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EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - Proceedings
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Q. Evrard, N. Sadegh, C.-C. Hsu, N. Mahne, A. Giglia, S. Nannarone, Y. Ekinci, M. Vockenhuber, A. Nishimura, T. Goya, T. Sugioka and A.M. Brouwer:
Influence of the anion in tin-based EUV photoresists properties
In:
Advances in Patterning Materials and Processes XL, SPIE., 2023.
T.J. van den Hooven, G. de Haan and P.C.M. Planken:
Enhancement of acoustic-wave induced reflection changes through surface plasmon polaritons
In:
Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 1205305, SPIE., 2022.
X. Liu, L. Loetgering, A.C.C. de Beurs, M. Du, P. Konold, K.S.E. Eikema and S. Witte:
Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography
In:
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
K. Abrashitova and L.V. Amitonova:
Sub-Nyquist label-free fiber-based ghost imaging
In:
2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), IEEE, 2021. - pp. 1-1
Z. Mazzotta, J. Mathijssen, K.S.E. Eikema, O.O. Versolato and S. Witte:
TI-REX: A Tunable Infrared laser for Experiments in nanolithography
In:
, IEEE, 2021.
ZP. Lyu, M.C. Velsink, P.W.H. Pinkse and L.V. Amitonova:
Superiority of a Square-core Multimode Fiber for Imaging and Spectroscopy
In:
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
A.C.C. de Beurs, L. Loetgering, M. Herczog, K.S.E. Eikema and S. Witte:
aPIE: Angle calibration algorithm for reflection ptychography
In:
OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP), paper CW6B.4, OSA Technical Digest (Optical Society of America), 2021.
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef:
Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
In:
Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.
A. Pelekanidis, L. Loetgering and S. Witte:
Ptychography-based characterization of wavelength-tunable vortex beams
In:
Computational Optical Sensing and Imaging, COSI 2021 - Part of OSA Imaging and Applied Optics Congress 2021, paper CTu6A.1, OSA Technical Digest (Optical Society of America), 2021.
F. Campi, S.D.C. Roscam Abbing, Z.-Y. Zhang, M.L.S. van der Geest and P.M. Kraus:
Efficient extreme-ultraviolet multi-band high-order wave mixing in silica
In:
Proc. SPIE 11886, International Conference on X-Ray Lasers 2020, SPIE., 2021. - pp. 117-124
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Wim Ubachs
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
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Coming from abroad
More
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