Publications - Proceedings - ARCNL

C. Messinis, T.T.M. van Schaijk, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef: Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Imaging and Applied Optics Congress, paper CF4C.6, OSA Technical Digest (Optical Society of America), 2020.
J. Mathijssen, T. de Faria Pinto, A. Schulte, K.S.E. Eikema and S. Witte: Optical Parametric Chirped Pulse Amplifier Producing Ultrashort 10.5 mJ Pulses at 1.55 µm In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.2, OSA Technical Digest (Optical Society of America), 2020.
M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse: Imaging Applications of Time-Domain Wavefront Shaping In: Frontiers in Optics / Laser Science, paper FW5F.3, OSA Technical Digest (Optical Society of America), 2020.
L.P. Behnke, R. Schupp, Z. Bouza, J. Scheers, J. Sheil, R. Hoekstra, W.M.G. Ubachs and O.O. Versolato: Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EF2A.2, OSA Technical Digest (Optical Society of America), 2020.
Z. Mazzotta, R.A. Meijer, D. Kurilovich, R. Schupp, O.O. Versolato, K.S.E. Eikema and S. Witte: Controlling the temporal shape of a high-power nanosecond 1064 nm laser pulse to explore EUV generation and different droplet deformation regimes In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EM1A.4, OSA Technical Digest (Optical Society of America), 2020.
N. Thakur, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega: Zinc-based metal oxoclusters: towards enhanced EUV absorptivity In: Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE., 2019. - pp. 1-11
L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega: The role of the organic shell in hybrid molecular materials for EUV lithography In: Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE., 2019.
R. Röhrich, C. Hoekmeijer, C.I. Osorio and A.F. Koenderink: Polarimetric and interferometric measurement of orbital angular momentum imparted by single plasmon nano-antennas In: Imaging and Applied Optics 2019 (COSI, IS, MATH, pcAOP), CTh3A.2, OPG, 2019.
S. Castellanos Ortega, L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, Y. Ekinci and T. Jung: Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists In: Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography, SPIE., 2018. - pp. 105830A: 1-12 (Proceedings SPIE; 10583)
Y. Zhang, J. Haitjema, X. Liu, F.O.L. Johansson, A. Lindblad, S. Castellanos Ortega, N. Ottosson and A.M. Brouwer: Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy In: Advances in Patterning Materials and Processes XXXIV : conference held in San Jose, California, February 26, 2017 /ed. C.K. Hohle and R. Gronheid, SPIE., 2017. - pp. 1014606: 1-10 (Proceedings SPIE; 10146)

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