Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter
Directory

Publications - Proceedings

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • B. Lochocki, K. Abrashitova, J.F. de Boer and L.V. Amitonova: Resolution limits of compressive imaging via a multimode fiber In: European Conferences on Biomedical Optics 2021 (ECBO), ESIA.5, OSA Technical Digest (Optical Society of America), 2021.

  • M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse: Towards Multimode-fiber-based Two-photon Endoscopy In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.

  • J. Mathijssen, K.S.E. Eikema and S. Witte: Towards High-Order Harmonic Generation in Laser Produced Plasmas In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.

  • T.T.M. van Schaijk, C. Messinis, N. Pandey, V.T. Tenner, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef: Fast and robust diffraction based overlay metrology using dark-field digital holographic microscopy In: Optical Measurement Systems for Industrial Inspection XII, in Proceedings of SPIE, vol 11782, SPIE., 2021.

  • J.H. Buss, I. Grguras, S. Starosielec, M.V. Petev, T. Golz, M. Schulz, M.J. Prandolini, P.M. Kraus, F. Campi and R. Riedel: High-power OPCPAs at 1450–2400 nm wavelength In: Nonlinear Frequency Generation and Conversion: Materials and Devices, 116700 (5 March 2021), SPIE., 2021.

  • S.D.C. Roscam Abbing, Z.-Y. Zhang, R. Kolkowski, F. Campi, A.F. Koenderink and P.M. Kraus: Coherent diffractive extreme-ultraviolet generation from nanostructured silica In: Conference on Lasers and Electro-Optics, CLEO 2021, OPG, 2021.

  • J.H. Buss, S. Starosielec, I. Grguras, T. Golz, M.J. Prandolini, M. Schulz, P.M. Kraus and R. Riedel: Few-cycle OPCPA at 2 µm with up to 100 W average power In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.3, OSA Technical Digest (Optical Society of America), 2020.

  • A. Schulte, J. Mathijssen, K.S.E. Eikema and S. Witte: Towards High Harmonic Generation in Laser-Produced Plasma In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper ETh3A.4, OSA Technical Digest (Optical Society of America), 2020.

  • C. Messinis, T.T.M. van Schaijk, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef: Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Imaging and Applied Optics Congress, paper CF4C.6, OSA Technical Digest (Optical Society of America), 2020.

  • J. Mathijssen, T. de Faria Pinto, A. Schulte, K.S.E. Eikema and S. Witte: Optical Parametric Chirped Pulse Amplifier Producing Ultrashort 10.5 mJ Pulses at 1.55 µm In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.2, OSA Technical Digest (Optical Society of America), 2020.

  • « Previous
  • 1
  • 2
  • 3
  • Next »

Partners:

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • Twitter
  • LinkedIn

© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter