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    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • Y. Zhang, J. Haitjema, X. Liu, F.O.L. Johansson, A. Lindblad, S. Castellanos Ortega, N. Ottosson and A.M. Brouwer: Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy In: Advances in Patterning Materials and Processes XXXIV : conference held in San Jose, California, February 26, 2017 /ed. C.K. Hohle and R. Gronheid, SPIE-Intl Soc Optical Eng, 2017. - pp. 1014606: 1-10 (Proceedings SPIE; 10146)

  • R. Fallica, J. Haitjema, L. Wu, S. Castellanos Ortega, A.M. Brouwer and Y. Ekinci: Absorption and exposure kinetics of photoresists at EUV In: Proceedings SPIE /ed. E.M. Panning and K.A. Goldberg, SPIE-Intl Soc Optical Eng, 2017. - pp. 101430A: 1-11

  • J. Haitjema, Y. Zhang, M. Vockenhuber, D. Kazazis, Y. Ekinci and A.M. Brouwer: Extreme ultraviolet patterning of tin-oxo cages In: Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII /ed. E.M. Panning and K.A. Goldberg, SPIE-Intl Soc Optical Eng, 2017. - pp. 1014325: 1-10 (Proceedings SPIE;)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter