Controlling the temporal shape of a high-power nanosecond 1064 nm laser pulse to explore EUV generation and different droplet deformation regimes.

Publication date
DOI http://dx.doi.org/10.1364/euvxray.2020.em1a.4
Reference Z. Mazzotta, R.A. Meijer, D. Kurilovich, R. Schupp, O.O. Versolato, K.S.E. Eikema and S. Witte: Controlling the temporal shape of a high-power nanosecond 1064 nm laser pulse to explore EUV generation and different droplet deformation regimes. In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EM1A.4, OSA Technical Digest (Optical Society of America), 2020.
Groups EUV Generation & Imaging, EUV Plasma Processes

We describe a laser system capable of delivering ~450mJ pulses with arbitrarily tunable temporal shapes. We show how this shaping affects target deformation and EUV generation when these pulses illuminate liquid tin droplets