Publications - Articles - ARCNL

M. Noordam, T. van Gardingen-Cromwijk and A.J. den Boef, Diffraction-based overlay metrology using polarization-resolved dark-field digital holographic microscopy, J. Micro/Nanopattern. Mater. Metrol. 24, (01), 014002: 1-13 (2025)
T.J. van den Hooven and P.C.M. Planken, Wavelength-dependent optical detection of strain waves near intrinsic and artificial optical resonances, Opt. Lett. 50, (5), 1445-1448 (2025)
J. Kim, T. van Gardingen-Cromwijk, M. Noordam, M. Adhikary, J.F. de Boer, C. Park, Y. Kang and A.J. den Boef, Correcting spurious apodization effects in digital holographic microscopy using a simple Fourier transform spectrometer, Opt. Continuum 4, (2), 382-395 (2025)
J. Gonzalez and J. Sheil, Langdon effect in the realm of extreme ultraviolet source plasmas, Phys. Rev. E 111, (2), L023201: 1-6 (2025)
E. de Wit, L. Tinge, K. Bijlsma and R. Hoekstra, Single and Double Electron Capture by 1–16 keV Sn4+ Ions Colliding on H2, Atoms 13, (2), 12: 1-9 (2025)
C. Xiao, L. Peng, C. Leriche, F.-C. Hsia, B. Weber and S.E. Franklin, Corrigendum to “Capillary adhesion governs the friction behavior of electrochemically corroded polycrystalline diamond” [Carbon 205 (2023) 345–352], Carbon 232, 119773: 1-1 (2025)
K. Chaudhary, M. Illienko, T.J. van den Hooven, S. Witte and P.C.M. Planken, Optically enhancing and controlling photoacoustic signals using ultra-thin semiconductor coatings on metal surfaces, Opt. Express 33, (1), 199-214 (2025)
E. Abram, N. Orlov, E.C. Garnett and P.C.M. Planken, Sub-ablation-threshold light-induced modification of thin ruthenium layers detected using optical reflectance, J. Appl. Phys. 136, (24), 245305: 1-14 (2024)
O.O. Versolato, I. Kaganovich, K. Bera, T. Lill, H.-C. Lee, R. Hoekstra, J. Sheil and S.K. Nam, Plasma sources for advanced semiconductor applications, Appl. Phys. Lett. 125, (23), 230401: 1-9 (2024)
R. Bliem, Buiten de grenzen van ultrahoog vacuüm, NEVAC 62, (3), 10-14 (2024)

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