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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - Proceedings
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Bachelor Thesis
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Master Thesis
Proceedings
Theses
M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef:
Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy
In:
Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE-Intl Soc Optical Eng, 2023. - pp. 126180W: 1-6
Q. Evrard, N. Sadegh, C.-C. Hsu, N. Mahne, A. Giglia, S. Nannarone, Y. Ekinci, M. Vockenhuber, A. Nishimura, T. Goya, T. Sugioka and A.M. Brouwer:
Influence of the anion in tin-based EUV photoresists properties
In:
Advances in Patterning Materials and Processes XL 12498, SPIE-Intl Soc Optical Eng, 2023.
D.J. Hemminga, L. Poirier, J. Hernandez-Rueda, B. Liu, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato:
Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography
In:
Proceedings of SPIE 12494 ,Optical and EUV Nanolithography XXXVI, SPIE-Intl Soc Optical Eng, 2023.
T.J. van den Hooven, G. de Haan and P.C.M. Planken:
Enhancement of acoustic-wave induced reflection changes through surface plasmon polaritons
In:
Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 1205305, SPIE-Intl Soc Optical Eng, 2022.
K. Abrashitova and L.V. Amitonova:
Sub-Nyquist label-free fiber-based ghost imaging
In:
2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), IEEE, 2021. - pp. 1-1
X. Liu, L. Loetgering, A.C.C. de Beurs, M. Du, P. Konold, K.S.E. Eikema and S. Witte:
Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography
In:
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
Z. Mazzotta, J. Mathijssen, K.S.E. Eikema, O.O. Versolato and S. Witte:
TI-REX: A Tunable Infrared laser for Experiments in nanolithography
In:
, IEEE, 2021.
ZP. Lyu, M.C. Velsink, P.W.H. Pinkse and L.V. Amitonova:
Superiority of a Square-core Multimode Fiber for Imaging and Spectroscopy
In:
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef:
Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
In:
Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.
A.C.C. de Beurs, L. Loetgering, M. Herczog, K.S.E. Eikema and S. Witte:
aPIE: Angle calibration algorithm for reflection ptychography
In:
OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP), paper CW6B.4, OSA Technical Digest (Optical Society of America), 2021.
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Career
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