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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Proceedings

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  • M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef: Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy In: Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE-Intl Soc Optical Eng, 2023. - pp. 126180W: 1-6

  • Q. Evrard, N. Sadegh, C.-C. Hsu, N. Mahne, A. Giglia, S. Nannarone, Y. Ekinci, M. Vockenhuber, A. Nishimura, T. Goya, T. Sugioka and A.M. Brouwer: Influence of the anion in tin-based EUV photoresists properties In: Advances in Patterning Materials and Processes XL 12498, SPIE-Intl Soc Optical Eng, 2023.

  • D.J. Hemminga, L. Poirier, J. Hernandez-Rueda, B. Liu, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato: Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography In: Proceedings of SPIE 12494 ,Optical and EUV Nanolithography XXXVI, SPIE-Intl Soc Optical Eng, 2023.

  • T.J. van den Hooven, G. de Haan and P.C.M. Planken: Enhancement of acoustic-wave induced reflection changes through surface plasmon polaritons In: Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 1205305, SPIE-Intl Soc Optical Eng, 2022.

  • K. Abrashitova and L.V. Amitonova: Sub-Nyquist label-free fiber-based ghost imaging In: 2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), IEEE, 2021. - pp. 1-1

  • X. Liu, L. Loetgering, A.C.C. de Beurs, M. Du, P. Konold, K.S.E. Eikema and S. Witte: Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.

  • Z. Mazzotta, J. Mathijssen, K.S.E. Eikema, O.O. Versolato and S. Witte: TI-REX: A Tunable Infrared laser for Experiments in nanolithography In: , IEEE, 2021.

  • Z. Lyu, M.C. Velsink, P.W.H. Pinkse and L.V. Amitonova: Superiority of a Square-core Multimode Fiber for Imaging and Spectroscopy In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.

  • A.C.C. de Beurs, L. Loetgering, M. Herczog, K.S.E. Eikema and S. Witte: aPIE: Angle calibration algorithm for reflection ptychography In: OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP), paper CW6B.4, OSA Technical Digest (Optical Society of America), 2021.

  • C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef: Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
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      • Coming from abroad
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  • More
    • More

      • People
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      • Repository
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      • ARCNL Newsletter