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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Directory

Publications - Theses

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • C.D. Dieleman, Patterning Colloidal Nanocrystals with Light and Electrons, University of Amsterdam, 2021-06-30

  • M. Du, Computational Depth-resolved Imaging and Metrology, VU University Amsterdam, 2021-06-09

  • O.C.M. Lugier, Surface-Mounted Metal-Organic Frameworks for Extreme Ultraviolet Lithography, University of Amsterdam, 2021-06-03

  • V. Verrina, Laser-induced ultrasound for the detection of buried micro- and nano-structures, University of Amsterdam, 2021-04-06

  • R. Schupp, Spectral characterization of solid-state laser-driven plasma sources of EUV light, VU University Amsterdam, 2021-03-17

  • R. Röhrich, Unconventional metrology: Merging nanophotonics with computational imaging, University of Amsterdam, 2020-12-11

  • L. Wu, Metal oxo clusters: molecular design for extreme ultraviolet lithography, University of Amsterdam, 2020-11-18

  • J. Scheers, Charge-state-resolved spectroscopy of multiply-charged tin ions, VU University Amsterdam, 2020-11-10

  • S. Edward, Detection of hidden gratings using light and sound, University of Amsterdam, 2020-06-18

  • J. Haitjema, Exciting tin-oxo cages: light-induced chemistry for nanopatterning, University of Amsterdam, 2020-06-03

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter