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  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Directory

Publications - Theses

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • S.D.C. Roscam Abbing, Control over extreme-ultraviolet high-harmonic generation from gases and solids, VU University Amsterdam, 2023-03-27

  • S. Rai, Ionic interactions around EUV generating tin plasma, University of Groningen, 2023-02-28

  • B. Liu, Morphology of liquid tin sheets formed by laser impact on droplets, VU University Amsterdam, 2022-12-13

  • C. Messinis, Dark-Field Digital Holographic Microscopy For Advanced Semiconductor Metrology, VU University Amsterdam, 2022-11-29

  • A. Antoncecchi, Laser-ultrasonics and imaging through metal layers, VU University Amsterdam, 2022-03-30

  • N. Thakur, Zinc Oxoclusters for Extreme Ultraviolet Lithography, University of Amsterdam, 2022-03-28

  • G. de Haan, Enhanced Generation and Detection of Ultrafast Laser-Induced Acoustic Signals, University of Amsterdam, 2022-01-28

  • R.A. Meijer, Tailored Laser-Droplet Interaction. For Target Formation in Extreme Ultraviolet Sources, VU University Amsterdam, 2021-10-04

  • C. Sfiligoj, Towards stable nanolayers for EUV optics, University of Amsterdam, 2021-06-30

  • C.D. Dieleman, Patterning Colloidal Nanocrystals with Light and Electrons, University of Amsterdam, 2021-06-30

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter