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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Theses

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • T.J. van den Hooven, Broadband Optical Detection of Ultrafast Strain Waves in Metals, University of Amsterdam, 2025-06-16

  • E. Abram, What is Light-Induced Damage? Pre-ablation regime optical and morphological changes in nanometer thick films and grating structures, University of Amsterdam, 2025-06-04

  • L. Cruciani, Ruthenium thin films: terahertz generation and direct laser patterning, University of Amsterdam, 2025-05-01

  • S. van Vliet, Surface chemistry of ruthenium, University of Amsterdam, 2025-04-30

  • J. Mathijssen, High-order harmonic generation in laser-produced plasmas, VU University Amsterdam, 2025-03-25

  • C. Leriche, Visualizing, quantifying, and understanding nanowear of multi-asperity contacts, University of Amsterdam, 2025-02-25

  • Y. Mostafa, Mass & Energy Efficient Tin Laser Produced Plasma Light Sources, VU University Amsterdam, 2025-01-10

  • Z. Lyu, High-resolution Imaging Through a Multimode Fiber: From Raster-scanning to Compressive Sensing, VU University Amsterdam, 2024-12-11

  • X. Liu, Spectrally resolved Extreme Ultraviolet Lensless Imaging With High-Order Harmonic Generation Sources, VU University Amsterdam, 2024-09-16

  • A. Troglia, Optimizing thin-film properties via atomic-scale modification, University of Amsterdam, 2024-09-13

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter