Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter
Directory

Publications - Proceedings

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • A. Pelekanidis, L. Loetgering and S. Witte: Ptychography-based characterization of wavelength-tunable vortex beams In: Computational Optical Sensing and Imaging, COSI 2021 - Part of OSA Imaging and Applied Optics Congress 2021, paper CTu6A.1, OSA Technical Digest (Optical Society of America), 2021.

  • F. Campi, S.D.C. Roscam Abbing, Z.-Y. Zhang, M.L.S. van der Geest and P.M. Kraus: Efficient extreme-ultraviolet multi-band high-order wave mixing in silica In: Proc. SPIE 11886, International Conference on X-Ray Lasers 2020, SPIE-Intl Soc Optical Eng, 2021. - pp. 117-124

  • B. Lochocki, K. Abrashitova, J.F. de Boer and L.V. Amitonova: Resolution limits of compressive imaging via a multimode fiber In: European Conferences on Biomedical Optics 2021 (ECBO), ESIA.5, OSA Technical Digest (Optical Society of America), 2021.

  • M.V. Verweg, B. Lochocki, J.F. de Boer and L.V. Amitonova: Speckle-Based Super-Resolution Imaging via a Multimode Fiber In: Optics InfoBase Conference Papers, Part of European Conferences on Biomedical Optics, ECBO 2021, paper ES1A.4, OSA Technical Digest (Optical Society of America), 2021.

  • M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse: Towards Multimode-fiber-based Two-photon Endoscopy In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.

  • J. Mathijssen, K.S.E. Eikema and S. Witte: Towards High-Order Harmonic Generation in Laser Produced Plasmas In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.

  • T.T.M. van Schaijk, C. Messinis, N. Pandey, V.T. Tenner, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef: Fast and robust diffraction based overlay metrology using dark-field digital holographic microscopy In: Optical Measurement Systems for Industrial Inspection XII, in Proceedings of SPIE, vol 11782, SPIE-Intl Soc Optical Eng, 2021.

  • J.H. Buss, I. Grguras, S. Starosielec, M.V. Petev, T. Golz, M. Schulz, M.J. Prandolini, P.M. Kraus, F. Campi and R. Riedel: High-power OPCPAs at 1450–2400 nm wavelength In: Nonlinear Frequency Generation and Conversion: Materials and Devices, 116700 (5 March 2021), SPIE-Intl Soc Optical Eng, 2021.

  • S.D.C. Roscam Abbing, Z.-Y. Zhang, R. Kolkowski, F. Campi, A.F. Koenderink and P.M. Kraus: Coherent diffractive extreme-ultraviolet generation from nanostructured silica In: Conference on Lasers and Electro-Optics, CLEO 2021, OPG, 2021.

  • J.H. Buss, S. Starosielec, I. Grguras, T. Golz, M.J. Prandolini, M. Schulz, P.M. Kraus and R. Riedel: Few-cycle OPCPA at 2 µm with up to 100 W average power In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.3, OSA Technical Digest (Optical Society of America), 2020.

  • « Previous
  • 1
  • 2
  • 3
  • 4
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter