellites in photoemission of the Ru-Si system, Appl. Surf. Sci. 608, 155139: 1-6 (2023)
T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W.M.J. Coene, S. Witte, J.F. de Boer and A.J. den Boef, Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology, Opt. Express 31, (1), 411-425 (2023)
Y.'T. Zhang, S.C. Qin, Q.Q. Du, Y.Q. Gan, J. Zhao, M.R. Li, X.L. Zheng, A.R. Wang, Y.L. Liu, S.H. Li, R.X. Dong, Z. Nie, C.L. Liu, W.J. Wang and F.Q. Wang, Ultrafast and Stable Organic Single‐Crystal Vertical Phototransistor for Self‐Powered Photodetection and High‐Speed Imaging, Adv. Electron. Mater. 9, (2), 2201097: 1-9 (2022)
B. Weber, J. Scheibert, M.P. de Boer and A. Dhinojwala, Experimental insights into adhesion and friction between nominally dry rough surfaces, MRS Bulletin 47, (12), 1237-1246 (2022)
Q. Evrard, N. Sadegh, Y. Ekinci, M. Vockenhuber, N. Mahne, A. Giglia, S. Nannarone, T. Goya, T. Sugioka and A.M. Brouwer, Influence of Counteranions on the Performance of Tin-based EUV Photoresists, J. Photopolym. Sci. Technol. 35, (1), 95-100 (2022)
A.M. Brouwer, Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists, J. Photopolym. Sci. Technol. 35, (1), 81-86 (2022)

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