Publications - Proceedings - ARCNL

M. Adhikary, T. Cromwijk, S. Witte, J.F. de Boer and A.J. den Boef: Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy In: Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, SPIE-Intl Soc Optical Eng, 2023. - pp. 126180W: 1-6
Q. Evrard, N. Sadegh, C.-C. Hsu, N. Mahne, A. Giglia, S. Nannarone, Y. Ekinci, M. Vockenhuber, A. Nishimura, T. Goya, T. Sugioka and A.M. Brouwer: Influence of the anion in tin-based EUV photoresists properties In: Advances in Patterning Materials and Processes XL 12498, SPIE-Intl Soc Optical Eng, 2023.
D.J. Hemminga, L. Poirier, J. Hernandez-Rueda, B. Liu, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato: Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography In: Proceedings of SPIE 12494 ,Optical and EUV Nanolithography XXXVI, SPIE-Intl Soc Optical Eng, 2023.
T.J. van den Hooven, G. de Haan and P.C.M. Planken: Enhancement of acoustic-wave induced reflection changes through surface plasmon polaritons In: Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 1205305, SPIE-Intl Soc Optical Eng, 2022.
X. Liu, L. Loetgering, A.C.C. de Beurs, M. Du, P. Konold, K.S.E. Eikema and S. Witte: Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
Z. Mazzotta, J. Mathijssen, K.S.E. Eikema, O.O. Versolato and S. Witte: TI-REX: A Tunable Infrared laser for Experiments in nanolithography In: , IEEE, 2021.
ZP. Lyu, M.C. Velsink, P.W.H. Pinkse and L.V. Amitonova: Superiority of a Square-core Multimode Fiber for Imaging and Spectroscopy In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.
K. Abrashitova and L.V. Amitonova: Sub-Nyquist label-free fiber-based ghost imaging In: 2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), IEEE, 2021. - pp. 1-1
A.C.C. de Beurs, L. Loetgering, M. Herczog, K.S.E. Eikema and S. Witte: aPIE: Angle calibration algorithm for reflection ptychography In: OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP), paper CW6B.4, OSA Technical Digest (Optical Society of America), 2021.
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef: Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.

Partners:

Visiting address

Science Park 106
1098 XG Amsterdam
The Netherlands

Delivery address

Science Park 102
1098 XG Amsterdam
The Netherlands

Mail address

PO Box 93019
1090 BA Amsterdam
The Netherlands

T. +31 20 8517100
E-mail: arcnlsecretariaat@arcnl.nl

© ARCNL 2024